SCHEMBL600483

SCHEMBL600483

CN([Hf])C(=O)C(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1106444 0.76
SCHEMBL19091449 0.73 MEN1 (0.34)
SCHEMBL3280248 0.71
SCHEMBL5929194 0.69
SCHEMBL26437446 0.69
SCHEMBL10223535 0.69 PHF8 (0.35)
SCHEMBL5543091 0.69 MEN1 (0.32)
SCHEMBL18583960 0.67 MEN1 (0.32)
SCHEMBL19353710 0.67 MEN1 (0.34)
SCHEMBL16944043 0.67 ALDH1A1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8481122-B2 Methods of forming material over substrates MICRON TECHNOLOGY, INC. (US) 2013-07-09 US claimed
US-20060251813-A1 Methods of forming material over substrates MICRON SEMICONDUCTOR PRODUCTS, INC. 2006-11-09 US claimed
US-20050227003-A1 Methods of forming material over substrates MICRON TECHNOLOGY, INC. 2005-10-13 US claimed
US-8481122-B2 Methods of forming material over substrates MICRON TECHNOLOGY, INC. (US) 2013-07-09 US disclosed
US-8299462-B2 Constructions comprising hafnium oxide and/or zirconium oxide ROUND ROCK RESEARCH, LLC (US) 2012-10-30 US disclosed
US-20120037902-A1 CONSTRUCTIONS COMPRISING HAFNIUM OXIDE AND/OR ZIRCONIUM OXIDE ROUND ROCK RESEARCH, LLC (US) 2012-02-16 US disclosed
US-8049304-B2 Constructions comprising hafnium oxide and/or zirconium oxide ROUND ROCK RESEARCH, LLC (US) 2011-11-01 US disclosed
US-20090195967-A1 Constructions Comprising Hafnium Oxide And/Or Zirconium Oxide MICRON TECHNOLOGY, INC. (US) 2009-08-06 US disclosed
US-7537804-B2 ALD methods in which two or more different precursors are utilized with one or more reactants to form materials over substrates MICRON TECHNOLOGY, INC. (US) 2009-05-26 US disclosed
US-20070252244-A1 Methods of forming material over substrates MICRON TECHNOLOGY, INC. 2007-11-01 US disclosed
US-20060251813-A1 Methods of forming material over substrates MICRON SEMICONDUCTOR PRODUCTS, INC. 2006-11-09 US disclosed
US-20050227003-A1 Methods of forming material over substrates MICRON TECHNOLOGY, INC. 2005-10-13 US disclosed