Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 3/20 | 0.41 |
| ▸ | SRC | P12931 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.40 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14246913 | 0.84 | KMT2A (0.47) | KMT2AMEN1CYP2D6SRCHIF1A | |
| SCHEMBL29008441 | 0.81 | CYP2D6 (0.43) | KMT2AMEN1CYP2D6SRCATM | |
| SCHEMBL8053595 | 0.81 | CYP2D6 (0.43) | KMT2ACYP2D6SRCCYP1A2ATM | |
| SCHEMBL173884 | 0.81 | L3MBTL1 (0.43) | KMT2ACYP2D6SRCCYP1A2ATM | |
| SCHEMBL27893724 | 0.80 | KMT2A (0.41) | KMT2AMEN1CYP2D6SRCATM | |
| SCHEMBL2032641 | 0.79 | CYP2D6 (0.50) | CYP2D6SRCCYP2C9HIF1ACYP1A2 | |
| SCHEMBL2031549 | 0.79 | CYP2D6 (0.50) | CYP2D6SRCCYP2C9HIF1ACYP1A2 | |
| Acetic Acid SCHEMBL27497152 | 0.79 | CYP2D6 (0.41) | KMT2AMEN1CYP2D6SRCATM | |
| SCHEMBL4976204 | 0.79 | AOC3 (0.48) | KMT2ACYP2D6SRCATML3MBTL1 | |
| SCHEMBL28369056 | 0.79 | AOC3 (0.48) | KMT2ACYP2D6SRCATML3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8906598-B2 | Pattern forming method, method for manufacturing semiconductor device, and material for forming coating layer of resist pattern | FUJITSU LIMITED (JP) | 2014-12-09 | — | — | US | disclosed |
| US-8476346-B2 | Resist pattern thickening material, semiconductor device, and production method thereof | FUJITSU LIMITED (JP) | 2013-07-02 | — | — | US | disclosed |
| US-20120126372-A1 | RESIST PATTERN THICKENING MATERIAL AND PROCESS FOR FORMING RESIST PATTERN, AND SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2012-05-24 | — | — | US | disclosed |
| US-8129092-B2 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2012-03-06 | — | — | US | disclosed |
| US-20110250541-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND MATERIAL FOR FORMING COATING LAYER OF RESIST PATTERN | FUJITSU LIMITED (JP) | 2011-10-13 | — | — | US | disclosed |
| US-20110101508-A1 | RESIST PATTERN THICKENING MATERIAL, SEMICONDUCTOR DEVICE, AND PRODUCTION METHOD THEREOF | FUJITSU LIMITED (JP) | 2011-05-05 | — | — | US | disclosed |
| CN-1975571-B | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LTD | 2011-04-06 | — | — | CN | disclosed |
| EP-1793274-A2 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2007-06-06 | — | — | EP | disclosed |
| CN-1975571-A | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LTD (JP) | 2007-06-06 | — | — | CN | disclosed |
| US-20070123623-A1 | Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2007-05-31 | — | — | US | disclosed |