Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.57 |
| ▸ | ESR1 | P03372 | 2/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.56 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.56 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.56 |
| ▸ | KDM1A | O60341 | 1/20 | 0.55 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.54 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.54 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.54 |
| ▸ | NPC1 | O15118 | 2/20 | 0.53 |
| ▸ | RAB9A | P51151 | 2/20 | 0.53 |
| ▸ | TNKS | O95271 | 1/20 | 0.53 |
| ▸ | PARP1 | P09874 | 1/20 | 0.53 |
| ▸ | TNKS2 | Q9H2K2 | 1/20 | 0.53 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.51 |
| ▸ | HTT | P42858 | 2/20 | 0.51 |
| ▸ | XBP1 | P17861 | 1/20 | 0.51 |
| ▸ | ATM | Q13315 | 1/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29446758 | 1.00 | TDP1 (0.57) | TDP1ESR1ESR2ALDH1A1KDM4E | |
| SCHEMBL28193791 | 0.86 | ESR1 (0.55) | TDP1ESR1ESR2ALDH1A1KDM4E | |
| SCHEMBL7593636 | 0.85 | ESR1 (0.51) | TDP1ESR1ESR2ALDH1A1KDM4E | |
| SCHEMBL28361368 | 0.85 | ESR1 (0.64) | ESR1ESR2ALDH1A1KDM4EKDM1A | |
| SCHEMBL27873018 | 0.85 | ESR1 (0.64) | TDP1ESR1ESR2ALDH1A1KDM4E | |
| SCHEMBL26462184 | 0.85 | ESR1 (0.68) | TDP1ESR1ESR2ALDH1A1KDM4E | |
| SCHEMBL29514776 | 0.84 | ESR1 (0.73) | TDP1ESR1ESR2ALDH1A1KDM4E | |
| SCHEMBL194068 | 0.84 | ESR1 (0.73) | TDP1ESR1ESR2ALDH1A1KDM4E | |
| SCHEMBL16802162 | 0.83 | MAOA (0.57) | TDP1ESR1ESR2ALDH1A1KDM4E | |
| SCHEMBL13382357 | 0.82 | ESR1 (0.64) | TDP1ESR1ESR2ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 202 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| CN-112824973-A | Dry film resist laminate | 浙江福斯特新材料研究院有限公司 | 2021-05-21 | — | — | CN | claimed |
| CN-111752098-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752100-A | Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752097-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-109976095-A | It is a kind of directly to describe the anti-corrosion agent composition and layered product being imaged by light | 杭州福斯特应用材料股份有限公司 | 2019-07-05 | — | — | CN | claimed |
| CN-108241259-A | A kind of anti-corrosion agent composition that can directly describe exposure image with good hole masking function | 浙江福斯特新材料研究院有限公司 | 2018-07-03 | — | — | CN | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | claimed |
| WO-2026105768-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | 株式会社レゾナック | 2026-05-21 | — | — | WO | disclosed |
| EP-3584242-B1 | FLUORENYLAMINOKETONE PHOTOINITIATOR, PREPARATION METHOD THEREOF AND UV PHOTOCURABLE COMPOSITION CONTAINING SAME | CHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD (CN) | 2026-04-08 | — | — | EP | disclosed |
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | RESONAC CORPORATION (JP) | 2026-02-24 | — | — | US | disclosed |
| EP-4067998-B1 | EO/PO MODIFIED 9-PHENYLACRIDINE PHOTOSENSITIZERS FOR USE IN PHOTOSENSITIVE RESINS IN THE MANUFACTURE OF PRINTED CIRCUIT BOARDS | CHANGZHOU TRONLY NEW ELECTRONIC MAT CO LTD (CN) | 2025-11-12 | — | — | EP | disclosed |
| US-20250278024-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | RESONAC CORPORATION (JP) | 2025-09-04 | — | — | US | disclosed |
| US-4940647-A | Photopolymerizable compositions a leuco dye and a leuco dye stabilizer | HOECHST AKTIENGESELLSCHAFT (DE) | 1990-07-10 | — | — | US | disclosed |
| EP-0363775-A2 | Stabilisation process of a leuco dye solution, and mixture, polymerizable by radiation, containing a leuco dye | MORTON INTERNATIONAL, INC. (US) | 1990-04-18 | — | — | EP | disclosed |
| EP-0311926-A2 | Photopolymerisable composition | MORTON INTERNATIONAL, INC. (US) | 1989-04-19 | — | — | EP | disclosed |
| US-4737445-A | 2,3-DIHYDRO-1H-CYCLOPENTA(B)QUINOLINE | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-04-12 | — | — | US | disclosed |
| EP-0220589-A2 | Photopolymerisable compound and registration material containing it | HOECHST AKTIENGESELLSCHAFT (DE) | 1987-05-06 | — | — | EP | disclosed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | TERB1, PRDM9, PRPF8 | TDP1 683/4885ESR1 401/4885ESR2 1189/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.