Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.62 |
| ▸ | FBP1 | P09467 | 1/20 | 0.59 |
| ▸ | P4HB | P07237 | 2/20 | 0.51 |
| ▸ | MEN1 | O00255 | 1/20 | 0.51 |
| ▸ | LMNA | P02545 | 1/20 | 0.51 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.51 |
| ▸ | MAPT | P10636 | 1/20 | 0.51 |
| ▸ | PKM | P14618 | 1/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.51 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.51 |
| ▸ | MAOB | P27338 | 5/20 | 0.49 |
| ▸ | CISD1 | Q9NZ45 | 2/20 | 0.47 |
| ▸ | TTR | P02766 | 1/20 | 0.47 |
| ▸ | PIM1 | P11309 | 1/20 | 0.47 |
| ▸ | PIM2 | Q9P1W9 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.47 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | THRB | P10828 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13790316 | 0.85 | NFE2L2 (0.82) | NFE2L2FBP1P4HBMEN1LMNA | |
| SCHEMBL5496405 | 0.83 | NFE2L2 (0.73) | NFE2L2FBP1P4HBMEN1LMNA | |
| SCHEMBL3904046 | 0.83 | NFE2L2 (0.73) | NFE2L2FBP1P4HBMEN1LMNA | |
| SCHEMBL543252 | 0.83 | NFE2L2 (0.56) | NFE2L2FBP1P4HBMEN1LMNA | |
| SCHEMBL1046286 | 0.82 | NFE2L2 (0.61) | NFE2L2FBP1P4HBMEN1LMNA | |
| SCHEMBL3998676 | 0.82 | NFE2L2 (0.61) | NFE2L2FBP1P4HBMEN1LMNA | |
| SCHEMBL2787109 | 0.82 | NFE2L2 (0.66) | NFE2L2FBP1P4HBMEN1LMNA | |
| SCHEMBL28816747 | 0.82 | NFE2L2 (0.61) | NFE2L2FBP1P4HBMEN1LMNA | |
| SCHEMBL11437739 | 0.82 | NFE2L2 (0.66) | NFE2L2FBP1P4HBMEN1LMNA | |
| SCHEMBL1046285 | 0.82 | NFE2L2 (0.61) | NFE2L2FBP1P4HBMEN1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104749884-B | Photosensitive polymer combination | 东京应化工业株式会社 | 2019-10-18 | — | — | CN | disclosed |
| CN-110317174-A | Hydrogen barrier, hydrogen barrier film, which are formed, uses composition, hydrogen barrier film, the manufacturing method of hydrogen barrier film and electronic component | 东京应化工业株式会社 | 2019-10-11 | — | — | CN | disclosed |
| CN-105051606-B | composition for lithographic printing plate and lithographic printing plate precursor | 伊斯曼柯达公司 | 2019-09-10 | — | — | CN | disclosed |
| CN-109962089-A | The manufacturing method of wavelength convert substrate | 东京应化工业株式会社 | 2019-07-02 | — | — | CN | disclosed |
| CN-107903156-B | Photosensitive composite and compound | 东京应化工业株式会社 | 2019-05-31 | — | — | CN | disclosed |
| CN-109557765-A | Photosensitive polymer combination, cured film, display device and pattern forming method | 东京应化工业株式会社 | 2019-04-02 | — | — | CN | disclosed |
| CN-104371372-B | Dispersible pigment dispersion, photosensitive polymer combination and dispersing aid containing the dispersible pigment dispersion | 东京应化工业株式会社 | 2019-03-19 | — | — | CN | disclosed |
| CN-109471330-A | Photosensitive composite and Photoepolymerizationinitiater initiater used in it | 东京应化工业株式会社 | 2019-03-15 | — | — | CN | disclosed |
| CN-103365087-B | Insulating film forms the forming method with photosensitive polymer combination, insulating film and insulating film | 东京应化工业株式会社 | 2019-03-08 | — | — | CN | disclosed |
| CN-109426079-A | Photosensitive composite, solidfied material forming method, solidfied material, device used for image display panel and image display device | 东京应化工业株式会社 | 2019-03-05 | — | — | CN | disclosed |
| CN-103842185-A | Printing method using on press development lithograph printing plate precursor | FUJI PHOTO FILM CO LTD | 2014-06-04 | — | — | CN | disclosed |
| CN-103832050-A | Lithographic printing plat and image forming method using a lithographic printing plat | EASTMAN KODAK CO | 2014-06-04 | — | — | CN | disclosed |
| CN-103748518-A | Lithographic printing plate precursor and process for producing lithographic printing plate | FUJI PHOTO FILM CO LTD | 2014-04-23 | — | — | CN | disclosed |
| CN-103596770-A | Presensitized plate for lithographic printing and method for processing same | FUJIFILM CORP | 2014-02-19 | — | — | CN | disclosed |
| CN-103442900-A | Lithographic printing plate precursor and plate making method thereof | FUJI PHOTO FILM CO LTD | 2013-12-11 | — | — | CN | disclosed |
| CN-101781162-B | Method for preparing trifluoromethyl styrene compound | SHANGHAI CHEMEXPLORER CO LTD | 2013-12-11 | — | — | CN | disclosed |
| CN-103430098-A | Positive-working lithographic printing plate precursor and method for preparing same | EASTMAN KODAK CO | 2013-12-04 | — | — | CN | disclosed |
| CN-103415808-A | Lithographic printing plate precursor and method for producing lithographic printing plate | FUJI PHOTO FILM CO LTD | 2013-11-27 | — | — | CN | disclosed |
| CN-101781161-B | Method for preparing trifluoromethyl styrene compound | SHANGHAI CHEMEXPLORER CO LTD | 2013-11-27 | — | — | CN | disclosed |
| EP-1634898-A2 | Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2006-03-15 | — | — | EP | disclosed |