SCHEMBL5951898

SCHEMBL5951898

CCOB(OCC)c1cccc2ccccc12

nearest known ligand 0.53

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HPGD P15428 2/20 0.40
KDM4E B2RXH2 2/20 0.40
LMNA P02545 1/20 0.40
ALDH1A1 P00352 3/20 0.39
CYP2A6 P11509 2/20 0.39
CDC25B P30305 2/20 0.38
TSHR P16473 2/20 0.37
HTR1B P28222 2/20 0.37
KMT2A Q03164 2/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C19 P33261 1/20 0.36
HSD17B10 Q99714 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CDC25A P30304 1/20 0.36
CDC25C P30307 1/20 0.36
POLB P06746 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8165689 0.89 HTR1B (0.40) HPGDKDM4ELMNAHTR1BTDP1
SCHEMBL14983442 0.85 HTR1B (0.41) ALDH1A1CYP2A6HTR1B
SCHEMBL5952256 0.82 HTR1B (0.43) HTR1BTDP1
SCHEMBL5952349 0.81 HPGD (0.44) HPGDKDM4ELMNAALDH1A1CDC25B
SCHEMBL14983517 0.78 TRPM4 (0.38) HPGDKDM4ELMNAALDH1A1CYP2A6
SCHEMBL5952337 0.78 ALDH1A1 (0.43) HPGDKDM4EALDH1A1CYP2A6TSHR
SCHEMBL14983516 0.77 ALDH1A1 (0.44) HPGDKDM4EALDH1A1TSHRKMT2A
SCHEMBL22000805 0.74 TSHR (0.38) LMNAALDH1A1TSHRKMT2ACYP1A2
SCHEMBL25509448 0.74 ALDH1A1 (0.40) HPGDALDH1A1CYP2A6TSHRHTR1B
SCHEMBL5951630 0.73 KDM4E (0.39) HPGDKDM4EALDH1A1CYP2A6CDC25B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2599818-B1 Silicon-containing resist underlayer film-forming composition and patterning process SHINETSU CHEMICAL CO (JP) 2017-02-01 EP disclosed
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
US-7038070-B2 Preparation of preparing substituted indanones BASELL POLYOLEFINE GMBH (DE) 2006-05-02 US disclosed
US-6963017-B2 Preparation of preparing substituted indanones BASELL POLYOLEFINE GMBH (DE) 2005-11-08 US disclosed
EP-0968158-B1 METHOD OF PREPARING SUBSTITUTED INDANONES, THE SUBSTITUTED INDANONES AND METALLOCENES PREPARED THEREFROM BASELL POLYOLEFINE GMBH (DE) 2005-08-10 EP disclosed
US-20050033076-A1 Preparation of preparing substituted indanones EQUISTAR CHEMICALS, LP 2005-02-10 US disclosed
US-20030009046-A1 Preparation of preparing substituted indanones EQUISTAR CHEMICALS, LP 2003-01-09 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050033076-A1 Preparation of preparing substituted indanones CYP1A2, CYP2J2, IDH3A HPGD 132/4885KDM4E 2127/4885LMNA 1082/4885
US-20030009046-A1 Preparation of preparing substituted indanones CYP1A2, CYP1B1, CYP1A1 HPGD 159/4885KDM4E 2338/4885LMNA 1251/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.