SCHEMBL637591

SCHEMBL637591

O=C=NCC1C2CC3CC(C2)CC1(CN=C=O)C3

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.30
CYP3A4 P08684 1/20 0.30
TGM2 P21980 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6031490 0.71
SCHEMBL4507437 0.70 GRIN2D (0.41) ALDH1A1CYP3A4TGM2
SCHEMBL6030802 0.69
SCHEMBL4507439 0.66 HSD11B1 (0.40)
SCHEMBL6030488 0.64
SCHEMBL3718469 0.63 GAA (0.39) ALDH1A1CYP3A4
SCHEMBL31293458 0.61
SCHEMBL31293764 0.60
SCHEMBL27170861 0.60
SCHEMBL29276977 0.60 ALDH1A1 (0.33) ALDH1A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 180 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF Efirm New Material Co., Ltd. (CN) 2026-01-08 US claimed
CN-120040703-A Polythiol composition, polymerizable composition for optical product, and optical product 益丰新材料股份有限公司 2025-05-27 CN claimed
CN-116768847-B Thiol composition and application thereof in optical material 益丰新材料股份有限公司 2025-04-29 CN claimed
CN-119751795-A Polythiol composition and preparation method and application thereof 益丰新材料股份有限公司 2025-04-04 CN claimed
CN-119751323-A Preparation method of polythiol compound 益丰新材料股份有限公司 2025-04-04 CN claimed
CN-118684609-A Polythiol compound for avoiding explosion polymerization and material leakage and application thereof 益丰新材料股份有限公司 2024-09-24 CN claimed
WO-2024188359-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2024-09-19 WO claimed
CN-117285688-B Polythiol composition and application thereof 益丰新材料股份有限公司 2024-08-30 CN claimed
CN-118063723-A Polythiol composition, preparation method and application thereof, and optical material 益丰新材料股份有限公司 2024-05-24 CN claimed
CN-117326997-A Polythiol compound, composition for optical material, and preparation method and application thereof 益丰新材料股份有限公司 2024-01-02 CN claimed
CN-117304082-A Polythiol compound for optical resin lens, optical resin lens and preparation method of optical resin lens 益丰新材料股份有限公司 2023-12-29 CN claimed
CN-117285688-A Polythiol composition and application thereof 益丰新材料股份有限公司 2023-12-26 CN claimed
CN-117186057-A Polythiol composition and application thereof 益丰新材料股份有限公司 2023-12-08 CN claimed
CN-117126594-A Optical coating composition, optical coating and photovoltaic module comprising optical coating composition 浙江福斯特新材料研究院有限公司 2023-11-28 CN claimed
CN-116768847-A Thiol composition and application thereof in optical material 益丰新材料股份有限公司 2023-09-19 CN claimed
CN-116640361-A Release agent composition and application thereof 益丰新材料股份有限公司 2023-08-25 CN claimed
WO-2023147792-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2023-08-10 WO claimed
CN-114790269-B Polythiol composition and application thereof 益丰新材料股份有限公司 2023-03-10 CN claimed
CN-114790269-A Polythiol composition and application thereof 益丰新材料股份有限公司 2022-07-26 CN claimed
EP-4714937-A1 METHOD FOR PRODUCING TETRAFUNCTIONAL THIOL WITH EPISULFIDE RESIN AS STARTING MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2026-03-25 EP disclosed
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF Efirm New Material Co., Ltd. (CN) 2026-01-08 US disclosed
CN-120040703-A Polythiol composition, polymerizable composition for optical product, and optical product 益丰新材料股份有限公司 2025-05-27 CN disclosed
CN-116768847-B Thiol composition and application thereof in optical material 益丰新材料股份有限公司 2025-04-29 CN disclosed
CN-119751795-A Polythiol composition and preparation method and application thereof 益丰新材料股份有限公司 2025-04-04 CN disclosed
CN-119751323-A Preparation method of polythiol compound 益丰新材料股份有限公司 2025-04-04 CN disclosed
CN-119462449-A Preparation method of polythiol compound and optical resin lens 益丰新材料股份有限公司 2025-02-18 CN disclosed
