SCHEMBL5998050

SCHEMBL5998050

C1CCN2CCN=C2C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10709654 0.98 INMT (0.83) —
SCHEMBL6859946 0.98 INMT (0.83) —
SCHEMBL2848542 0.98 INMT (0.83) —
SCHEMBL1696760 0.90 INMT (0.95) —
SCHEMBL10058697 0.90 INMT (0.86) —
SCHEMBL496207 0.88 INMT (0.91) —
SCHEMBL2952223 0.88 INMT (0.91) —
SCHEMBL6859113 0.88 INMT (0.91) —
SCHEMBL20718625 0.88 INMT (0.91) —
SCHEMBL17417853 0.88 INMT (1.00) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4678669-A1 POLYMER, RESIN PARTICLES INCLUDING SAID POLYMER, AQUEOUS DISPERSION, INK, METHOD FOR PRODUCING PRINTED OBJECT USING SAID INK, ARTICLE WITH FIXED IMAGE, AND POLYMERIZABLE MONOMER Nippon Shokubai Co., Ltd. (JP) 2026-01-14 — — EP disclosed
CN-118878466-A Trifluoro-azole and its preparation method 特里纳普克公司 2024-11-01 — — CN disclosed
WO-2024185869-A1 POLYMER, RESIN PARTICLES INCLUDING SAID POLYMER, AQUEOUS DISPERSION, INK, METHOD FOR PRODUCING PRINTED OBJECT USING SAID INK, ARTICLE WITH FIXED IMAGE, AND POLYMERIZABLE MONOMER 株式会社日本触媒 2024-09-12 — — WO disclosed
CN-115038692-B Trifluoro-azole and its preparation method 特里纳普克公司 2024-07-16 — — CN disclosed
CN-117935945-A Screening method of Cu-TEMPO catalytic system 内蒙古工业大学 2024-04-26 — — CN disclosed
WO-2023191270-A1 GEL POLYMER ELECTROLYTE COMPOSITION ATTAINING SHORTENED CROSSLINKING TIME, SECONDARY BATTERY COMPRISING SAME, AND MANUFACTURING METHOD FOR SECONDARY BATTERY 주식회사 엘지에너지솔루션 2023-10-05 — — WO disclosed
WO-2023134608-A1 FUSED RING COMPOUNDS SERVING AS HPK1 INHIBITORS 微境生物医药科技(上海)有限公司 2023-07-20 — — WO disclosed
WO-2023116527-A1 COMPOUND AS FAK INHIBITOR AND USE THEREOF 微境生物医药科技(上海)有限公司 2023-06-29 — — WO disclosed
CN-114729079-B Catalyst components for the polymerization of olefins 巴塞尔聚烯烃意大利有限公司 2023-01-24 — — CN disclosed
EP-4097089-A1 TRIFLAZOLES AND METHODS OF MAKING THE SAME Trinapco, Inc (US) 2022-12-07 — — EP disclosed
US-7087798-B2 Process for preparation of spirofluorenols TOKUYAMA CORPORATION (JP) 2006-08-08 — — US disclosed
US-20060025636-A1 Process for preparation of spirofluorenols TOKUYAMA CORPORATION (JP) 2006-02-02 — — US disclosed
EP-1547993-A1 PROCESS FOR PREPARATION OF SPIROFLUORENOLS Tokuyama Corporation (JP) 2005-06-29 — — EP disclosed
EP-0329008-B1 Cephalosporinderivatives and process for its preparation HOECHST AG (DE) 1999-08-11 — — EP disclosed
US-5306717-A Cephalosporin derivatives HOECHST AKTIENGESELLSCHAFT (DE) 1994-04-26 — — US disclosed
EP-0390066-A2 Cephalosporinderivatives and process for their preparation HOECHST AKTIENGESELLSCHAFT (DE) 1990-10-03 — — EP disclosed
EP-0379132-A2 Cephalosporin derivatives and process for their preparation HOECHST AKTIENGESELLSCHAFT (DE) 1990-07-25 — — EP disclosed
EP-0334281-A2 Cephalosporin derivatives and process for their preparation HOECHST AKTIENGESELLSCHAFT (DE) 1989-09-27 — — EP disclosed
EP-0329008-A2 Cephalosporinderivatives and process for its preparation HOECHST AKTIENGESELLSCHAFT (DE) 1989-08-23 — — EP disclosed
EP-0080171-B1 HEAT-INSULATING MOULDING AND PROCESS FOR PREPARING THE SAME Hitachi, Ltd. (JP) 1988-06-08 — — EP disclosed
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