SCHEMBL6027290

SCHEMBL6027290

C=C(C(=O)O)C(C)(CC)CC(C)=O

nearest known ligand 0.36

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 1/20 0.36
CYP2D6 P10635 1/20 0.33
TSHR P16473 1/20 0.33
CYP2C19 P33261 1/20 0.33
HIF1A Q16665 1/20 0.33
ALDH1A1 P00352 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
HMGCR P04035 1/20 0.30
CHRM1 P11229 1/20 0.30
TBXA2R P21731 1/20 0.30
ADRA1A P35348 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6445901 0.84 TET2 (0.38) TET2CYP2D6TSHRCYP2C19HIF1A
SCHEMBL14094940 0.78 TSHR (0.50) TET2CYP2D6TSHRCYP2C19HIF1A
Acetic Acid SCHEMBL28291052 0.78 TET2 (0.31) TET2
SCHEMBL6026743 0.77 TET2 (0.33) TET2CYP2D6TSHRCYP2C19HIF1A
SCHEMBL6449731 0.76 TET2 (0.40) TET2CYP2D6TSHRCYP2C19HIF1A
SCHEMBL1708995 0.75 ALDH1A1 (0.38) CYP2D6TSHRCYP2C19HIF1AALDH1A1
SCHEMBL6025772 0.73 FDPS (0.35) TET2TSHRALDH1A1TDP1
SCHEMBL6516106 0.73 TET2 (0.35) TET2
SCHEMBL6523710 0.72 TET2 (0.42) TET2CYP2D6TSHRCYP2C19HIF1A
SCHEMBL26374455 0.72 CYP2D6 (0.36) TET2CYP2D6TSHRCYP2C19HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1558654-A4 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF FUJIFILM ELECTRONIC MATERIALS (US) 2006-04-05 EP disclosed
EP-1558654-A2 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF Fujifilm Electronic Materials USA, Inc. (US) 2005-08-03 EP disclosed
US-6916543-B2 Copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. (US) 2005-07-12 US disclosed
US-20040137362-A1 Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. 2004-07-15 US disclosed
WO-2004040371-A2 NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2004-05-13 WO disclosed