CN-115594809-B Polythiol composition, polymerizable composition for optical material, and preparation method thereof 益丰新材料股份有限公司 2024-12-10 CN disclosed
CN-118684609-A Polythiol compound for avoiding explosion polymerization and material leakage and application thereof 益丰新材料股份有限公司 2024-09-24 CN disclosed
WO-2024188359-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2024-09-19 WO disclosed
CN-117285688-B Polythiol composition and application thereof 益丰新材料股份有限公司 2024-08-30 CN disclosed
CN-115135803-B Electroless plating base agent containing polymer and metal microparticles 日产化学株式会社 2024-06-28 CN disclosed
CN-118063723-A Polythiol composition, preparation method and application thereof, and optical material 益丰新材料股份有限公司 2024-05-24 CN disclosed
CN-116143767-B Episulfide compound, composition for optical material, optical material and application 益丰新材料股份有限公司 2024-02-23 CN disclosed
CN-117480452-A Photosensitive colored resin composition, cured product, color filter, display device, and method for producing laminate of organic light-emitting element and external light reflection preventing film DNP精细化工股份有限公司 2024-01-30 CN disclosed
CN-117326997-A Polythiol compound, composition for optical material, and preparation method and application thereof 益丰新材料股份有限公司 2024-01-02 CN disclosed
CN-117304082-A Polythiol compound for optical resin lens, optical resin lens and preparation method of optical resin lens 益丰新材料股份有限公司 2023-12-29 CN disclosed
CN-117285688-A Polythiol composition and application thereof 益丰新材料股份有限公司 2023-12-26 CN disclosed
CN-116640361-B Release agent composition and application thereof 益丰新材料股份有限公司 2023-12-22 CN disclosed
CN-117209407-A Preparation method and application of polythiol compound 益丰新材料股份有限公司 2023-12-12 CN disclosed
CN-117186057-A Polythiol composition and application thereof 益丰新材料股份有限公司 2023-12-08 CN disclosed
CN-117126594-A Optical coating composition, optical coating and photovoltaic module comprising optical coating composition 浙江福斯特新材料研究院有限公司 2023-11-28 CN disclosed
CN-116947717-A Preparation method of low-chroma pentaerythritol sulfhydryl carboxylic ester 益丰新材料股份有限公司 2023-10-27 CN disclosed
CN-116478108-B Sulfur-containing heterocyclic compound, optical material composition and application thereof 益丰新材料股份有限公司 2023-10-13 CN disclosed
CN-116478148-B Episulfide compound and application thereof 益丰新材料股份有限公司 2023-10-13 CN disclosed
CN-116768847-A Thiol composition and application thereof in optical material 益丰新材料股份有限公司 2023-09-19 CN disclosed
CN-116640361-A Release agent composition and application thereof 益丰新材料股份有限公司 2023-08-25 CN disclosed
WO-2023147792-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2023-08-10 WO disclosed
CN-116478148-A Episulfide compound and application thereof 益丰新材料股份有限公司 2023-07-25 CN disclosed
CN-116478108-A Sulfur-containing heterocyclic compound, optical material composition and application thereof 益丰新材料股份有限公司 2023-07-25 CN disclosed
CN-112996840-B Curable composition and optical element comprising cured product thereof 株式会社LG化学 2023-07-21 CN disclosed
CN-116143767-A Episulfide compound, composition for optical material, optical material and application 益丰新材料股份有限公司 2023-05-23 CN disclosed
US-20230129765-A1 METHOD FOR PRODUCING POLYTHIOETHER COMPOUND DAICEL CORPORATION (JP) 2023-04-27 US disclosed
CN-114790269-B Polythiol composition and application thereof 益丰新材料股份有限公司 2023-03-10 CN disclosed
CN-115594809-A Polythiol composition, polymerizable composition for optical material and preparation method of polymerizable composition 益丰新材料股份有限公司(CN) 2023-01-13 CN disclosed
