Known targets — ChEMBL curated mechanism
CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D
The experimentally established mechanism targets of Bisphenol A. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 5/20 | 0.70 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.70 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.70 |
| ▸ | TSHR | P16473 | 2/20 | 0.61 |
| ▸ | AR | P10275 | 1/20 | 0.61 |
| ▸ | HPGD | P15428 | 1/20 | 0.61 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.61 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.61 |
| ▸ | HTR6 | P50406 | 1/20 | 0.61 |
| ▸ | ESRRG | P62508 | 1/20 | 0.61 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.61 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.61 |
| ▸ | TYR | P14679 | 2/20 | 0.56 |
| ▸ | CA12 | O43570 | 2/20 | 0.56 |
| ▸ | CA1 | P00915 | 2/20 | 0.56 |
| ▸ | CA2 | P00918 | 2/20 | 0.56 |
| ▸ | CA6 | P23280 | 2/20 | 0.56 |
| ▸ | CA9 | Q16790 | 2/20 | 0.56 |
| ▸ | CA3 | P07451 | 1/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoic Acid SCHEMBL27569004 | 0.98 | ESR1 (0.74) | ESR1ESR2CYP3A4ALDH1A1TSHR | |
| SCHEMBL4348947 | 0.92 | ESR1 (0.67) | ESR1ESR2CYP3A4ALDH1A1TSHR | |
| Bisphenol A SCHEMBL2854094 | 0.92 | ESR1 (0.67) | ESR1ESR2CYP3A4ALDH1A1TSHR | |
| Bisphenol A SCHEMBL11427584 | 0.90 | ESR1 (0.64) | ESR1ESR2CYP3A4ALDH1A1TSHR | |
| Bisphenol A SCHEMBL7055240 | 0.90 | ESR1 (0.58) | ESR1ESR2CYP3A4ALDH1A1TSHR | |
| Bisphenol A SCHEMBL9246479 | 0.90 | ESR1 (0.58) | ESR1ESR2CYP3A4ALDH1A1TSHR | |
| Bisphenol A SCHEMBL30693768 | 0.90 | ESR1 (0.61) | ESR1ESR2CYP3A4ALDH1A1TSHR | |
| Bisphenol A SCHEMBL11199980 | 0.89 | ESR1 (0.61) | ESR1ESR2CYP3A4ALDH1A1TSHR | |
| Bisphenol A SCHEMBL5053970 | 0.89 | ESR1 (0.70) | ESR1ESR2CYP3A4ALDH1A1TSHR | |
| Benzoic Acid SCHEMBL9258304 | 0.89 | ESR1 (0.70) | ESR1ESR2CYP3A4ALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119931043-A | Polyimide resin, preparation method thereof, polyimide resin slurry and film | 江西沃格光电集团股份有限公司 | 2025-05-06 | — | — | CN | claimed |
| US-20240254286-A1 | POLYESTERIMIDE RESIN COMPOSITION, POLYESTERIMIDE RESIN LAYER, FLEXIBLE METAL FOIL LAMINATE, AND METHODS OF PREPARING THE SAME | NEXFLEX CO., LTD. (KR) | 2024-08-01 | — | — | US | claimed |
| US-12534574-B2 | System and method for manufacturing polyamic acid, and system and method for manufacturing polyimide | KANEKA CORPORATION (JP) | 2026-01-27 | — | — | US | disclosed |
| CN-114008525-B | Method for producing purified resist composition, method for forming resist pattern, and purified resist composition | 东京应化工业株式会社 | 2025-05-23 | — | — | CN | disclosed |
| CN-119931043-A | Polyimide resin, preparation method thereof, polyimide resin slurry and film | 江西沃格光电集团股份有限公司 | 2025-05-06 | — | — | CN | disclosed |
| US-20250109264-A1 | FILM, METHOD FOR MANUFACTURING SAME, AND IMAGE DISPLAY DEVICE | KANEKA CORPORATION (JP) | 2025-04-03 | — | — | US | disclosed |
| WO-2025053071-A1 | POROUS FILM AND METHOD FOR PRODUCING POROUS FILM | 東京応化工業株式会社 | 2025-03-13 | — | — | WO | disclosed |
| US-12227609-B2 | Thermosetting resin composition, thermosetting resin film, thermoset film, multilayer body, printed wiring board and method for producing same | KANEKA CORPORATION (JP) | 2025-02-18 | — | — | US | disclosed |
| US-20240392131-A1 | RESIN COMPOSITION, MOLDED BODY, AND FILM | KANEKA CORPORATION (JP) | 2024-11-28 | — | — | US | disclosed |
| US-20240327573-A1 | SYSTEM AND METHOD FOR MANUFACTURING POLYAMIC ACID, AND SYSTEM AND METHOD FOR MANUFACTURING POLYIMIDE | KANEKA CORPORATION (JP) | 2024-10-03 | — | — | US | disclosed |
| US-12054586-B2 | System and method for manufacturing polyamic acid, and system and method for manufacturing polyimide | KANEKA CORPORATION (JP) | 2024-08-06 | — | — | US | disclosed |
| CN-115725079-A | Composition for forming polyamideimide film, method for preparing same, and use thereof | SK新技术株式会社 | 2023-03-03 | — | — | CN | disclosed |
| CN-115477846-A | Composition for forming polyimide film, method for producing same, and use thereof | SK新技术株式会社 | 2022-12-16 | — | — | CN | disclosed |
| CN-115368565-A | Composition for forming polyimide film for cover window, method for producing same, and use thereof | SK新技术株式会社 | 2022-11-22 | — | — | CN | disclosed |
| WO-2022230546-A1 | POROUS POLYIMIDE FILM | 東京応化工業株式会社 | 2022-11-03 | — | — | WO | disclosed |
| WO-2022196554-A1 | POLYMER PRODUCTION SYSTEM AND POLYMER PRODUCTION METHOD | 株式会社カネカ | 2022-09-22 | — | — | WO | disclosed |
| EP-3159057-B1 | PRODUCTION METHOD OF PURIFIED LIQUID CHEMICAL PRODUCT FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO LTD (JP) | 2022-07-27 | — | — | EP | disclosed |
| US-20220153909-A1 | THERMOSETTING RESIN COMPOSITION, THERMOSETTING RESIN FILM, THERMOSET FILM, MULTILAYER BODY, PRINTED WIRING BOARD AND METHOD FOR PRODUCING SAME | KANEKA CORPORATION (JP) | 2022-05-19 | — | — | US | disclosed |
| US-8313831-B2 | Thermoplastic polyimide resin film, multilayer body and method for manufacturing printed wiring board composed of same | KANEKA CORPORATION (JP) | 2012-11-20 | — | — | US | disclosed |
| US-20060115670-A1 | Thermoplastic polyimide resin film, multilayer body and method for manufacturing printed wiring board composed of same | KANEKA CORPORATION (JP) | 2006-06-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12534574-B2 | System and method for manufacturing polyamic acid, and system and method for manufacturing polyimide | PARG, FGB, PUF60 | ESR1 4425/4885ESR2 4638/4885CYP3A4 3876/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.