SCHEMBL6007615

SCHEMBL6007615

CCc1ccccc1OP(O)Oc1ccccc1CC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 5/20 0.48
MAPT P10636 2/20 0.48
NPSR1 Q6W5P4 1/20 0.48
HPGD P15428 1/20 0.42
ATM Q13315 1/20 0.42
GABRA1 P14867 2/20 0.41
GABRB2 P47870 2/20 0.41
TSHR P16473 1/20 0.40
HSD17B10 Q99714 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.39
DHODH Q02127 1/20 0.39
KDM4E B2RXH2 2/20 0.39
NISCH Q9Y2I1 1/20 0.38
THRA P10827 1/20 0.37
THRB P10828 1/20 0.37
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
HTT P42858 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29551622 1.00 L3MBTL1 (0.48) L3MBTL1MAPTNPSR1HPGDATM
SCHEMBL31357462 0.88 L3MBTL1 (0.48) L3MBTL1MAPTNPSR1HPGDATM
SCHEMBL9052967 0.88 L3MBTL1 (0.48) L3MBTL1MAPTNPSR1HPGDATM
SCHEMBL28756877 0.86 L3MBTL1 (0.47) L3MBTL1MAPTNPSR1HPGDATM
SCHEMBL31357461 0.85 L3MBTL1 (0.53) L3MBTL1MAPTNPSR1HPGDATM
SCHEMBL270096 0.85 L3MBTL1 (0.53) L3MBTL1MAPTNPSR1HPGDATM
SCHEMBL18738920 0.83 L3MBTL1 (0.52) L3MBTL1MAPTNPSR1HPGDATM
SCHEMBL27793013 0.81 L3MBTL1 (0.43) L3MBTL1MAPTNPSR1HPGDATM
SCHEMBL10348761 0.80 THRA (0.56) THRATHRB
SCHEMBL5960875 0.79 L3MBTL1 (0.48) L3MBTL1MAPTNPSR1HPGDATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115113482-A Negative photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film 信越化学工业株式会社 2022-09-27 CN disclosed
CN-115113484-A Positive photosensitive resin composition, positive photosensitive dry film, method for producing the same, and method for forming pattern 信越化学工业株式会社 2022-09-27 CN disclosed
CN-111936577-A Polyester resin composition 三菱瓦斯化学株式会社 2020-11-13 CN disclosed
EP-0967674-B1 Solid polymer electrolytes HONDA MOTOR CO LTD (JP) 2006-03-22 EP disclosed
EP-1085034-B1 Proton conducting polymer, method for producing the same, solid polymer electrolyte and electrode HONDA MOTOR CO LTD (JP) 2005-12-28 EP disclosed
US-6770393-B2 FOR FUEL CELL HONDA GIKEN KOGYO KABUSHIKI KAISHA (JP) 2004-08-03 US disclosed
US-6767664-B2 DOPING META TYPE POLYANILINE SOLUTION WITH AN ORGANIC OR INORGANIC PHOSPHORIC ACID COMPOUND HONDA GIKEN KOGYO KABUSHIKI KAISHA (JP) 2004-07-27 US disclosed
EP-1090944-B1 Method for producing meta type polyaniline HONDA MOTOR CO LTD (JP) 2003-07-30 EP disclosed
US-20030001143-A1 Proton conducting polymer, method for producing the same, solid polymer electrolyte and electrode HONDA GIKEN KOGYO KABUSHIKI KAISHA 2003-01-02 US disclosed
US-20020185631-A1 Proton conducting polymer, method for producing the same, solid polymer electrolyte and electrode HONDA GIKEN KOGYO KABUSHIKI KAISHA 2002-12-12 US disclosed
US-6478987-B1 Proton conducting polymer, method for producing the same, solid polymer electrolyte and electrode HONDA GIKEN KOGYO KABUSHIKI KAISHA (JP) 2002-11-12 US disclosed
US-6303053-B1 POLYMERIZING AN ANILINE IN WATER OR AN ORGANIC SOLVENT SELECTED FROM N-METHYL-2-PYRROLIDONE, N,N-DIMETHYL SULFOXIDE, N,N-DIMETHYLACETAMIDE AND N,N-DIMETHYLFORMAMIDE, IN THE PRESENCE OF AT LEAST ONE OXIDIZING AGENT HONDA GIKEN KOGYO KABUSHIKI KAISHA (JP) 2001-10-16 US disclosed
EP-1090944-A2 Method for producing meta type polyaniline Honda Giken Kogyo Kabushiki Kaisha (JP) 2001-04-11 EP disclosed
EP-1085034-A1 Proton conducting polymer, method for producing the same, solid polymer electrolyte and electrode Honda Giken Kogyo Kabushiki Kaisha (JP) 2001-03-21 EP disclosed
US-6124060-A A POLY-2,5-BENZIMIDAZOLE DOPED WITH AN ACID IN WHICH A HYDROGEN ATOM OF AN INORGANIC ACID IS REPLACED WITH A PHENYL GROUP; MADE BY A WRINKLE-RESISTANT SOLUTION BLEND METHOD; LOW WATER ABSORPTION; NO DOPANT LEAKAGE WHEN PRESSED; FUEL CELLS HONDA GIKEN KOGYO KABUSHIKI KAISHA (JP) 2000-09-26 US disclosed
EP-0967674-A1 Solid polymer electrolytes HONDA GIKEN KOGYO KABUSHIKI KAISHA (JP) 1999-12-29 EP disclosed