SCHEMBL6030633

SCHEMBL6030633

O=C=NCCC1(CCN=C=O)CC2CCC1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6030245 0.90
SCHEMBL30365261 0.83
SCHEMBL122656 0.82 ALDH1A1 (0.33)
SCHEMBL7186791 0.71 ALDH1A1 (0.34)
Methacrylic Acid SCHEMBL5760793 0.70 HSD11B1 (0.30)
SCHEMBL15103124 0.70 ALOX5AP (0.38)
SCHEMBL5826929 0.70 GRIN2D (0.41)
SCHEMBL31226487 0.68 GRIN2D (0.45)
SCHEMBL6555460 0.68
SCHEMBL5826888 0.67 GRIN2D (0.45)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3924399-A1 FOAMABLE, MULT-COMPONENT COMPOSITION WHICH FORMS AN INSULATING LAYER, AND USE OF SAID COMPOSITION Hilti Aktiengesellschaft (LI) 2021-12-22 EP disclosed
WO-2020164892-A1 FOAMABLE, MULT-COMPONENT COMPOSITION WHICH FORMS AN INSULATING LAYER, AND USE OF SAID COMPOSITION HILTI AKTIENGESELLSCHAFT (LI) 2020-08-20 WO disclosed
US-7045274-B2 Process for structuring a photoresist by UV at less than 160 NM and then aromatic and/or alicyclic amplification INFINEON TECHNOLOGIES AG (DE) 2006-05-16 US disclosed
US-20030099906-A1 Process for the aromatization and cycloaliphatization of photoresists in the uv range POLARIS INNOVATIONS LIMITED (IE) 2003-05-29 US disclosed