SCHEMBL19981313

SCHEMBL19981313

Cc1cc(C2(c3cc(I)c(O)c(I)c3)OC(=O)c3ccccc32)cc(I)c1O

nearest known ligand 0.72

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CXCR1 P25024 1/20 0.72
AVPR2 P30518 1/20 0.72
CCR4 P51679 1/20 0.72
LMNA P02545 5/20 0.67
MAPT P10636 5/20 0.67
MEN1 O00255 4/20 0.67
KMT2A Q03164 4/20 0.67
TDP1 Q9NUW8 4/20 0.67
POLB P06746 3/20 0.67
L3MBTL1 Q9Y468 2/20 0.67
SMN1; SMN2 Q16637 2/20 0.67
AKR1C1 Q04828 1/20 0.62
RECQL P46063 2/20 0.59
BLM P54132 2/20 0.59
ACE2 Q9BYF1 2/20 0.59
USP2 O75604 1/20 0.59
THRB P10828 1/20 0.59
CDK2 P24941 1/20 0.59
CHAT P28329 1/20 0.59
BLVRB P30043 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2833068 0.94 CXCR1 (0.80) CXCR1AVPR2CCR4LMNAMAPT
SCHEMBL19978227 0.92 CXCR1 (0.72) CXCR1AVPR2CCR4LMNAMAPT
SCHEMBL4958920 0.91 LMNA (0.74) CXCR1AVPR2CCR4LMNAMAPT
SCHEMBL6728239 0.85 CXCR1 (0.67) CXCR1AVPR2CCR4LMNAMAPT
SCHEMBL11459322 0.85 AKR1C1 (0.82) CXCR1AVPR2CCR4LMNAMAPT
SCHEMBL31666744 0.80 LMNA (1.00) LMNAMAPTMEN1KMT2ATDP1
SCHEMBL29365023 0.80 LMNA (1.00) LMNAMAPTMEN1KMT2ATDP1
SCHEMBL404777 0.80 LMNA (1.00) LMNAMAPTMEN1KMT2ATDP1
SCHEMBL5968697 0.80 LMNA (0.66) CXCR1AVPR2CCR4LMNAMAPT
SCHEMBL29174125 0.79 LMNA (0.97) LMNAMAPTMEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10303052-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-05-28 US disclosed
US-10281818-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-05-07 US disclosed
US-20180081266-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-22 US disclosed
US-20180081268-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-22 US disclosed