SCHEMBL5968697

SCHEMBL5968697

Cc1cc(C2(c3cc(C)c(N)c(C)c3)OC(=O)c3ccccc32)cc(C)c1N

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 5/20 0.66
NPSR1 Q6W5P4 5/20 0.66
MAPT P10636 5/20 0.65
MEN1 O00255 4/20 0.65
KMT2A Q03164 4/20 0.65
TDP1 Q9NUW8 4/20 0.65
POLB P06746 3/20 0.65
SMN1; SMN2 Q16637 2/20 0.65
L3MBTL1 Q9Y468 2/20 0.65
CFTR P13569 1/20 0.60
GOPC Q9HD26 1/20 0.60
AKR1C1 Q04828 1/20 0.56
GPR55 Q9Y2T6 2/20 0.55
ALOX12 P18054 1/20 0.55
CYP3A4 P08684 4/20 0.54
TP53 P04637 2/20 0.54
ALOX15 P16050 2/20 0.54
ALDH1A1 P00352 2/20 0.54
HSD17B10 Q99714 2/20 0.54
ESR1 P03372 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4958920 0.84 LMNA (0.74) LMNANPSR1MAPTMEN1KMT2A
SCHEMBL24603036 0.83 LMNA (0.76) LMNANPSR1MAPTMEN1KMT2A
SCHEMBL19981313 0.80 CXCR1 (0.72) LMNANPSR1MAPTMEN1KMT2A
SCHEMBL14095186 0.79 NPSR1 (1.00) LMNANPSR1MAPTMEN1KMT2A
SCHEMBL31666744 0.79 LMNA (1.00) LMNANPSR1MAPTMEN1KMT2A
SCHEMBL29365023 0.79 LMNA (1.00) LMNANPSR1MAPTMEN1KMT2A
SCHEMBL404777 0.79 LMNA (1.00) LMNANPSR1MAPTMEN1KMT2A
SCHEMBL11459322 0.79 AKR1C1 (0.82) LMNANPSR1MAPTMEN1KMT2A
SCHEMBL29174125 0.78 LMNA (0.97) LMNANPSR1MAPTMEN1KMT2A
SCHEMBL50862 0.77 LMNA (0.57) LMNANPSR1MAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1213049-B1 GAS SEPARATION MEMBRANE AND PROCESS FOR PRODUCING A POLYMER NAT INST OF ADVANCED IND SCIEN (JP) 2006-11-15 EP disclosed
US-6531569-B1 Halogenated polyimides having heat and chemical resistance used as permselective membranes NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2003-03-11 US disclosed
EP-1213049-A1 RESIN MATERIAL FOR GAS SEPARATION BASE AND PROCESS FOR PRODUCING THE SAME National Institute of Advanced Industrial Science and Technology (JP) 2002-06-12 EP disclosed