SCHEMBL5998050

SCHEMBL5998050

C1CCN2CCN=C2C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6859946 0.98 INMT (0.83)
SCHEMBL2848542 0.98 INMT (0.83)
SCHEMBL10709654 0.98 INMT (0.83)
SCHEMBL10058697 0.90 INMT (0.86)
SCHEMBL1696760 0.90 INMT (0.95)
SCHEMBL3270217 0.88 INMT (0.91)
SCHEMBL2401189 0.88 INMT (1.00)
SCHEMBL3047 0.88 INMT (1.00)
SCHEMBL20718625 0.88 INMT (0.91)
SCHEMBL6853620 0.88 INMT (1.00)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4678669-A1 POLYMER, RESIN PARTICLES INCLUDING SAID POLYMER, AQUEOUS DISPERSION, INK, METHOD FOR PRODUCING PRINTED OBJECT USING SAID INK, ARTICLE WITH FIXED IMAGE, AND POLYMERIZABLE MONOMER Nippon Shokubai Co., Ltd. (JP) 2026-01-14 EP disclosed
CN-118878466-A Trifluoro-azole and its preparation method 特里纳普克公司 2024-11-01 CN disclosed
WO-2024185869-A1 POLYMER, RESIN PARTICLES INCLUDING SAID POLYMER, AQUEOUS DISPERSION, INK, METHOD FOR PRODUCING PRINTED OBJECT USING SAID INK, ARTICLE WITH FIXED IMAGE, AND POLYMERIZABLE MONOMER 株式会社日本触媒 2024-09-12 WO disclosed
CN-115038692-B Trifluoro-azole and its preparation method 特里纳普克公司 2024-07-16 CN disclosed
CN-117935945-A Screening method of Cu-TEMPO catalytic system 内蒙古工业大学 2024-04-26 CN disclosed
WO-2023191270-A1 GEL POLYMER ELECTROLYTE COMPOSITION ATTAINING SHORTENED CROSSLINKING TIME, SECONDARY BATTERY COMPRISING SAME, AND MANUFACTURING METHOD FOR SECONDARY BATTERY 주식회사 엘지에너지솔루션 2023-10-05 WO disclosed
WO-2023134608-A1 FUSED RING COMPOUNDS SERVING AS HPK1 INHIBITORS 微境生物医药科技(上海)有限公司 2023-07-20 WO disclosed
WO-2023116527-A1 COMPOUND AS FAK INHIBITOR AND USE THEREOF 微境生物医药科技(上海)有限公司 2023-06-29 WO disclosed
CN-114729079-B Catalyst components for the polymerization of olefins 巴塞尔聚烯烃意大利有限公司 2023-01-24 CN disclosed
EP-4097089-A1 TRIFLAZOLES AND METHODS OF MAKING THE SAME Trinapco, Inc (US) 2022-12-07 EP disclosed
US-7087798-B2 Process for preparation of spirofluorenols TOKUYAMA CORPORATION (JP) 2006-08-08 US disclosed
US-20060025636-A1 Process for preparation of spirofluorenols TOKUYAMA CORPORATION (JP) 2006-02-02 US disclosed
EP-1547993-A1 PROCESS FOR PREPARATION OF SPIROFLUORENOLS Tokuyama Corporation (JP) 2005-06-29 EP disclosed
EP-0329008-B1 Cephalosporinderivatives and process for its preparation HOECHST AG (DE) 1999-08-11 EP disclosed
US-5306717-A Cephalosporin derivatives HOECHST AKTIENGESELLSCHAFT (DE) 1994-04-26 US disclosed
EP-0390066-A2 Cephalosporinderivatives and process for their preparation HOECHST AKTIENGESELLSCHAFT (DE) 1990-10-03 EP disclosed
EP-0379132-A2 Cephalosporin derivatives and process for their preparation HOECHST AKTIENGESELLSCHAFT (DE) 1990-07-25 EP disclosed
EP-0334281-A2 Cephalosporin derivatives and process for their preparation HOECHST AKTIENGESELLSCHAFT (DE) 1989-09-27 EP disclosed
EP-0329008-A2 Cephalosporinderivatives and process for its preparation HOECHST AKTIENGESELLSCHAFT (DE) 1989-08-23 EP disclosed
EP-0080171-B1 HEAT-INSULATING MOULDING AND PROCESS FOR PREPARING THE SAME Hitachi, Ltd. (JP) 1988-06-08 EP disclosed