SCHEMBL6007652

SCHEMBL6007652

CCc1cccc2[nH]c3ccccc3c12

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BCHE P06276 2/20 0.61
ACHE P22303 2/20 0.61
MEN1 O00255 1/20 0.59
POLB P06746 1/20 0.59
MAPT P10636 1/20 0.59
KMT2A Q03164 1/20 0.59
IMPDH2 P12268 1/20 0.53
IMPDH1 P20839 1/20 0.53
NPEPPS P55786 1/20 0.51
KIF11 P52732 1/20 0.49
ALDH1A1 P00352 2/20 0.48
GPR3 P46089 1/20 0.48
HSD17B10 Q99714 1/20 0.48
UTS2R Q9UKP6 3/20 0.47
DAO P14920 1/20 0.47
DDO Q99489 1/20 0.47
ABCG2 Q9UNQ0 1/20 0.47
GABRP O00591 1/20 0.47
GABRD O14764 1/20 0.47
GABRA1 P14867 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28220277 0.87 ABCG2 (0.59) BCHEACHEMEN1POLBMAPT
SCHEMBL6009050 0.86 MAPT (0.54) BCHEACHEMEN1POLBMAPT
SCHEMBL29475607 0.85 BCHE (0.58) BCHEACHEMEN1POLBMAPT
SCHEMBL6009655 0.85 BCHE (0.58) BCHEACHEMEN1POLBMAPT
SCHEMBL12500019 0.82 IMPDH2 (0.60) BCHEACHEMEN1POLBMAPT
SCHEMBL31287843 0.82 BCHE (0.55) BCHEACHEMEN1POLBMAPT
SCHEMBL27844290 0.81 MEN1 (0.63) BCHEACHEMEN1POLBMAPT
SCHEMBL9999596 0.81 BCHE (0.57) BCHEACHEMEN1POLBMAPT
SCHEMBL8981569 0.81 BCHE (0.57) BCHEACHEMEN1POLBMAPT
SCHEMBL19772858 0.80 BCHE (0.65) BCHEACHEMEN1POLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117250292-A Separation and analysis method of heteroatom compounds in petroleum geological sample and application thereof 中国石油天然气股份有限公司 2023-12-19 CN disclosed
US-10043978-B2 Organic semiconductor formulations FLEXTERRA, INC. (US) 2018-08-07 US disclosed
US-20170012208-A1 ORGANIC SEMICONDUCTOR FORMULATIONS USINVEST LLC 2017-01-12 US disclosed
US-9293711-B2 Organic semiconductor formulations POLYERA CORPORATION (US) 2016-03-22 US disclosed
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 US disclosed
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 US disclosed
US-20140042369-A1 Organic Semiconductor Formulations USINVEST LLC 2014-02-13 US disclosed
US-20130029255-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-31 US disclosed
US-20130029255-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-31 US disclosed
US-20060183022-A1 Electrochemical cell NEC TOKIN CORORATION (JP) 2006-08-17 US disclosed