SCHEMBL5976

SCHEMBL5976

CC1(C)OC(=O)CC(=O)O1

nearest known ligand 0.36

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.36
PTPN1 P18031 4/20 0.34
LMNA P02545 2/20 0.34
HSD17B10 Q99714 1/20 0.34
ACP1 P24666 2/20 0.32
CDC25B P30305 2/20 0.32
CYP2C9 P11712 1/20 0.31
GLA P06280 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
ALDH1A1 P00352 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL588864 0.97 TSHR (0.35) TSHRPTPN1LMNAHSD17B10ACP1
Butane SCHEMBL379581 0.89 PTPN1 (0.40) TSHRPTPN1LMNAHSD17B10ACP1
SCHEMBL18825550 0.83 GLA (0.35) GLANPSR1
SCHEMBL18835801 0.82
SCHEMBL783191 0.82
SCHEMBL6926833 0.82
SCHEMBL9678981 0.81 TSHR (0.42) TSHRPTPN1LMNAHSD17B10CYP2C9
SCHEMBL30583022 0.77 TSHR (0.33) TSHRPTPN1LMNAHSD17B10
SCHEMBL16254604 0.77 LMNA (0.38) LMNACYP2C9
SCHEMBL14021451 0.75 ALDH1A1 (0.33) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 12604 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026087561-A1 RETARDING AGENT IN ISOCYANATE COMPONENT OF POLYURETHANE/UREA CEMENTITIOUS HYBRID SYSTEMS SIKA TECHNOLOGY AG (CH) 2026-04-30 WO claimed
EP-4733284-A1 RETARDING AGENT IN ISOCYANATE COMPONENT OF POLYURETHANE/UREA CEMENTITIOUS HYBRID SYSTEMS Sika Technology AG (CH) 2026-04-29 EP claimed
US-20260038743-A1 ELECTROLYTIC CAPACITOR PANASONIC IP MAN CO LTD (JP) 2026-02-05 US claimed
US-12472267-B2 Compositions containing nucleic acid nanoparticles with modular functionality Sixfold Bioscience Ltd. (GB) 2025-11-18 US claimed
US-12469647-B2 Electrolytic capacitor PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2025-11-11 US claimed
EP-3830160-B1 METHODS FOR REDUCING ALDEHYDE EMISSIONS IN POLYURETHANE FOAMS DOW GLOBAL TECHNOLOGIES LLC (US) 2025-06-25 EP claimed
US-20250179239-A1 EPOXY RESIN CURED PRODUCT AND FABRICATING METHOD THEREOF NATIONAL TSING HUA UNIVERSITY (TW) 2025-06-05 US claimed
CN-119977951-A DASAs molecular optical switch capable of realizing solid film isomerization and synthesis method and application thereof 南京理工大学 2025-05-13 CN claimed
US-12287308-B2 Meldrum's acid activated furan (MAF) mass spectrometry compatible staining agent for proteins in polyacrylamide gels Vidyapeetham, Amrita Vishwa (IN) 2025-04-29 US claimed
US-20250115585-A1 METHOD FOR PRODUCING DIHYDROPYRIDAZINE-3,5-DIONE DERIVATIVE CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 2025-04-10 US claimed
US-4547582-A Method of producing herbicide intermediates STAUFFER CHEMICAL COMPANY (US) 1985-10-15 US claimed
EP-0130213-A1 RECORDING MEDIUM FOR OPTICAL DATA STORAGE. MINNESOTA MINING & MFG (US) 1985-01-09 EP claimed
WO-1984002794-A1 RECORDING MEDIUM FOR OPTICAL DATA STORAGE MINNESOTA MINING & MFG (US) 1984-07-19 WO claimed
EP-0101646-A2 Photographic elements incorporating antihalation and/or acutance dyes MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1984-02-29 EP claimed
EP-0034120-B1 DERIVATIVES OF PHENOXY-PHENOXY-CARBOXYLIC ACIDS CIBA-GEIGY AG (CH) 1983-12-14 EP claimed
EP-0050376-B1 5,6,7,8-TETRAHYDROPYRAZOLO(3,4-B)(1,5)DIAZEPIN-1H, 4H-5,7 DIONES AND PROCESS FOR THEIR PREPARATION HOECHST AKTIENGESELLSCHAFT (DE) 1983-12-07 EP claimed
EP-0029901-B1 LITHOGRAPHIC RESIST COMPOSITION FOR USE IN A METHOD OF FORMING A FILM ON A SUBSTRATE International Business Machines Corporation (US) 1983-05-11 EP claimed
US-4339523-A Process for producing photographic images CIBA-GEIGY AG (CH) 1982-07-13 US claimed
US-4284706-A Lithographic resist composition for a lift-off process INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1981-08-18 US claimed
EP-0029901-A1 Lithographic resist composition for use in a method of forming a film on a substrate International Business Machines Corporation (US) 1981-06-10 EP claimed