Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.63 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.63 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.63 |
| ▸ | HPGD | P15428 | 2/20 | 0.63 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.63 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.63 |
| ▸ | GAA | P10253 | 1/20 | 0.63 |
| ▸ | TP53 | P04637 | 2/20 | 0.61 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.61 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.59 |
| ▸ | POLB | P06746 | 1/20 | 0.54 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.54 |
| ▸ | NPC1 | O15118 | 2/20 | 0.54 |
| ▸ | RAB9A | P51151 | 2/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29834186 | 1.00 | MAPT (0.63) | MAPTKDM4EALDH1A1HPGDCYP1A2 | |
| SCHEMBL29042709 | 0.88 | ESR1 (0.55) | MAPTKDM4EALDH1A1HPGDCYP1A2 | |
| SCHEMBL29488297 | 0.87 | KDM4E (0.61) | MAPTKDM4EALDH1A1HPGDCYP1A2 | |
| SCHEMBL600607 | 0.87 | KDM4E (0.61) | MAPTKDM4EALDH1A1HPGDCYP1A2 | |
| SCHEMBL23439583 | 0.86 | MAPT (0.51) | MAPTKDM4EALDH1A1HPGDCYP1A2 | |
| SCHEMBL600195 | 0.84 | MAPT (0.64) | MAPTKDM4EALDH1A1HPGDCYP1A2 | |
| SCHEMBL29834187 | 0.84 | MAPT (0.64) | MAPTKDM4EALDH1A1HPGDCYP1A2 | |
| SCHEMBL30496184 | 0.82 | ESR1 (0.55) | MAPTKDM4EALDH1A1HPGDCYP1A2 | |
| SCHEMBL29042714 | 0.82 | ESR1 (0.55) | MAPTKDM4EALDH1A1HPGDCYP1A2 | |
| SCHEMBL15561024 | 0.81 | GAA (0.62) | MAPTKDM4EALDH1A1HPGDCYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| CN-109976095-A | It is a kind of directly to describe the anti-corrosion agent composition and layered product being imaged by light | 杭州福斯特应用材料股份有限公司 | 2019-07-05 | — | — | CN | claimed |
| CN-108241259-A | A kind of anti-corrosion agent composition that can directly describe exposure image with good hole masking function | 浙江福斯特新材料研究院有限公司 | 2018-07-03 | — | — | CN | claimed |
| CN-113156764-B | Photosensitive resin composition and resist laminate | 杭州福斯特电子材料有限公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-115047714-A | Resist composition and laminate thereof | 杭州福斯特电子材料有限公司 | 2022-09-13 | — | — | CN | disclosed |
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | disclosed |
| CN-113156764-A | Photosensitive resin composition and resist laminate | 浙江福斯特新材料研究院有限公司 | 2021-07-23 | — | — | CN | disclosed |
| CN-106909026-B | A kind of anti-corrosion agent composition that can directly describe exposure image and resist layer laminate | 苏州福斯特光伏材料有限公司 | 2019-11-22 | — | — | CN | disclosed |
| CN-109976095-A | It is a kind of directly to describe the anti-corrosion agent composition and layered product being imaged by light | 杭州福斯特应用材料股份有限公司 | 2019-07-05 | — | — | CN | disclosed |
| CN-108241259-A | A kind of anti-corrosion agent composition that can directly describe exposure image with good hole masking function | 浙江福斯特新材料研究院有限公司 | 2018-07-03 | — | — | CN | disclosed |
| CN-106909026-A | A kind of anti-corrosion agent composition and resist layer laminate that can directly describe exposure image | 苏州福斯特光伏材料有限公司 | 2017-06-30 | — | — | CN | disclosed |
| US-20120040290-A1 | PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND PRINTED CIRCUIT BOARD PRODUCTION METHOD EACH UTILIZING SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2012-02-16 | — | — | US | disclosed |