SCHEMBL600195

SCHEMBL600195

CCCOc1cccc(-c2c3ccccc3nc3ccccc23)c1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.64
KMT2A Q03164 2/20 0.64
MEN1 O00255 1/20 0.64
LMNA P02545 3/20 0.58
ALDH1A1 P00352 3/20 0.58
GAA P10253 3/20 0.58
SMN1; SMN2 Q16637 3/20 0.58
KDM4E B2RXH2 3/20 0.58
HTT P42858 1/20 0.58
DHODH Q02127 1/20 0.55
ALOX12 P18054 2/20 0.52
TDP1 Q9NUW8 2/20 0.52
CYP1A2 P05177 2/20 0.52
CYP2C19 P33261 2/20 0.52
CYP3A4 P08684 1/20 0.52
CYP2D6 P10635 1/20 0.52
CYP2C9 P11712 1/20 0.52
NPSR1 Q6W5P4 1/20 0.52
GPBAR1 Q8TDU6 1/20 0.51
CYSLTR1 Q9Y271 1/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29834187 1.00 MAPT (0.64) MAPTKMT2AMEN1LMNAALDH1A1
SCHEMBL29587729 0.88 SMN1; SMN2 (0.62) MAPTKMT2AMEN1LMNAALDH1A1
SCHEMBL602200 0.88 SMN1; SMN2 (0.62) MAPTKMT2AMEN1LMNAALDH1A1
SCHEMBL29042709 0.87 ESR1 (0.55) MAPTKMT2AMEN1LMNAALDH1A1
SCHEMBL601983 0.84 MAPT (0.63) MAPTALDH1A1GAASMN1; SMN2KDM4E
SCHEMBL29834186 0.84 MAPT (0.63) MAPTALDH1A1GAASMN1; SMN2KDM4E
SCHEMBL30496184 0.82 ESR1 (0.55) MAPTKMT2AMEN1ALDH1A1GAA
SCHEMBL29042714 0.82 ESR1 (0.55) MAPTKMT2AMEN1ALDH1A1GAA
SCHEMBL29587463 0.80 CYP1A2 (0.64) MAPTKMT2AMEN1LMNAALDH1A1
SCHEMBL601233 0.80 CYP1A2 (0.64) MAPTKMT2AMEN1LMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108241259-B Resist composition with good hole masking function and capable of directly depicting, exposing and imaging 杭州福斯特电子材料有限公司 2021-08-10 CN claimed
CN-113156764-B Photosensitive resin composition and resist laminate 杭州福斯特电子材料有限公司 2024-04-26 CN disclosed
CN-115047714-A Resist composition and laminate thereof 杭州福斯特电子材料有限公司 2022-09-13 CN disclosed
CN-108241259-B Resist composition with good hole masking function and capable of directly depicting, exposing and imaging 杭州福斯特电子材料有限公司 2021-08-10 CN disclosed
CN-113156764-A Photosensitive resin composition and resist laminate 浙江福斯特新材料研究院有限公司 2021-07-23 CN disclosed
US-20120040290-A1 PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMATION METHOD AND PRINTED CIRCUIT BOARD PRODUCTION METHOD EACH UTILIZING SAME HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-02-16 US disclosed