SCHEMBL5892371

SCHEMBL5892371

CCOC(N)C(O)(COC)COC

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL749805 0.79 THRB (0.35) THRB
Ammonia Solution, Strong SCHEMBL4366931 0.77 THRB (0.33) THRB
SCHEMBL9700080 0.76 THRB (0.32) THRB
SCHEMBL5892417 0.75 CES1 (0.40)
SCHEMBL6325430 0.73 THRB (0.33) THRB
SCHEMBL319331 0.72
Ethylene Glycol SCHEMBL17292088 0.67 THRB (0.32) THRB
SCHEMBL23647035 0.66
SCHEMBL9108301 0.66 THRB (0.40) THRB
SCHEMBL314094 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7049275-B2 Photoresist stripping composition and cleaning composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-05-23 US claimed
US-7049275-B2 Photoresist stripping composition and cleaning composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-05-23 US disclosed
US-20030181344-A1 Photoresist stripping composition and cleaning composition MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2003-09-25 US disclosed