SCHEMBL6036854

SCHEMBL6036854

CO[Si](OC)(OCF)c1ccccc1

nearest known ligand 0.32

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.32
CA4 P22748 1/20 0.31
KDM4E B2RXH2 1/20 0.30
ALDH1A1 P00352 1/20 0.30
MAPK1 P28482 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5839238 0.87 NR1H2 (0.31)
SCHEMBL8372217 0.84 BACE1 (0.31) POLB
SCHEMBL1225533 0.81 TSHR (0.33) POLBCA4KDM4EALDH1A1MAPK1
SCHEMBL37986 0.79 CA4 (0.41) POLBCA4KDM4EALDH1A1MAPK1
SCHEMBL1971501 0.79 POLB (0.32) POLBCA4KDM4EALDH1A1MAPK1
SCHEMBL2201675 0.79 MGAM (0.33) POLBCA4KDM4EALDH1A1MAPK1
SCHEMBL241495 0.79 POLB (0.32) POLBCA4KDM4EALDH1A1MAPK1
SCHEMBL448903 0.79 POLB (0.32) POLBCA4KDM4EALDH1A1MAPK1
SCHEMBL445218 0.79 POLB (0.32) POLBCA4KDM4EALDH1A1MAPK1
SCHEMBL31338421 0.79 POLB (0.32) POLBCA4KDM4EALDH1A1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102976880-A Preparation method of asymmetric biphenyl UNIV SHAOXING 2013-03-20 CN claimed
US-20060171870-A1 PROCESS OF MAKING HYDROPHOBIC METAL OXIDE NANOPARTICLES XEROX CORPORATION (US) 2006-08-03 US claimed
US-7081234-B1 Mixing metal oxide nanoparticles, a solvent, and a surface treatment agent, heating XEROX CORPORATION (US) 2006-07-25 US claimed
US-11845105-B2 Soft plasma polymerization process for a mechanically durable superhydrophobic nanostructured coating MOLECULAR PLASMA GROUP SA (LU) 2023-12-19 US disclosed
EP-4289520-A2 SOFT PLASMA POLYMERIZATION PROCESS FOR A MECHANICALLY DURABLE SUPERHYDROPHOBIC NANOSTRUCTURED COATING Molecular Plasma Group SA (LU) 2023-12-13 EP disclosed
EP-3446793-B1 SOFT PLASMA POLYMERIZATION PROCESS FOR A MECHANICALLY DURABLE SUPERHYDROPHOBIC NANOSTRUCTURED COATING MOLECULAR PLASMA GROUP SA (LU) 2023-10-04 EP disclosed
CN-108139671-B Photosensitive resin composition and cured film prepared therefrom 罗门哈斯电子材料韩国有限公司 2022-02-11 CN disclosed
US-20210086226-A1 SOFT PLASMA POLYMERIZATION PROCESS FOR A MECHANICALLY DURABLE SUPERHYDROPHOBIC NANOSTRUCTURED COATING MOLECULAR PLASMA GROUP SA (LU) 2021-03-25 US disclosed
US-10890846-B2 Photosensitive resin composition and cured film prepared therefrom ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD (KR) 2021-01-12 US disclosed
CN-110997163-A Soft plasma polymerization process of mechanically durable superhydrophobic nanostructured coatings 分子等离子集团股份有限公司 2020-04-10 CN disclosed
CN-109791354-A Photosensitive resin composition, dry film and printed wiring board 互应化学工业株式会社 2019-05-21 CN disclosed
US-20180314153-A1 PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2018-11-01 US disclosed
CN-108139671-A PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED THEREFROM 罗门哈斯电子材料韩国有限公司 2018-06-08 CN disclosed
CN-102976880-B A kind of preparation method of asymmetric biphenyl SHAOXING UNIVERSITY (CN) 2015-09-02 CN disclosed
CN-102976880-A Preparation method of asymmetric biphenyl UNIV SHAOXING 2013-03-20 CN disclosed
US-7081234-B1 Mixing metal oxide nanoparticles, a solvent, and a surface treatment agent, heating XEROX CORPORATION (US) 2006-07-25 US disclosed