Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 3/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | BLM | P54132 | 1/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL524856 | 0.89 | KDM4E (0.40) | KDM4ELMNAALDH1A1HPGDPOLB | |
| SCHEMBL22263881 | 0.89 | LMNA (0.41) | KDM4ELMNAALDH1A1HPGDPOLB | |
| SCHEMBL525442 | 0.87 | LMNA (0.41) | KDM4ELMNAALDH1A1HPGDPOLB | |
| SCHEMBL22372814 | 0.85 | KDM4E (0.39) | KDM4ELMNAALDH1A1HPGDPOLB | |
| SCHEMBL525477 | 0.84 | ALDH1A1 (0.38) | KDM4ELMNAALDH1A1HPGDPOLB | |
| SCHEMBL30862606 | 0.79 | KDM4E (0.49) | KDM4ELMNAALDH1A1HPGDPOLB | |
| SCHEMBL14628488 | 0.79 | KDM4E (0.49) | KDM4ELMNAALDH1A1HPGDPOLB | |
| SCHEMBL525537 | 0.79 | KDM4E (0.49) | KDM4ELMNAALDH1A1HPGDPOLB | |
| SCHEMBL14534917 | 0.79 | KDM4E (0.49) | KDM4ELMNAALDH1A1HPGDPOLB | |
| SCHEMBL22263654 | 0.77 | LMNA (0.41) | KDM4ELMNAALDH1A1HPGDPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 361 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11556056-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-17 | — | — | US | disclosed |
| CN-107207456-B | Latent acids and their use | 巴斯夫欧洲公司 | 2021-05-04 | — | — | CN | disclosed |
| EP-3253735-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2021-03-31 | — | — | EP | disclosed |
| US-10795258-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-10-06 | — | — | US | disclosed |
| US-10774029-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-15 | — | — | US | disclosed |
| US-10766992-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-08 | — | — | US | disclosed |
| US-10725380-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-07-28 | — | — | US | disclosed |
| US-10599033-B2 | Salt, acid generator, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-03-24 | — | — | US | disclosed |
| US-10571805-B2 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-02-25 | — | — | US | disclosed |
| EP-2539316-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2019-10-23 | — | — | EP | disclosed |
| US-20020146641-A1 | Chemically amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-10-10 | — | — | US | disclosed |
| EP-1207423-A1 | Chemically amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-22 | — | — | EP | disclosed |
| US-6348297-B1 | COMPOSITION COMPRISING ACID GENERATOR COMPRISING ALIPHATIC SULFONIUM SALT, TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALT,RESIN HAVING ACID-LABILE GROUP WHICH IS INSOLUBLE IN ALKALI BUT BECOMES SOLUBLE BY ACTION OF ACID | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-19 | — | — | US | disclosed |
| US-20010046641-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-29 | — | — | US | disclosed |
| US-20010044070-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-22 | — | — | US | disclosed |
| EP-1154321-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-14 | — | — | EP | disclosed |
| US-20010033987-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-10-25 | — | — | US | disclosed |
| EP-1143299-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-10-10 | — | — | EP | disclosed |
| EP-1128212-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-29 | — | — | EP | disclosed |
| EP-1041442-A1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-10-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10725380-B2 | Compound, resin, resist composition and method for producing resist pattern | C1R, C9, RER1 | KDM4E 2991/4885LMNA 1472/4885ALDH1A1 759/4885 |
| US-11556056-B2 | Salt, acid generator, resist composition and method for producing resist pattern | CLIC1, OXSR1, RER1 | KDM4E 2394/4885LMNA 3335/4885ALDH1A1 1211/4885 |
| US-10599033-B2 | Salt, acid generator, resin, resist composition and method for producing resist pattern | RER1, FRG1, C1R | KDM4E 3440/4885LMNA 3875/4885ALDH1A1 2924/4885 |
| US-10774029-B2 | Compound, resin, resist composition and method for producing resist pattern | C1R, C9, RER1 | KDM4E 3075/4885LMNA 1369/4885ALDH1A1 776/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.