SCHEMBL5950641

SCHEMBL5950641

CC(O)Cc1ccc(CC(C)O)c2ccccc12

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.39
ADRB2 P07550 6/20 0.38
GABRA1 P14867 1/20 0.37
GABRB2 P47870 1/20 0.37
TRPA1 O75762 1/20 0.36
ADRB1 P08588 1/20 0.36
HTR1A P08908 1/20 0.36
ADRA2A P08913 1/20 0.36
SLC6A2 P23975 1/20 0.36
HTR1D P28221 1/20 0.36
HTR1B P28222 1/20 0.36
HTR2A P28223 1/20 0.36
HTR2C P28335 1/20 0.36
HTR1E P28566 1/20 0.36
SLC6A4 P31645 1/20 0.36
HTR7 P34969 1/20 0.36
HTR2B P41595 1/20 0.36
HTR6 P50406 1/20 0.36
SLC6A3 Q01959 1/20 0.36
KDM4E B2RXH2 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5950323 0.91 GABRA1 (0.46) LMNAADRB2GABRA1GABRB2
SCHEMBL12532092 0.83 CTNNB1 (0.53) ADRB2KDM4ECYP2D6
SCHEMBL1041345 0.83 CTNNB1 (0.53) ADRB2KDM4ECYP2D6
SCHEMBL10355407 0.83 CTNNB1 (0.53) ADRB2KDM4ECYP2D6
SCHEMBL5988255 0.82 GABRA1 (0.46) LMNAGABRA1GABRB2TRPA1ADRA2A
SCHEMBL1129263 0.79 CYP2D6 (0.41) LMNAGABRA1GABRB2TRPA1SLC6A2
SCHEMBL9578024 0.78 KDM4E (0.45) LMNAHTR2AHTR2CKDM4EMAPT
SCHEMBL5950529 0.78 LMNA (0.40) LMNATRPA1SLC6A2SLC6A4SLC6A3
SCHEMBL11595427 0.76 SLC2A1 (0.37) HTR2AHTR2CKDM4E
SCHEMBL11805908 0.74 GABRA1 (0.42) ADRB2GABRA1GABRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7005216-B2 Photo mask RENESAS TECHNOLOGY CORP. (JP) 2006-02-28 US disclosed
US-6790564-B2 FOR USE IN PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES; EFFICIENCY RENESAS TECHNOLOGY CORPORATION (JP) 2004-09-14 US disclosed
US-20030129505-A1 Krypton fluoride laser lithography; photoresist pattern RENESAS ELECTRONICS CORPORATION (JP) 2003-07-10 US disclosed
US-20020086222-A1 Photomask and manufacturing method of an electronic device therewith RENESAS ELECTRONICS CORPORATION (JP) 2002-07-04 US disclosed