SCHEMBL6030802

SCHEMBL6030802

O=C=NCCCC1C2CC3CC(C2)CC1(CCCN=C=O)C3

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6031490 0.85
SCHEMBL6030251 0.72
SCHEMBL5827285 0.71 GRIN2D (0.50)
SCHEMBL1938928 0.70 EPHX2 (0.35)
SCHEMBL4452482 0.70
SCHEMBL18979354 0.69 EPHX2 (0.36)
SCHEMBL637591 0.69 ALDH1A1 (0.30)
SCHEMBL6030464 0.69
SCHEMBL7188185 0.67
SCHEMBL10523899 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7045274-B2 Process for structuring a photoresist by UV at less than 160 NM and then aromatic and/or alicyclic amplification INFINEON TECHNOLOGIES AG (DE) 2006-05-16 US disclosed
US-20030099906-A1 Process for the aromatization and cycloaliphatization of photoresists in the uv range POLARIS INNOVATIONS LIMITED (IE) 2003-05-29 US disclosed