Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA4 | P22748 | 1/20 | 0.41 |
| ▸ | CA6 | P23280 | 1/20 | 0.41 |
| ▸ | CA7 | P43166 | 1/20 | 0.41 |
| ▸ | TPMT | P51580 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 3/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6025551 | 1.00 | TSHR (0.42) | TSHRCYP1A2CYP3A4CYP2C9CYP2C19 | |
| SCHEMBL6024511 | 0.93 | TSHR (0.42) | TSHRCYP1A2CYP3A4CYP2C9CYP2C19 | |
| SCHEMBL6027549 | 0.90 | TSHR (0.40) | TSHRCYP1A2CYP3A4CYP2C9CYP2C19 | |
| SCHEMBL6027550 | 0.90 | TSHR (0.40) | TSHRCYP1A2CYP3A4CYP2C9CYP2C19 | |
| SCHEMBL14839188 | 0.86 | KMT2A (0.41) | TSHRCYP1A2CYP3A4CYP2C9CYP2C19 | |
| SCHEMBL6024672 | 0.85 | PAX8 (0.48) | TSHRCA1CA2CA7CA9 | |
| SCHEMBL6024673 | 0.85 | PAX8 (0.48) | TSHRCA1CA2CA7CA9 | |
| SCHEMBL14839252 | 0.82 | MAPT (0.51) | TSHRCYP1A2CYP3A4CYP2C9CYP2C19 | |
| SCHEMBL10232904 | 0.81 | KMT2A (0.48) | TSHRCYP1A2CYP3A4CYP2C9CYP2C19 | |
| SCHEMBL6025498 | 0.81 | CA12 (0.53) | TSHRCYP1A2CYP3A4CYP2C9CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1163553-B1 | OXIME DERIVATIVES AND THE USE THEREOF AS PHOTOINITIATORS | CIBA SC HOLDING AG (CH) | 2006-06-14 | — | — | EP | claimed |
| JP-2002538241-A | — | — | 2002-11-12 | — | — | JP | claimed |
| EP-1163553-A1 | OXIME DERIVATIVES AND THE USE THEREOF AS PHOTOINITIATORS | Ciba SC Holding AG (CH) | 2001-12-19 | — | — | EP | claimed |
| WO-2000052530-A1 | OXIME DERIVATIVES AND THE USE THEREOF AS PHOTOINITIATORS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2000-09-08 | — | — | WO | claimed |
| US-9766547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9766547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9760003-B2 | Pattern forming method and actinic-ray- or radiation-sensitive resin composition | FUJIFILM CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9760003-B2 | Pattern forming method and actinic-ray- or radiation-sensitive resin composition | FUJIFILM CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9568824-B2 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2017-02-14 | — | — | US | disclosed |
| US-9568824-B2 | Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2017-02-14 | — | — | US | disclosed |
| US-9411230-B2 | Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-09 | — | — | US | disclosed |
| US-9411230-B2 | Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-08-09 | — | — | US | disclosed |
| US-20130029255-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-31 | — | — | US | disclosed |
| US-20130029255-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-01-31 | — | — | US | disclosed |
| US-20120301817-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-11-29 | — | — | US | disclosed |
| US-20120034559-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-02-09 | — | — | US | disclosed |
| EP-1163553-B1 | OXIME DERIVATIVES AND THE USE THEREOF AS PHOTOINITIATORS | CIBA SC HOLDING AG (CH) | 2006-06-14 | — | — | EP | disclosed |
| US-6806024-B1 | MIXTURES OF ADDITION POLYMERS AND ACTIVATORS COMPRISING NITROGEN COMPOUNDS, USED AS SUBSTRATE COATINGS FOR COLOR FILTERS | CIBA SPECIALTY CHEMICALS CORPORATION | 2004-10-19 | — | — | US | disclosed |
| EP-1163553-A1 | OXIME DERIVATIVES AND THE USE THEREOF AS PHOTOINITIATORS | Ciba SC Holding AG (CH) | 2001-12-19 | — | — | EP | disclosed |
| WO-2000052530-A1 | OXIME DERIVATIVES AND THE USE THEREOF AS PHOTOINITIATORS | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2000-09-08 | — | — | WO | disclosed |