⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22911698 | 0.93 | — | — | |
| Ethylene Glycol SCHEMBL29044363 | 0.90 | TSHR (0.41) | — | |
| SCHEMBL22911644 | 0.90 | DNM1 (0.50) | — | |
| SCHEMBL29003974 | 0.77 | CA12 (0.56) | — | |
| SCHEMBL6901948 | 0.74 | CA12 (0.52) | — | |
| SCHEMBL2598229 | 0.69 | — | — | |
| SCHEMBL7795070 | 0.69 | — | — | |
| SCHEMBL5815106 | 0.65 | — | — | |
| SCHEMBL31197290 | 0.64 | — | — | |
| SCHEMBL28569011 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 258 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12338369-B2 | Nitride inhibitors for high selectivity of TiN—SiN CMP applications | CMC MATERIALS LLC (US) | 2025-06-24 | — | — | US | claimed |
| US-20240199917-A1 | NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TiN-SiN CMP APPLICATIONS | CMC MATERIALS LLC | 2024-06-20 | — | — | US | claimed |
| EP-4056659-B1 | NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TIN-SIN CMP APPLICATIONS | CMC MAT LLC (US) | 2024-04-03 | — | — | EP | claimed |
| CN-116134588-A | Composition and method for selectively etching silicon nitride film | 恩特格里斯公司 | 2023-05-16 | — | — | CN | claimed |
| EP-3681963-B1 | NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TIN-SIN CMP APPLICATIONS | CMC MAT INC (US) | 2023-05-10 | — | — | EP | claimed |
| US-11492707-B2 | Method for specifically adjusting the electrical conductivity of conversion coatings | CHEMETALL GMBH (DE) | 2022-11-08 | — | — | US | claimed |
| EP-4056659-A1 | NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TIN-SIN CMP APPLICATIONS | CMC Materials, Inc. (US) | 2022-09-14 | — | — | EP | claimed |
| CN-111108161-B | High selectivity nitride inhibitors for TiN-SiN CMP applications | CMC材料股份有限公司 | 2022-06-14 | — | — | CN | claimed |
| EP-3280830-B1 | METHOD FOR SPECIFICALLY ADJUSTING THE ELECTRICAL CONDUCTIVITY OF CONVERSION COATINGS | CHEMETALL GMBH (DE) | 2021-03-31 | — | — | EP | claimed |
| EP-3681963-A2 | NITRIDE INHIBITORS FOR HIGH SELECTIVITY OF TIN-SIN CMP APPLICATIONS | Cabot Microelectronics Corporation (US) | 2020-07-22 | — | — | EP | claimed |
| CN-1326199-C | Polishing composition comprising inhibitor of tungsten erosion | CABOT CORP (US) | 2007-07-11 | — | — | CN | claimed |
| CN-1966594-A | Polishing composition for metal cmp | CABOT MICROELECTRONICS CORP (US) | 2007-05-23 | — | — | CN | claimed |
| EP-0896042-B1 | A polishing composition including an inhibitor of tungsten etching | CABOT MICROELECTRONICS CORP (US) | 2005-02-09 | — | — | EP | claimed |
| EP-1458543-A1 | CONTINUOUS PROCESS FOR IMPREGNATING SOLID ADSORBENT PARTICLES INTO SHAPED MICRO-CAVITY FIBERS AND FIBER FILTERS | Philip Morris Products Inc. (US) | 2004-09-22 | — | — | EP | claimed |
| CN-1142237-C | Stepped synthesis process of preparing stable inorganics-based solid tunable dye laser medium | 浙江大学 | 2004-03-17 | — | — | CN | claimed |
| WO-2003047836-A1 | CONTINUOUS PROCESS FOR IMPREGNATING SOLID ADSORBENT PARTICLES INTO SHAPED MICRO-CAVITY FIBERS AND FIBER FILTERS | PHILIP MORRIS PRODUCTS S.A. (US) | 2003-06-12 | — | — | WO | claimed |
| CN-1272221-A | Polishing composition comprising inhibitor of tungsten erosion | CABOT CORP (US) | 2000-11-01 | — | — | CN | claimed |
| US-6136711-A | CHEMICAL MECHANICAL POLISHING MIXTURE COMPRISING A STABILIZER TO MINIMIZE ETCHING AND CORROSION | CABOT CORPORATION (US) | 2000-10-24 | — | — | US | claimed |
| EP-0896042-A1 | A polishing composition including an inhibitor of tungsten etching | Cabot Corporation (US) | 1999-02-10 | — | — | EP | claimed |
| WO-1999005706-A1 | A POLISHING COMPOSITION INCLUDING AN INHIBITOR OF TUNGSTEN ETCHING | CABOT CORPORATION (US) | 1999-02-04 | — | — | WO | claimed |