Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.56 |
| ▸ | NPC1 | O15118 | 2/20 | 0.56 |
| ▸ | RAB9A | P51151 | 2/20 | 0.56 |
| ▸ | NR1I3 | Q14994 | 2/20 | 0.56 |
| ▸ | ESR1 | P03372 | 3/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.56 |
| ▸ | TSHR | P16473 | 3/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.52 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 2/20 | 0.49 |
| ▸ | HTT | P42858 | 1/20 | 0.49 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.49 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | NQO2 | P16083 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29446786 | 1.00 | KMT2A (0.56) | KMT2ANPC1RAB9ANR1I3ESR1 | |
| SCHEMBL28193791 | 0.85 | ESR1 (0.55) | KMT2ANPC1RAB9ANR1I3ESR1 | |
| SCHEMBL29499034 | 0.85 | ENPP1 (0.47) | KMT2ANPC1RAB9ANR1I3ESR1 | |
| SCHEMBL20809931 | 0.84 | CNR1 (0.49) | KMT2ANPC1RAB9ANR1I3TSHR | |
| SCHEMBL488939 | 0.84 | ACHE (0.50) | KMT2ANPC1RAB9ANR1I3TSHR | |
| SCHEMBL28361368 | 0.84 | ESR1 (0.64) | KMT2AESR1ESR2ALDH1A1MAPT | |
| SCHEMBL27873018 | 0.84 | ESR1 (0.64) | KMT2ANPC1RAB9AESR1ESR2 | |
| SCHEMBL29274261 | 0.82 | ESR1 (0.61) | KMT2ANPC1RAB9AESR1ESR2 | |
| SCHEMBL28159697 | 0.82 | KMT2A (0.50) | KMT2ANPC1RAB9ANR1I3ESR1 | |
| SCHEMBL29660599 | 0.81 | ESR1 (0.49) | KMT2ANPC1RAB9ANR1I3ESR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 169 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113801291-B | Photosensitive resin composition, photosensitive dry film resist and manufacturing method of PCB | 杭州福斯特电子材料有限公司 | 2023-05-12 | — | — | CN | claimed |
| CN-113174040-B | Photopolymerizable monomer and high-resolution high-adhesion LDI dry film resist composed of photopolymerizable monomer | 杭州福斯特电子材料有限公司 | 2022-05-17 | — | — | CN | claimed |
| CN-110357989-B | Tertiary amine photosensitizer, preparation method thereof, photosensitive resin composition containing tertiary amine photosensitizer and application of photosensitive resin composition | 常州强力电子新材料股份有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-114114837-A | Dry film resist and preparation method thereof | 杭州福斯特电子材料有限公司 | 2022-03-01 | — | — | CN | claimed |
| CN-113801291-A | Photosensitive resin composition, photosensitive dry film resist and manufacturing method of PCB | 浙江福斯特新材料研究院有限公司 | 2021-12-17 | — | — | CN | claimed |
| CN-108241259-B | Resist composition with good hole masking function and capable of directly depicting, exposing and imaging | 杭州福斯特电子材料有限公司 | 2021-08-10 | — | — | CN | claimed |
| CN-113174040-A | Photopolymerizable monomer and high-resolution high-adhesion LDI dry film resist formed by same | 浙江福斯特新材料研究院有限公司 | 2021-07-27 | — | — | CN | claimed |
| CN-111752097-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752098-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752100-A | Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | claimed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | claimed |
| WO-2026105768-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING WIRING PATTERN | 株式会社レゾナック | 2026-05-21 | — | — | WO | disclosed |
| EP-3584242-B1 | FLUORENYLAMINOKETONE PHOTOINITIATOR, PREPARATION METHOD THEREOF AND UV PHOTOCURABLE COMPOSITION CONTAINING SAME | CHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD (CN) | 2026-04-08 | — | — | EP | disclosed |
| EP-4067998-B1 | EO/PO MODIFIED 9-PHENYLACRIDINE PHOTOSENSITIZERS FOR USE IN PHOTOSENSITIVE RESINS IN THE MANUFACTURE OF PRINTED CIRCUIT BOARDS | CHANGZHOU TRONLY NEW ELECTRONIC MAT CO LTD (CN) | 2025-11-12 | — | — | EP | disclosed |
| US-20250278024-A1 | PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | RESONAC CORPORATION (JP) | 2025-09-04 | — | — | US | disclosed |
| US-20100159691-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND LAMINATE | ASAHI KASEI EMD CORPORATION (JP) | 2010-06-24 | — | — | US | disclosed |
| CN-101525392-A | 9-phenylacridine photoinitiator and preparation method thereof | UNIV JIANGSU POLYTECHNIC | 2009-09-09 | — | — | CN | disclosed |
| US-5346805-A | Initiator comprising an onium compound and an acridine derivative; printing plate, resist, photomask | FUJI PHOTO FILM CO., LTD. (JP) | 1994-09-13 | — | — | US | disclosed |
| US-4587200-A | Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1986-05-06 | — | — | US | disclosed |