WO-2022270358-A1 PHOTOSENSITIVE COLORED RESIN COMPOSITION, CURED PRODUCT, COLOR FILTER, DISPLAY DEVICE, AND METHOD FOR PRODUCING MULTILAYER BODY OF ORGANIC LIGHT EMITTING ELEMENT AND OUTSIDE LIGHT ANTIREFLECTION FILM 株式会社DNPファインケミカル 2022-12-29 WO disclosed
EP-4108705-A1 METHOD FOR PRODUCING POLYTHIOETHER COMPOUND Daicel Corporation (JP) 2022-12-28 EP disclosed
US-11529809-B2 Ink jet printing recording apparatus and ink jet recording method SEIKO EPSON CORPORATION 2022-12-20 US disclosed
CN-115135803-A Electroless plating base agent comprising polymer and metal fine particles 日产化学株式会社 2022-09-30 CN disclosed
CN-115135697-A Process for producing polythioether compound 株式会社大赛璐 2022-09-30 CN disclosed
CN-114790269-A Polythiol composition and application thereof 益丰新材料股份有限公司 2022-07-26 CN disclosed
CN-111333803-B Optical resin composition, optical resin material and application thereof 万华化学集团股份有限公司 2022-02-18 CN disclosed
US-20210355280-A1 CURABLE COMPOSITION AND OPTICAL ELEMENT COMPRISING CURED PRODUCT THEREOF LG CHEM, LTD. (KR) 2021-11-18 US disclosed
US-20210283908-A1 Ink Jet Printing Recording Apparatus And Ink Jet Recording Method SEIKO EPSON CORPORATION (JP) 2021-09-16 US disclosed
CN-113370668-A Ink jet textile printing and recording apparatus and ink jet recording method 精工爱普生株式会社 2021-09-10 CN disclosed
CN-113278149-A Process for producing polythioether compound 株式会社大赛璐 2021-08-20 CN disclosed
CN-113195788-A Electroless plating base agent comprising polymer and metal fine particles 日产化学株式会社 2021-07-30 CN disclosed
CN-112996840-A Curable composition and optical element comprising cured product thereof 株式会社LG化学 2021-06-18 CN disclosed
CN-108137808-B Polymer and resin composition containing the same 日产化学工业株式会社 2020-12-25 CN disclosed
CN-111868302-A Electroless plating base agent comprising polymer and metal fine particles 日产化学株式会社 2020-10-30 CN disclosed
US-10793677-B2 Polymer and resin composition containing the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-10-06 US disclosed
US-10774237-B2 Thermosetting resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-09-15 US disclosed
CN-108137788-B Thermosetting resin composition 日产化学工业株式会社 2020-05-29 CN disclosed
CN-108003135-B Novel thiol compound and the composition for optical material for having used it 三菱瓦斯化学株式会社 2019-06-07 CN disclosed
US-20190055359-A1 POLYMER AND RESIN COMPOSITION CONTAINING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-02-21 US disclosed
US-10131749-B2 Sulfur compound and composition for optical materials containing same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-11-20 US disclosed
CN-106164120-B Composition for optical material, method for producing same, and optical material obtained from composition for optical material 三菱瓦斯化学株式会社 2018-11-16 CN disclosed
US-20180305578-A1 THERMOSETTING RESIN COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-10-25 US disclosed
CN-107406408-B Novel cyclic compound and composition for optical material comprising same 三菱瓦斯化学株式会社 2018-09-28 CN disclosed
US-20180265637-A1 NOVEL SULFUR COMPOUND AND COMPOSITION FOR OPTICAL MATERIALS CONTAINING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-09-20 US disclosed
US-10071959-B2 Polythiol compound and method for producing same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-09-11 US disclosed
US-10065940-B2 Episulfide compound and optical material composition containing same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-09-04 US disclosed
