Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.57 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.57 |
| ▸ | LMNA | P02545 | 1/20 | 0.57 |
| ▸ | GAA | P10253 | 1/20 | 0.57 |
| ▸ | ESR1 | P03372 | 5/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.56 |
| ▸ | MAOA | P21397 | 1/20 | 0.56 |
| ▸ | MAOB | P27338 | 1/20 | 0.56 |
| ▸ | TNKS | O95271 | 1/20 | 0.53 |
| ▸ | GUSB | P08236 | 1/20 | 0.53 |
| ▸ | TNKS2 | Q9H2K2 | 1/20 | 0.53 |
| ▸ | PARP2 | Q9UGN5 | 1/20 | 0.53 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | ATM | Q13315 | 2/20 | 0.47 |
| ▸ | NPC1 | O15118 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29446766 | 1.00 | L3MBTL1 (0.57) | L3MBTL1KDM4ELMNAGAAESR1 | |
| SCHEMBL29059116 | 0.85 | ESR1 (0.67) | KDM4ELMNAGAAESR1ESR2 | |
| SCHEMBL26462184 | 0.85 | ESR1 (0.68) | KDM4ELMNAGAAESR1ESR2 | |
| SCHEMBL194068 | 0.84 | ESR1 (0.73) | KDM4ELMNAGAAESR1ESR2 | |
| SCHEMBL29514776 | 0.84 | ESR1 (0.73) | KDM4ELMNAGAAESR1ESR2 | |
| SCHEMBL8956254 | 0.83 | KDM4E (0.68) | L3MBTL1KDM4ELMNAGAAESR1 | |
| SCHEMBL9971854 | 0.82 | CYP1A2 (0.67) | L3MBTL1KDM4ELMNAGAAESR1 | |
| Ammonia Solution, Strong SCHEMBL28289396 | 0.82 | ESR1 (0.70) | KDM4ELMNAGAAESR1ESR2 | |
| SCHEMBL28139140 | 0.82 | ESR1 (0.70) | KDM4ELMNAGAAESR1ESR2 | |
| SCHEMBL5947997 | 0.82 | CYP1A2 (0.57) | L3MBTL1KDM4ELMNAGAAESR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 151 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113801291-B | Photosensitive resin composition, photosensitive dry film resist and manufacturing method of PCB | 杭州福斯特电子材料有限公司 | 2023-05-12 | — | — | CN | claimed |
| CN-113174040-B | Photopolymerizable monomer and high-resolution high-adhesion LDI dry film resist composed of photopolymerizable monomer | 杭州福斯特电子材料有限公司 | 2022-05-17 | — | — | CN | claimed |
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-114114837-A | Dry film resist and preparation method thereof | 杭州福斯特电子材料有限公司 | 2022-03-01 | — | — | CN | claimed |
| CN-113801291-A | Photosensitive resin composition, photosensitive dry film resist and manufacturing method of PCB | 浙江福斯特新材料研究院有限公司 | 2021-12-17 | — | — | CN | claimed |
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| CN-113174040-A | Photopolymerizable monomer and high-resolution high-adhesion LDI dry film resist formed by same | 浙江福斯特新材料研究院有限公司 | 2021-07-27 | — | — | CN | claimed |
| CN-109976095-A | It is a kind of directly to describe the anti-corrosion agent composition and layered product being imaged by light | 杭州福斯特应用材料股份有限公司 | 2019-07-05 | — | — | CN | claimed |
| CN-108241259-A | A kind of anti-corrosion agent composition that can directly describe exposure image with good hole masking function | 浙江福斯特新材料研究院有限公司 | 2018-07-03 | — | — | CN | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| WO-2026105768-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | 株式会社レゾナック | 2026-05-21 | — | — | WO | disclosed |
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | RESONAC CORPORATION (JP) | 2026-02-24 | — | — | US | disclosed |
| US-20250306461-A1 | PHOTOSENSITIVE ELEMENT AND METHOD FOR FORMING RESIST PATTERN | RESONAC CORPORATION (JP) | 2025-10-02 | — | — | US | disclosed |
| US-20250278024-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | RESONAC CORPORATION (JP) | 2025-09-04 | — | — | US | disclosed |
| US-12353130-B2 | Photosensitive resin composition and photosensitive resin multilayer body | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-07-08 | — | — | US | disclosed |
| CN-101449208-A | Photosensitive resin composition and laminate | ASAHI KASEI EMD CORP (JP) | 2009-06-03 | — | — | CN | disclosed |
| CN-101438208-A | Photosensitive resin composition | ASAHI KASEI EMD CORP (JP) | 2009-05-20 | — | — | CN | disclosed |
| CN-1945429-A | Photosensitive resin composition and photosensitive resin laminate using the same | ASAHI KASEI DENSHI K K (JP) | 2007-04-11 | — | — | CN | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12560867-B2 | Photosensitive element and method for producing photosensitive element | TERB1, PRDM9, PRPF8 | L3MBTL1 1878/4885KDM4E 575/4885LMNA 2646/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.