SCHEMBL6011044

SCHEMBL6011044

CC(C)(OC(=O)C1CC2C=CC1C2)C1CC2CCC1O2

nearest known ligand 0.36

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.36
LMNA P02545 1/20 0.36
ALDH1A1 P00352 4/20 0.34
SLC6A3 Q01959 8/20 0.34
SLC6A4 P31645 5/20 0.34
POLB P06746 2/20 0.33
APEX1 P27695 1/20 0.33
RECQL P46063 1/20 0.33
BLM P54132 1/20 0.33
ESR2 Q92731 1/20 0.33
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
HPGD P15428 1/20 0.33
KMT2A Q03164 2/20 0.32
RAB9A P51151 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6725051 0.76 POLB (0.40) KDM4ELMNAALDH1A1SLC6A3SLC6A4
SCHEMBL22263881 0.76 LMNA (0.41) KDM4ELMNAALDH1A1POLBAPEX1
SCHEMBL525442 0.75 LMNA (0.41) KDM4ELMNAALDH1A1POLBAPEX1
SCHEMBL30862606 0.75 KDM4E (0.49) KDM4ELMNAALDH1A1POLBAPEX1
SCHEMBL14628488 0.75 KDM4E (0.49) KDM4ELMNAALDH1A1POLBAPEX1
SCHEMBL525537 0.75 KDM4E (0.49) KDM4ELMNAALDH1A1POLBAPEX1
SCHEMBL14534917 0.75 KDM4E (0.49) KDM4ELMNAALDH1A1POLBAPEX1
SCHEMBL3880815 0.74 KDM4E (0.38) KDM4ELMNAALDH1A1SLC6A3POLB
SCHEMBL524856 0.74 KDM4E (0.40) KDM4ELMNAALDH1A1POLBAPEX1
SCHEMBL524862 0.74 KDM4E (0.40) KDM4ELMNAALDH1A1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1403295-B1 Ester compounds, polymers, resist compositions and patterning process SHINETSU CHEMICAL CO (JP) 2014-10-22 EP disclosed
EP-1403295-B1 Ester compounds, polymers, resist compositions and patterning process SHINETSU CHEMICAL CO (JP) 2014-10-22 EP disclosed
US-7132215-B2 Ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-11-07 US disclosed
US-20060234160-A1 Novel ester compounds, polymers, resist compositions and patterning process HASEGAWA KOJI 2006-10-19 US disclosed
US-20040068124-A1 Novel ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-04-08 US disclosed
EP-1403295-A2 Ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-03-31 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040068124-A1 Novel ester compounds, polymers, resist compositions and patterning process DHCR24, EEF1D, MUS81 KDM4E 1654/4885LMNA 1555/4885ALDH1A1 1540/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.