CN-107250124-B Novel sulphur compound and the composition for optical material comprising it 三菱瓦斯化学株式会社 2018-07-13 CN disclosed
CN-107250125-B Novel episulfide compounds and the composition for optical material comprising it 三菱瓦斯化学株式会社 2018-07-13 CN disclosed
EP-3208268-B1 NOVEL EPISULFIDE COMPOUND AND OPTICAL MATERIAL COMPOSITION CONTAINING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2018-06-27 EP disclosed
CN-107207728-B Novel episulfide compounds and the optical material composition for including it 三菱瓦斯化学株式会社 2018-06-12 CN disclosed
CN-108137808-A Polymer and resin composition containing the same 日产化学工业株式会社 2018-06-08 CN disclosed
CN-108137788-A Compositions of thermosetting resin 日产化学工业株式会社 2018-06-08 CN disclosed
EP-3228618-B1 NOVEL SULFUR COMPOUND AND COMPOSITION FOR OPTICAL MATERIALS CONTAINING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-16 EP disclosed
US-9914799-B2 Composition for optical material and method for producing same, and optical material produced from composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-03-13 US disclosed
EP-2894177-B1 COMPOSITION FOR OPTICAL MATERIAL, AND METHOD FOR PRODUCING SAME MITSUBISHI GAS CHEMICAL CO (JP) 2017-11-08 EP disclosed
EP-3228618-A1 NOVEL SULFUR COMPOUND AND COMPOSITION FOR OPTICAL MATERIALS CONTAINING SAME Mitsubishi Gas Chemical Company, Inc. (JP) 2017-10-11 EP disclosed
US-20170247351-A1 NOVEL EPISULFIDE COMPOUND AND OPTICAL MATERIAL COMPOSITION CONTAINING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-08-31 US disclosed
EP-3085726-B1 OPTICAL MATERIAL COMPOSITION, AND APPLICATION FOR SAME MITSUBISHI GAS CHEMICAL CO (JP) 2017-08-30 EP disclosed
EP-3208268-A1 NOVEL EPISULFIDE COMPOUND AND OPTICAL MATERIAL COMPOSITION CONTAINING SAME Mitsubishi Gas Chemical Company, Inc. (JP) 2017-08-23 EP disclosed
EP-2641928-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2017-05-31 EP disclosed
US-9663618-B2 Optical material composition, and application for same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-05-30 US disclosed
US-9604959-B2 Thiol compound and composition for optical materials using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-03-28 US disclosed
US-20170051095-A1 COMPOSITION FOR OPTICAL MATERIAL AND METHOD FOR PRODUCING SAME, AND OPTICAL MATERIAL PRODUCED FROM COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-02-23 US disclosed
EP-3133098-A1 COMPOSITION FOR OPTICAL MATERIAL AND METHOD FOR PRODUCING SAME, AND OPTICAL MATERIAL PRODUCED FROM COMPOSITION FOR OPTICAL MATERIAL Mitsubishi Gas Chemical Company, Inc. (JP) 2017-02-22 EP disclosed
EP-2927222-B1 NOVEL THIOL COMPOUND, AND COMPOSITION FOR OPTICAL MATERIALS WHICH USES SAME MITSUBISHI GAS CHEMICAL CO (JP) 2017-02-08 EP disclosed
US-20160355641-A1 OPTICAL MATERIAL COMPOSITION, AND APPLICATION FOR SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-12-08 US disclosed
EP-2390290-B1 Ink jet recording ink composition SEIKO EPSON CORP (JP) 2016-11-16 EP disclosed
EP-3085726-A1 OPTICAL MATERIAL COMPOSITION, AND APPLICATION FOR SAME Mitsubishi Gas Chemical Company, Inc. (JP) 2016-10-26 EP disclosed
US-9447226-B2 Composition for optical material, and method for producing same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-09-20 US disclosed
EP-3064488-A1 POLYTHIOL COMPOUND AND METHOD FOR PRODUCING SAME Mitsubishi Gas Chemical Company, Inc. (JP) 2016-09-07 EP disclosed
US-20160229798-A1 POLYTHIOL COMPOUND AND METHOD FOR PRODUCING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-08-11 US disclosed
