SCHEMBL589093

SCHEMBL589093

[CH2]C(C)(F)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL201975 0.78
SCHEMBL67866 0.78
SCHEMBL477927 0.78
SCHEMBL3104899 0.78
SCHEMBL18931 0.78
SCHEMBL71027 0.78
SCHEMBL8718302 0.78
SCHEMBL15091211 0.78
SCHEMBL20803 0.78
SCHEMBL1039462 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109153857-B Polarizing layer forming composition 日产化学株式会社 2022-04-26 CN disclosed
CN-109154685-B Alignment layer forming composition 日产化学株式会社 2022-04-19 CN disclosed
CN-109476926-B Polymer composition 日产化学株式会社 2022-03-04 CN disclosed
CN-110461964-B Composition for forming cured film, alignment material, and phase difference material 日产化学株式会社 2021-12-31 CN disclosed
CN-107615148-B Liquid crystal aligning agent for photo-alignment, alignment material and phase difference material 日产化学工业株式会社 2021-05-25 CN disclosed
EP-3269781-B1 CURED-FILM-FORMING COMPOSITION, ALIGNMENT MATERIAL, AND PHASE DIFFERENCE MATERIAL NISSAN CHEMICAL CORP (JP) 2021-04-21 EP disclosed
US-20200325327-A1 CURED-FILM-FORMING COMPOSITION, ORIENTATION MATERIAL, AND RETARDATION MATERIAL NISSAN CHEMICAL CORPORATION (JP) 2020-10-15 US disclosed
EP-3299879-B1 LIQUID CRYSTAL ALIGNING AGENT FOR PHOTO-ALIGNMENT, ALIGNING MATERIAL AND RETARDATION MATERIAL NISSAN CHEMICAL CORP (JP) 2020-09-09 EP disclosed
CN-111212879-A Composition for forming cured film, alignment material, and phase difference material 日产化学株式会社 2020-05-29 CN disclosed
US-10570248-B2 Cured film formation composition, orientation material, and retardation material NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-02-25 US disclosed
US-7700808-B2 1-3-bis(substituted phenyl)-3-hydroxypropan-1-one or 2-propen-1-one compound, and salt thereof NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-04-20 US disclosed
EP-2172462-A1 METHOD FOR PRODUCTION OF 3-HYDROXYPROPAN-1-ONE COMPOUND, METHOD FOR PRODUCTION OF 2-PROPEN-1-ONE COMPOUND, AND METHOD FOR PRODUCTION OF ISOXAZOLINE COMPOUND Nissan Chemical Industries, Ltd. (JP) 2010-04-07 EP disclosed
US-20090156643-A1 Substituted isoxazoline compound and pesticide NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-06-18 US disclosed
US-20090124806-A1 PROCESS FOR PRODUCING CARBOXYLIC ACID FROM PRIMARY ALCOHOL NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-05-14 US disclosed
CN-101400662-A Substituted isoxazoline compound and pest control agent NISSAN CHEMICAL IND LTD (JP) 2009-04-01 CN disclosed
US-20090023923-A1 1,3-Bis(Substituted Phenyl)-3-Hydroxypropan-1-One or 2-Propen-1-One Compound, and Salt Thereof NISSAN CHEMICAL INDUSTRIES, LTD (JP) 2009-01-22 US disclosed
CN-101346336-A 1, 3-bis (substituted phenyl) -3-hydroxypropan-1-one and 2-propen-1-one compounds and salts thereof NISSAN CHEMICAL IND LTD (JP) 2009-01-14 CN disclosed
EP-1997813-A1 SUBSTITUTED ISOXAZOLINE COMPOUND AND PEST CONTROL AGENT Nissan Chemical Industries, Ltd. (JP) 2008-12-03 EP disclosed
EP-1975149-A1 1,3-BIS(SUBSTITUTED PHENYL)-3-HYDROXYPROPAN-1-ONE OR 2-PROPEN-1-ONE COMPOUND, AND SALT THEREOF Nissan Chemical Industries, Ltd. (JP) 2008-10-01 EP disclosed
EP-1932836-A1 ISOXAZOLINE-SUBSTITUTED BENZAMIDE COMPOUND AND HARMFUL ORGANISM-CONTROLLING AGENT Nissan Chemical Industries, Ltd. (JP) 2008-06-18 EP disclosed