Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | TYR | P14679 | 1/20 | 0.50 |
| ▸ | KIF11 | P52732 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 2/20 | 0.39 |
| ▸ | RAB9A | P51151 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.39 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.39 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.39 |
| ▸ | SLC22A3 | O75751 | 1/20 | 0.39 |
| ▸ | BCHE | P06276 | 3/20 | 0.39 |
| ▸ | ACHE | P22303 | 3/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.39 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL3751214 | 0.97 | TSHR (0.50) | TSHRLMNATYRKIF11ALDH1A1 | |
| Ethane SCHEMBL2569932 | 0.97 | TSHR (0.50) | TSHRLMNATYRKIF11ALDH1A1 | |
| Ethane SCHEMBL2437505 | 0.97 | TSHR (0.50) | TSHRLMNATYRKIF11ALDH1A1 | |
| Hydrochloric Acid SCHEMBL546503 | 0.97 | TSHR (0.50) | TSHRLMNATYRKIF11ALDH1A1 | |
| Methane SCHEMBL2439409 | 0.97 | TSHR (0.50) | TSHRLMNATYRKIF11ALDH1A1 | |
| Iodide SCHEMBL5454283 | 0.97 | TSHR (0.50) | TSHRLMNATYRKIF11ALDH1A1 | |
| Bromide SCHEMBL482554 | 0.97 | TSHR (0.50) | TSHRLMNATYRKIF11ALDH1A1 | |
| SCHEMBL2436199 | 0.92 | TSHR (0.46) | TSHRLMNATYRKIF11ALDH1A1 | |
| SCHEMBL31289643 | 0.92 | TSHR (0.46) | TSHRLMNATYRKIF11ALDH1A1 | |
| SCHEMBL244777 | 0.90 | TSHR (0.44) | TSHRLMNATYRKIF11ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2264 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4565378-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | Sicpa Holding SA (CH) | 2025-06-11 | — | — | EP | claimed |
| CN-119677597-A | Method for producing an optical effect layer comprising magnetic or magnetizable pigment particles and exhibiting more than one marking | 锡克拜控股有限公司 | 2025-03-21 | — | — | CN | claimed |
| WO-2024028408-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2024-02-08 | — | — | WO | claimed |
| EP-4313430-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | Sicpa Holding SA (CH) | 2024-02-07 | — | — | EP | claimed |
| CN-117098610-A | Method for producing an optical effect layer comprising magnetic or magnetizable pigment particles and exhibiting more than one marking | 锡克拜控股有限公司 | 2023-11-21 | — | — | CN | claimed |
| EP-3613070-B1 | PHOTOPATTERNABLE FILM | UNIV CHICAGO (US) | 2023-10-18 | — | — | EP | claimed |
| US-11720017-B2 | Photoactive, inorganic ligand-capped inorganic nanocrystals | THE UNIVERSITY OF CHICAGO (US) | 2023-08-08 | — | — | US | claimed |
| EP-4085083-A1 | UV ACTIVE DERIVATIVES OF PD(ACAC)2 CATALYZED POLYCYCLOOLEFIN COMPOSITIONS AS OPTICAL MATERIALS | Promerus, LLC (US) | 2022-11-09 | — | — | EP | claimed |
| WO-2022207692-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2022-10-06 | — | — | WO | claimed |
| US-11357884-B2 | Electroactive bioadhesive compositions | NANYANG TECHNOLOGICAL UNIVERSITY (SG) | 2022-06-14 | — | — | US | claimed |
| WO-2003058347-A1 | NEGATIVE DEEP ULTRAVIOLET PHOTORESIST | CLARIANT INTERNATIONAL LTD (CH) | 2003-07-17 | — | — | WO | claimed |
| US-20030129527-A1 | Negative deep ultraviolet photoresist | AZ ELECTRONIC MATERIALS USA CORP. | 2003-07-10 | — | — | US | claimed |
| US-6479210-B2 | COMPRISING AN ORGANIC MATERIAL CONTAINING SUBSTITUENT(S) CAPABLE OF BEING RELEASED IN THE PRESENCE OF ACID, AND ACID GENERATORS OF AT LEAST ONE ONIUM SALT AND SULFONE AND/OR SULFONATE COMPOUNDS; RESOLUTION, SENSITIVITY | CLARIANT FINANCE (BVI) LIMITED (VG) | 2002-11-12 | — | — | US | claimed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | claimed |
| US-6358665-B1 | ONIUM SALT PRECURSOR FOR GENERATING FLUOROALKYLSULFONATE | CLARIANT INTERNATIONAL LTD. (CH) | 2002-03-19 | — | — | US | claimed |
| EP-1033624-A1 | RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE | Clariant International Ltd. (CH) | 2000-09-06 | — | — | EP | claimed |
| EP-0543762-B1 | Dry developable photoresist compositions and method for use thereof | IBM (US) | 2000-02-16 | — | — | EP | claimed |
| US-5998099-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-12-07 | — | — | US | claimed |
| EP-0907109-A1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-04-07 | — | — | EP | claimed |
| EP-0136679-B1 | PHOTOPOLYMERIZABLE EPOXY RESIN COMPOSITION | KABUSHIKI KAISHA TOSHIBA (JP) | 1987-12-16 | — | — | EP | claimed |