EP-2902389-B1 NOVEL EPISULFIDE COMPOUND AND OPTICAL MATERIAL COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2016-06-01 EP disclosed
US-20160122461-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-05-05 US disclosed
EP-3012277-A1 COMPOSITION FOR OPTICAL MATERIAL Mitsubishi Gas Chemical Company, Inc. (JP) 2016-04-27 EP disclosed
US-20160060244-A1 NOVEL THIOL COMPOUND AND COMPOSITION FOR OPTICAL MATERIALS USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-03-03 US disclosed
US-9273185-B2 Episulfide compound and optical material composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-03-01 US disclosed
EP-2927222-A1 NOVEL THIOL COMPOUND, AND COMPOSITION FOR OPTICAL MATERIALS WHICH USES SAME Mitsubishi Gas Chemical Company, Inc. (JP) 2015-10-07 EP disclosed
US-20150259477-A1 NOVEL EPISULFIDE COMPOUND AND OPTICAL MATERIAL COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-09-17 US disclosed
US-20150217576-A1 INK SET, TEXTILE PRINTING METHOD AND PRINTED TEXTILE SEIKO EPSON CORP (JP) 2015-08-06 US disclosed
EP-2902389-A1 NOVEL EPISULFIDE COMPOUND AND OPTICAL MATERIAL COMPOSITION Mitsubishi Gas Chemical Company, Inc. (JP) 2015-08-05 EP disclosed
EP-2894177-A1 COMPOSITION FOR OPTICAL MATERIAL, AND METHOD FOR PRODUCING SAME Mitsubishi Gas Chemical Company, Inc. (JP) 2015-07-15 EP disclosed
US-20150166720-A1 COMPOSITION FOR OPTICAL MATERIAL, AND METHOD FOR PRODUCING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-06-18 US disclosed
US-8642718-B2 Curable composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-02-04 US disclosed
US-8613509-B2 Ink jet recording ink composition SEIKO EPSON CORPORATION (JP) 2013-12-24 US disclosed
EP-2641928-A1 COMPOSITION FOR OPTICAL MATERIAL Mitsubishi Gas Chemical Company, Inc. (JP) 2013-09-25 EP disclosed
US-20130231425-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-09-05 US disclosed
EP-1882713-B1 CURABLE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2013-07-03 EP disclosed
EP-2390406-B1 Ink set and textile printing method SEIKO EPSON CORP (JP) 2013-04-03 EP disclosed
US-20130066006-A1 WHITE INK JET INK FOR TEXTILE PRINTING SEIKO EPSON CORPORATION (JP) 2013-03-14 US disclosed
US-8394920-B2 Composition for resin and optical lens obtained therefrom MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-03-12 US disclosed
EP-1775315-B1 POLYMERIZABLE COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2012-02-22 EP disclosed
EP-2390290-A1 Ink jet recording ink composition Seiko Epson Corporation (JP) 2011-11-30 EP disclosed
EP-2390406-A1 Ink set, textile printing method and printed textile Seiko Epson Corporation (JP) 2011-11-30 EP disclosed
US-20110257958-A1 VIRTUAL SMART PHONE KILDEVAELD MICHAEL ROGLER 2011-10-20 US disclosed
US-20110257646-A1 Method for treating fecal incontinence MEDERI THERAPEUTICS INC. 2011-10-20 US disclosed
US-8013084-B2 Manufacturing method and apparatus of optical material SEIKO EPSON CORPORATION (JP) 2011-09-06 US disclosed
EP-1560060-B1 Polarizing or photochromic plastic lens, coated sheet-like light element and method of its production MGC FILSEET CO LTD (JP) 2011-03-09 EP disclosed
EP-1398317-B1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2011-01-12 EP disclosed
US-20100331515-A1 COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-12-30 US disclosed
EP-2243798-A1 COMPOSITION FOR RESIN AND OPTICAL LENS OBTAINED THEREFROM Mitsubishi Gas Chemical Company, Inc. (JP) 2010-10-27 EP disclosed
EP-1319966-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-05-26 EP disclosed
EP-1378535-B1 POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN MITSUBISHI GAS CHEMICAL CO (JP) 2009-11-11 EP disclosed
