SCHEMBL3411458

SCHEMBL3411458

C=CC(=O)OC(C)Oc1ccc(CCCCCCCCC)cc1

nearest known ligand 0.67

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
THRB P10828 13/20 0.67
THRA P10827 11/20 0.53
MEN1 O00255 1/20 0.53
KMT2A Q03164 1/20 0.53
PPARA Q07869 1/20 0.49
ALDH1A1 P00352 1/20 0.42
PLA2G1B P04054 3/20 0.42
ATG4B Q9Y4P1 3/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11032805 0.95 THRB (0.62) THRBTHRAMEN1KMT2APPARA
SCHEMBL6008977 0.89 THRB (0.66) THRBTHRAMEN1KMT2APPARA
SCHEMBL8672443 0.83 THRB (0.61) THRBTHRAMEN1KMT2APPARA
SCHEMBL13397699 0.82 THRB (0.64) THRBTHRAMEN1KMT2APPARA
SCHEMBL1446424 0.82 THRB (0.64) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL10651481 0.82 THRB (0.97) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL4475071 0.82 THRB (0.97) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL28432245 0.82 THRB (0.97) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL6931228 0.82 THRB (0.97) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL2289080 0.82 THRB (0.97) THRBTHRAMEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0548870-B1 Color filter OJI KAKO KK (JP) 1997-11-05 EP claimed
EP-0548870-A1 Color filter OJI KAKO CO., LTD. (JP) 1993-06-30 EP claimed
EP-3018118-B1 BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2023-07-05 EP disclosed
EP-3327002-B1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2020-08-19 EP disclosed
US-10428014-B2 Base generator, base-reactive composition containing said base generator, and base generation method FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-01 US disclosed
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-01 US disclosed
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-01-03 US disclosed
EP-3098226-B1 BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR FUJIFILM WAKO PURE CHEMICAL CORP (JP) 2018-12-12 EP disclosed
US-10100070-B2 Borate-based base generator, and base-reactive composition comprising such base generator FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2018-10-16 US disclosed
EP-3327002-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR Wako Pure Chemical Industries, Ltd. (JP) 2018-05-30 EP disclosed
EP-3098226-A1 BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR Wako Pure Chemical Industries, Ltd. (JP) 2016-11-30 EP disclosed
US-20100015360-A1 AQUEOUS INK COMPOSITION, AQUEOUS INK COMPOSITION FOR INKJET RECORDING, AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2010-01-21 US disclosed
EP-2145932-A1 Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method Fujifilm Corporation (JP) 2010-01-20 EP disclosed
US-7217743-B2 Curable white ink KONICA CORPORATION (JP) 2007-05-15 US disclosed
US-6900250-B2 Polymerizable composition TOYO INK MFG. CO., LTD. (JP) 2005-05-31 US disclosed
US-20040019128-A1 Curable white ink KONICA CORPORATION (JP) 2004-01-29 US disclosed
US-20030212162-A1 Photopolymerization using photoinitiators TOYO INK MFG. CO., LTD. (JP) 2003-11-13 US disclosed
EP-0548870-B1 Color filter OJI KAKO KK (JP) 1997-11-05 EP disclosed
EP-0548870-A1 Color filter OJI KAKO CO., LTD. (JP) 1993-06-30 EP disclosed
US-4789620-A CROSSLINKED, CURED COATING MITSUBISHI RAYON CO. LTD. (JP) 1988-12-06 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10428015-B2 Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator REV1, RER1, CBR1 THRB 2566/4885THRA 1105/4885MEN1 1882/4885
US-10100070-B2 Borate-based base generator, and base-reactive composition comprising such base generator BLM, HPRT1, BROX THRB 2506/4885THRA 2289/4885MEN1 28/4885
US-10428014-B2 Base generator, base-reactive composition containing said base generator, and base generation method HPRT1, GNG2, BLM THRB 3306/4885THRA 3148/4885MEN1 31/4885
US-20190002403-A1 ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR REV1, RER1, CBR1 THRB 2566/4885THRA 1105/4885MEN1 1882/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.