SCHEMBL5932004

SCHEMBL5932004

Cc1cc(C)c(S(=O)(=O)c2ccccc2)c(C)c1

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 5/20 0.74
MEN1 O00255 2/20 0.59
KMT2A Q03164 2/20 0.59
L3MBTL1 Q9Y468 2/20 0.57
HTT P42858 1/20 0.57
FFAR4 Q5NUL3 1/20 0.56
ALDH1A1 P00352 4/20 0.54
KDM4E B2RXH2 2/20 0.54
GAA P10253 2/20 0.54
HPGD P15428 2/20 0.54
HTR6 P50406 1/20 0.52
SMN1; SMN2 Q16637 3/20 0.50
POLB P06746 2/20 0.50
CYP1A2 P05177 1/20 0.50
CYP3A4 P08684 1/20 0.50
CYP2C19 P33261 1/20 0.50
MAPT P10636 1/20 0.50
LMNA P02545 2/20 0.48
CNR1 P21554 1/20 0.48
RAB9A P51151 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3847174 0.87 RAPGEF4 (0.88) RAPGEF4MEN1KMT2AL3MBTL1HTT
SCHEMBL9001218 0.85 RAPGEF4 (1.00) RAPGEF4MEN1KMT2AL3MBTL1HTT
SCHEMBL7630932 0.83 HTR6 (0.56) RAPGEF4MEN1KMT2AL3MBTL1HTT
SCHEMBL11188982 0.80 RAPGEF4 (1.00) RAPGEF4KMT2AHTTALDH1A1KDM4E
SCHEMBL14838873 0.80 RAPGEF4 (0.75) RAPGEF4MEN1KMT2AHTTFFAR4
SCHEMBL15176431 0.80 RAPGEF4 (1.00) RAPGEF4MEN1KMT2AL3MBTL1HTT
SCHEMBL2047218 0.79 RAPGEF4 (0.67) RAPGEF4HTTALDH1A1GAASMN1; SMN2
SCHEMBL3199328 0.78 FFAR4 (0.50) RAPGEF4MEN1KMT2AL3MBTL1HTT
SCHEMBL26291500 0.78 HTR6 (0.64) RAPGEF4MEN1KMT2AL3MBTL1HTT
SCHEMBL15417549 0.78 HTR6 (0.62) MEN1KMT2AL3MBTL1HTTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122006631-A Device for preparing hydrogen fluoride by molecular recognition complexation method and application thereof 浙江大学衢州研究院 2026-05-12 CN disclosed
CN-107544208-B Negative photosensitive resin composition, spacer, protective film and liquid crystal display element 奇美实业股份有限公司 2022-05-31 CN disclosed
US-7157220-B2 Silver halide photosensitive material and photothermographic material FUJIFILM CORPORATION (JP) 2007-01-02 US disclosed
US-20060188812-A1 Phenolic hydroxyl group-containing copolymer and radiation-sensitive resin composition JSR CORPORATION (JP) 2006-08-24 US disclosed
EP-1686424-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2006-08-02 EP disclosed
US-20060166138-A1 Radiation-sensitive resin composition JSR CORPORATION 2006-07-27 US disclosed
US-6455738-B1 FRIEDEL-CRAFT CATALYSIS IN THE PRESENCE OF MIXTURES OF LEWIS ACIDS AND SULFONIC ACID ESTERS AS FRIEDEL CRAFT'S CATALYSTS; STOICHIOMETRY RHODIA CHIMIE (FR) 2002-09-24 US disclosed