EP-1524289-B1 POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2009-09-16 EP disclosed
EP-2072560-A2 Manufacturing method and apparatus of optical material SEIKO EPSON CORPORATION (JP) 2009-06-24 EP disclosed
US-20090156781-A1 Manufacturing Method and Apparatus of Optical Material SEIKO EPSON CORPORATION (JP) 2009-06-18 US disclosed
US-20090018308-A1 Curable Composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2009-01-15 US disclosed
US-7446163-B2 Polymerization regulator and composition for resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-11-04 US disclosed
EP-1916097-A2 A non-glaring laminated body, a coated non-glaring laminated body, a non-glaring material, and a method for producing the non-glaring material MGC Filsheet Co., Ltd. (JP) 2008-04-30 EP disclosed
US-20080094704-A1 NON-GLARING LAMINATED BODY, A COATED NON-GLARING LAMINATED BODY, A NON-GLARING MATERIAL, AND A METHOD FOR PRODUCING THE NON-GLARING MATERIAL MGC FILSHEET CO., LTD. (JP) 2008-04-24 US disclosed
US-20080097045-A1 Polymerizable Composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-04-24 US disclosed
US-7350917-B2 Light control plastic lens, coated sheet-like light control element for the lens production, and a production method for light control plastic lens MGC FILSEET CO., LTD. (JP) 2008-04-01 US disclosed
EP-1882713-A1 CURABLE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2008-01-30 EP disclosed
US-7301705-B2 Alicyclic compound for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-11-27 US disclosed
US-20070149639-A1 Polymerizable composition, optical material comprising the composition and method for producing the material HORIKOSHI HIROSHI 2007-06-28 US disclosed
EP-1775315-A1 POLYMERIZABLE COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-04-18 EP disclosed
US-7169845-B2 Polymerization regulators and compositions for resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2007-01-30 US disclosed
US-7091307-B2 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-08-15 US disclosed
US-7045274-B2 Process for structuring a photoresist by UV at less than 160 NM and then aromatic and/or alicyclic amplification INFINEON TECHNOLOGIES AG (DE) 2006-05-16 US disclosed
US-7026372-B2 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-04-11 US disclosed
US-7009031-B2 Composition for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2006-03-07 US disclosed
US-20050261467-A1 Polymerization regulator and composition for resin TAMURA MASAKI 2005-11-24 US disclosed
EP-1316819-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2005-11-23 EP disclosed
US-6960640-B2 Composition for optical material MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2005-11-01 US disclosed
US-20050168690-A1 Light control plastic lens, coated sheet-like light control element for the lens production, and a production method for light control plastic lens FUJI KASEI CO., LTD. (JP) 2005-08-04 US disclosed
EP-1560060-A1 Polarizing or photochromic plastic lens, coated sheet-like light element and method of its production Fuji Kasei Co., Ltd. (JP) 2005-08-03 EP disclosed
US-20050154073-A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof ISHII KENJI (JP) 2005-07-14 US disclosed
EP-1524289-A1 POLYMERIZABLE COMPOSITION, OPTICAL MATERIAL COMPRISING THE COMPOSITION AND METHOD FOR PRODUCING THE MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2005-04-20 EP disclosed
US-6872333-B2 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof MITSUBISHI GAS CHEMICAL COMPANY, LTD. (JP) 2005-03-29 US disclosed
