SCHEMBL6008977

SCHEMBL6008977

C=CC(=O)OC(C)Oc1ccc(CCC)cc1

nearest known ligand 0.66

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
THRB P10828 8/20 0.66
PPARG P37231 1/20 0.45
PPARA Q07869 1/20 0.45
ACACB O00763 3/20 0.40
ACACA Q13085 1/20 0.40
THRA P10827 5/20 0.40
ALDH1A1 P00352 2/20 0.40
FFAR1 O14842 1/20 0.39
POLB P06746 1/20 0.39
KMT2A Q03164 2/20 0.38
MEN1 O00255 1/20 0.38
MAPT P10636 1/20 0.38
PLA2G1B P04054 1/20 0.38
ATG4B Q9Y4P1 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8672443 0.93 THRB (0.61) THRBPPARGPPARAACACBACACA
SCHEMBL11032805 0.92 THRB (0.62) THRBPPARATHRAALDH1A1KMT2A
SCHEMBL3411458 0.89 THRB (0.67) THRBPPARATHRAALDH1A1KMT2A
SCHEMBL4152003 0.87 THRB (0.46) THRBPPARGPPARAACACBALDH1A1
SCHEMBL27621621 0.86 THRB (0.62) THRBPPARGPPARAACACBACACA
SCHEMBL20873363 0.84 THRB (0.64) THRBPPARGPPARAACACBACACA
SCHEMBL8672446 0.84 THRB (0.59) THRBPPARGPPARAACACBACACA
SCHEMBL28697689 0.83 PPARG (0.43) THRBPPARGPPARAACACBPOLB
SCHEMBL13296348 0.82 CYP1A2 (0.45) THRBACACBACACAKMT2AMAPT
SCHEMBL10870942 0.82 THRB (0.50) THRBTHRAALDH1A1POLBKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105722494-A Impact modified denture base compositions 登士柏国际公司 2016-06-29 CN claimed
CN-109565020-B Composition for functional layer of nonaqueous secondary battery, functional layer for nonaqueous secondary battery, and method for producing electrode for nonaqueous secondary battery 日本瑞翁株式会社 2023-04-04 CN disclosed
CN-115073661-A Resin composition and display device using same 三星显示有限公司 2022-09-20 CN disclosed
CN-103748744-B Anisotropic conductive film, process for producing anisotropic conductive film, connecting method, and bonded object 迪睿合电子材料有限公司 2017-02-22 CN disclosed
CN-105722494-A Impact modified denture base compositions 登士柏国际公司 2016-06-29 CN disclosed
CN-105555818-A Method for producing block copolymer, and block copolymer obtained using same DAINIPPON INK & CHEMICALS 2016-05-04 CN disclosed
CN-105374892-A Thin-film solar cell module and method for manufacturing thin-film solar cell module DEXERIALS CORP 2016-03-02 CN disclosed
CN-103502379-B Anisotropic conductive connecting material, film laminated body, method of attachment and connection structural bodies DEXERIALS CORP. (JP) 2016-02-10 CN disclosed
CN-105282994-A Bonded body and method for producing the same DEXERIALS CORP 2016-01-27 CN disclosed
CN-103119117-B Anisotropic conductive material and manufacture method thereof DEXERIALS CORP. (JP) 2015-12-09 CN disclosed
CN-103069656-B Anisotropic conductive film, method for producing bonded body, and bonded body DEXERIALS CORP. (JP) 2015-09-02 CN disclosed
CN-104559902-A Circuit connecting material, circuit member connecting structure, and method for manufacturing circuit member connecting structure HITACHI CHEMICAL CO LTD 2015-04-29 CN disclosed
CN-104428904-A Solar cell module and manufacturing method for same DEXERIALS CORP 2015-03-18 CN disclosed
CN-102820600-A Paste method, connection method, connection structure and manufacturing method for adhesive film SONY CHEMICALS CORP 2012-12-12 CN disclosed
US-20060034035-A1 Nonaqueous electrolyte, electrical double-layer capacitors, and nonaqueous electrolyte secondary cells NISSHINBO INDUSTRIES, INC. (JP) 2006-02-16 US disclosed
CN-1210620-C Ultraviolet-curable resin composition and photosolder resist ink containing same GOO CHEMICAL CO LTD (JP) 2005-07-13 CN disclosed
CN-1187383-C Water absorbency material DAINIPPON INK & CHEMICALS (JP) 2005-02-02 CN disclosed
CN-1459049-A Ultraviolet-curable resin composition and photosolder resist ink contaning the composition GOO CHEMICAL CO LTD (JP) 2003-11-26 CN disclosed
CN-1381511-A Water absorbency material DAINIPPON INK & CHEMICALS (JP) 2002-11-27 CN disclosed
EP-0133357-A2 Polymer composition RAYCHEM LIMITED (GB) 1985-02-20 EP disclosed