⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21409498 | 0.83 | — | — | |
| SCHEMBL332941 | 0.79 | — | — | |
| SCHEMBL16950094 | 0.77 | LMNA (0.32) | — | |
| SCHEMBL4646488 | 0.74 | — | — | |
| SCHEMBL14093974 | 0.74 | — | — | |
| SCHEMBL1025322 | 0.74 | — | — | |
| SCHEMBL21791160 | 0.74 | LMNA (0.30) | — | |
| SCHEMBL172244 | 0.72 | — | — | |
| SCHEMBL15360430 | 0.72 | NR1I2 (0.42) | — | |
| SCHEMBL331076 | 0.72 | NR1I2 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020040486-A1 | STABILIZER FOR EPISULFIDE-BASED OPTICAL MATERIAL HAVING HIGH REFRACTIVE INDEX, COMPOSITION FOR OPTICAL MATERIAL USING SAME, AND METHOD FOR PRODUCING OPTICAL MATERIAL | 주식회사 케이오씨솔루션 | 2020-02-27 | — | — | WO | disclosed |
| WO-2020040486-A1 | STABILIZER FOR EPISULFIDE-BASED OPTICAL MATERIAL HAVING HIGH REFRACTIVE INDEX, COMPOSITION FOR OPTICAL MATERIAL USING SAME, AND METHOD FOR PRODUCING OPTICAL MATERIAL | 주식회사 케이오씨솔루션 | 2020-02-27 | — | — | WO | disclosed |
| US-7026372-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2006-04-11 | — | — | US | disclosed |
| US-20050154073-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2005-07-14 | — | — | US | disclosed |
| US-6872333-B2 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) | 2005-03-29 | — | — | US | disclosed |
| US-20030195270-A1 | Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof | ISHII KENJI (JP) | 2003-10-16 | — | — | US | disclosed |