SCHEMBL6033303

SCHEMBL6033303

C=CC(c1ccccc1)[Si](Cl)(Cl)Cl

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.39
SRC P12931 1/20 0.34
SLC6A2 P23975 2/20 0.34
SLC6A4 P31645 2/20 0.34
SLC6A3 Q01959 2/20 0.34
CFTR P13569 1/20 0.34
GOPC Q9HD26 1/20 0.34
CYP2C19 P33261 1/20 0.34
CYP3A4 P08684 2/20 0.34
KDM4E B2RXH2 1/20 0.34
MAPT P10636 1/20 0.34
ALOX15 P16050 1/20 0.34
DPP4 P27487 2/20 0.33
ALDH1A1 P00352 1/20 0.33
F2 P00734 1/20 0.33
SMN1; SMN2 Q16637 2/20 0.32
LMNA P02545 1/20 0.32
CYP19A1 P11511 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7034905 0.83 TSHR (0.36) TSHRSLC6A2SLC6A4SLC6A3CFTR
SCHEMBL6765263 0.81 TSHR (0.42) TSHRSRCSLC6A2SLC6A4SLC6A3
SCHEMBL6765261 0.81 TSHR (0.42) TSHRSRCSLC6A2SLC6A4SLC6A3
SCHEMBL9862758 0.77 LMNA (0.35) TSHRSLC6A2SLC6A4SLC6A3CFTR
SCHEMBL10626266 0.74 LMNA (0.33) TSHRSLC6A2SLC6A4SLC6A3CFTR
SCHEMBL7808247 0.74 LMNA (0.43) CYP2C19CYP3A4KDM4EMAPTALOX15
SCHEMBL7808245 0.74 LMNA (0.43) CYP2C19CYP3A4KDM4EMAPTALOX15
SCHEMBL2811184 0.72 MAPT (0.37) TSHRSLC6A2SLC6A4SLC6A3CFTR
SCHEMBL8033694 0.71 MAPT (0.36) SLC6A2SLC6A4SLC6A3CFTRGOPC
SCHEMBL21467279 0.71 LMNA (0.38) CYP3A4KDM4EMAPTALOX15ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060044500-A1 Organic thin film, method of producing the same, and field effect transistor using the same CANON KABUSHIKI KAISHA (JP) 2006-03-02 US disclosed
EP-0816419-B9 Ultraviolet-curable polysiloxane composition and method for the formation of cured patterns therefrom DOW CORNING ASIA LTD (JP) 2003-10-22 EP disclosed
EP-0816419-B1 Ultraviolet-curable polysiloxane composition and method for the formation of cured patterns therefrom DOW CORNING ASIA LTD (JP) 2003-03-12 EP disclosed
US-6258506-B1 USING BLEND OF BENZOIN ETHER AND FREE RADICAL POLYMERIZABLE SILICONE POLYMER DOW CORNING ASIA, LTD. (JP) 2001-07-10 US disclosed
US-6051625-A Ultraviolet-curable polysiloxane composition and method for the formation of cured patterns therefrom DOW CORNING ASIA, LTD. (JP) 2000-04-18 US disclosed
US-6022987-A Aryl substituted alkylsilanes and a preparation method thereof KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2000-02-08 US disclosed
EP-0816419-A2 Ultraviolet-curable polysiloxane composition and method for the formation of cured patterns therefrom DOW CORNING ASIA, Ltd. (JP) 1998-01-07 EP disclosed
US-5068387-A Siloxanes as monomers for copolymers or as couplers DOW CORNING CORPORATION (US) 1991-11-26 US disclosed
EP-0430272-A2 Production of organofunctional alkoxysilanes DOW CORNING CORPORATION (US) 1991-06-05 EP disclosed