EP-1099721-B1 Composition for producing resin MITSUBISHI GAS CHEMICAL CO (JP) 2005-01-12 EP disclosed
US-20040254258-A1 Polymerizable composition, optical material comprising the composition and method for producing the material MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2004-12-16 US disclosed
US-20040158031-A1 Alicyclic compound for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2004-08-12 US disclosed
US-20040147708-A1 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-07-29 US disclosed
US-20040122201-A1 polysulfides; improved impact resistance MITSUBISHI GAS CHEMICAL COMPANY (JP) 2004-06-24 US disclosed
EP-1426392-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-06-09 EP disclosed
EP-1398317-A1 ALICYCLIC COMPOUND FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-03-17 EP disclosed
US-20040026658-A1 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY INC. (JP) 2004-02-12 US disclosed
US-20040024165-A1 Composition for optical material MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2004-02-05 US disclosed
EP-1378535-A1 POLYMERIZATION REGULATORS AND COMPOSITIONS FOR RESIN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-01-07 EP disclosed
US-20030195270-A1 Enic compounds, sulfur-containing polyenic compound, sulfur-containing polythiol compound, high refractive index photocurable composition and cured product thereof ISHII KENJI (JP) 2003-10-16 US disclosed
EP-1326095-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-07-09 EP disclosed
EP-1319966-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-18 EP disclosed
EP-1316819-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2003-06-04 EP disclosed
US-20030099906-A1 Process for the aromatization and cycloaliphatization of photoresists in the uv range POLARIS INNOVATIONS LIMITED (IE) 2003-05-29 US disclosed
US-6472495-B1 RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2002-10-29 US disclosed
EP-1099721-A1 Composition for producing resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-05-16 EP disclosed
EP-1099721-A1 Composition for producing resin MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2001-05-16 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10131749-B2 Sulfur compound and composition for optical materials containing same CRY2, CRY1, PER2 ALDH1A1 823/4885CYP3A4 3465/4885TGM2 1103/4885
US-20170247351-A1 NOVEL EPISULFIDE COMPOUND AND OPTICAL MATERIAL COMPOSITION CONTAINING SAME RPL21, EPB41, XPO4 ALDH1A1 1910/4885CYP3A4 2559/4885TGM2 3237/4885
US-20150259477-A1 NOVEL EPISULFIDE COMPOUND AND OPTICAL MATERIAL COMPOSITION RPL21, SLC11A2, INCENP ALDH1A1 1619/4885CYP3A4 3072/4885TGM2 4020/4885
US-20160060244-A1 NOVEL THIOL COMPOUND AND COMPOSITION FOR OPTICAL MATERIALS USING THE SAME CTH, TST, TMT1A ALDH1A1 294/4885CYP3A4 3390/4885TGM2 650/4885
US-10065940-B2 Episulfide compound and optical material composition containing same RPL21, EPB41, XPO4 ALDH1A1 2006/4885CYP3A4 2301/4885TGM2 3256/4885
US-10071959-B2 Polythiol compound and method for producing same TREH, TET1, DOHH ALDH1A1 1852/4885CYP3A4 865/4885TGM2 523/4885
US-20160229798-A1 POLYTHIOL COMPOUND AND METHOD FOR PRODUCING SAME TREH, TET1, DOHH ALDH1A1 1852/4885CYP3A4 865/4885TGM2 523/4885
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF PARG, C5, TAF1 ALDH1A1 3748/4885CYP3A4 694/4885TGM2 2523/4885
US-20180265637-A1 NOVEL SULFUR COMPOUND AND COMPOSITION FOR OPTICAL MATERIALS CONTAINING SAME CRY2, CRY1, ICMT ALDH1A1 957/4885CYP3A4 3739/4885TGM2 1107/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.