SCHEMBL599357

SCHEMBL599357

O=C(C(F)F)N(F)c1ccc(F)c([Ti](C2=CC=CC2)(C2=CC=CC2)c2c(F)ccc(N(F)C(=O)C(F)F)c2F)c1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL482609 0.80 GAA (0.31)
SCHEMBL483281 0.79 FSCN1 (0.35)
SCHEMBL599903 0.78 MLYCD (0.34)
SCHEMBL483156 0.76 ADORA2A (0.32)
SCHEMBL482898 0.75
SCHEMBL483290 0.75 MLYCD (0.36)
SCHEMBL483202 0.74 EPHX2 (0.31)
SCHEMBL5915980 0.74
SCHEMBL9865579 0.74
SCHEMBL3914162 0.73 CES2 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8114569-B2 Maskless photopolymer exposure process and apparatus PHOTOCENTRIC LIMITED (GB) 2012-02-14 US disclosed
US-20090190107-A1 MASKLESS PHOTOPOLYMER EXPOSURE PROCESS AND APPARATUS PHOTOCENTRIC LIMITED (GB) 2009-07-30 US disclosed
EP-1728838-B1 Ink composition for ink jet-recording and method for preparing lithographic printing plate using the same FUJIFILM CORP (JP) 2007-08-15 EP disclosed
EP-1728838-A1 Ink composition for ink jet-recording and method for preparing lithographic printing plate using the same Fuji Photo Film Co., Ltd. (JP) 2006-12-06 EP disclosed
US-20060268083-A1 Ink composition for ink jet-recording and method for preparing lithographic printing plate using the same FUJI PHOTO FILM CO., LTD. 2006-11-30 US disclosed