Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | RAB9A | P51151 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | VDR | P11473 | 2/20 | 0.36 |
| ▸ | F2 | P00734 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 2/20 | 0.34 |
| ▸ | CDC25A | P30304 | 1/20 | 0.34 |
| ▸ | FAAH | O00519 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | MGLL | Q99685 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5707415 | 1.00 | MAPT (0.39) | MAPTALDH1A1MEN1KMT2ARAB9A | |
| SCHEMBL11039442 | 0.95 | ALDH1A1 (0.40) | MAPTALDH1A1MEN1KMT2ARAB9A | |
| SCHEMBL11029444 | 0.82 | KDM4E (0.50) | MAPTALDH1A1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL2901056 | 0.82 | KDM4E (0.50) | MAPTALDH1A1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL11025672 | 0.82 | KDM4E (0.50) | MAPTALDH1A1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL11199907 | 0.81 | KDM4E (0.51) | MAPTALDH1A1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL5707416 | 0.79 | TDP1 (0.60) | MAPTALDH1A1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL11040638 | 0.79 | TDP1 (0.60) | MAPTALDH1A1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL28404191 | 0.79 | TDP1 (0.60) | MAPTALDH1A1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL28418011 | 0.79 | TDP1 (0.60) | MAPTALDH1A1MEN1KMT2ASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 135 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9235119-B2 | Exposure photolithography methods | GLOBALFOUNDRIES INC. (KY) | 2016-01-12 | — | — | US | claimed |
| US-20140349237-A1 | EXPOSURE PHOTOLITHOGRAPHY METHODS | GLOBALFOUNDRIES U.S. INC. | 2014-11-27 | — | — | US | claimed |
| US-8846296-B2 | Photoresist compositions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-09-30 | — | — | US | claimed |
| US-8759415-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-06-24 | — | — | US | claimed |
| US-8568960-B2 | Multiple exposure photolithography methods | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-10-29 | — | — | US | claimed |
| US-20120291668-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-22 | — | — | US | claimed |
| US-8262961-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-11 | — | — | US | claimed |
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | claimed |
| US-20080174051-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-24 | — | — | US | claimed |
| US-20080169268-A1 | PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-17 | — | — | US | claimed |
| EP-1938149-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | International Business Machines Corporation (US) | 2008-07-02 | — | — | EP | claimed |
| US-7358029-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | claimed |
| US-20070298176-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2007-12-27 | — | — | US | claimed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | claimed |
| WO-2007039346-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-12 | — | — | WO | claimed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | claimed |
| US-20230350302-A1 | POLYMER CROSSLINK DE-CROSSLINK PROCESSES FOR RESIST PATTERNING | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-11-02 | — | — | US | disclosed |
| US-11667786-B2 | Encapsulating or filling composition for electronic devices and electronic apparatus | SAMSUNG DISPLAY CO., LTD. (KR) | 2023-06-06 | — | — | US | disclosed |
| EP-0058638-B1 | CURABLE COMPOSITIONS CONTAINING AN ACID-CURABLE RESIN, AND PROCESS FOR CURING THEM | CIBA-GEIGY AG (CH) | 1985-08-28 | — | — | EP | disclosed |
| EP-0058638-A2 | Curable compositions containing an acid-curable resin, and process for curing them | CIBA-GEIGY AG (CH) | 1982-08-25 | — | — | EP | disclosed |