SCHEMBL603883

SCHEMBL603883

CC(O)(OCc1ccccc1)c1ccccc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.45
CYP2C19 P33261 2/20 0.45
CYP2C9 P11712 1/20 0.45
TSHR P16473 1/20 0.43
ALDH1A1 P00352 4/20 0.42
ALOX15 P16050 1/20 0.42
ESR1 P03372 2/20 0.41
ESR2 Q92731 2/20 0.41
CYP3A4 P08684 1/20 0.41
MAPK1 P28482 1/20 0.40
IDO1 P14902 1/20 0.40
PTPN1 P18031 1/20 0.40
MAOB P27338 1/20 0.40
AGXT P21549 1/20 0.39
LMNA P02545 1/20 0.38
PTGS1 P23219 1/20 0.38
SLC6A2 P23975 1/20 0.38
PTGS2 P35354 1/20 0.38
SLC6A3 Q01959 1/20 0.38
HIF1A Q16665 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1356758 0.81 TSHR (0.48) CYP1A2CYP2C19CYP2C9TSHRALDH1A1
SCHEMBL1357103 0.79 ALDH1A1 (0.45) CYP1A2CYP2C19CYP2C9TSHRALDH1A1
SCHEMBL9862390 0.79 ALDH1A1 (0.45) CYP1A2CYP2C19CYP2C9ALDH1A1ALOX15
SCHEMBL9176021 0.79 MAPK1 (0.54) CYP1A2CYP2C19CYP2C9TSHRALDH1A1
SCHEMBL584498 0.79 CYP2C19 (0.48) CYP1A2CYP2C19CYP2C9TSHRALDH1A1
SCHEMBL7723438 0.79 TSHR (0.52) CYP1A2CYP2C19CYP2C9TSHRALDH1A1
SCHEMBL3955750 0.79 CYP2C19 (0.48) CYP1A2CYP2C19CYP2C9TSHRALDH1A1
SCHEMBL1356738 0.78 ALDH1A1 (0.43) CYP1A2CYP2C19CYP2C9ALDH1A1ALOX15
SCHEMBL8775678 0.78 TSHR (0.44) CYP1A2CYP2C19TSHRALDH1A1MAPK1
SCHEMBL29219340 0.78 TSHR (0.44) CYP1A2CYP2C19TSHRALDH1A1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2489699-A1 RADIATION CURABLE RESIN COMPOSITION, AND FINGERPRINT-RESISTANT RESIN COMPOSITION CONTAINING SAME POSCO (KR) 2012-08-22 EP claimed
US-7964684-B2 Polysiesquioxanes preferably comprising vinyl or ethynyl silanetriol; improved inhibition of film shrinkage and degassing during curing; uniform thickness, low refractive index FUJIFILM CORPORATION (JP) 2011-06-21 US claimed
US-12036808-B2 Ink jet recording method using temporary curing radiation SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
CN-114488688-A Liquid crystal display element, method for producing same, and radiation-sensitive resin composition JSR株式会社 2022-05-13 CN disclosed
US-20200262205-A1 RECORDING DEVICE AND MAINTENANCE METHOD FOR RECORDING DEVICE SEIKO EPSON CORPORATION (JP) 2020-08-20 US disclosed
US-10583649-B2 Ink jet recording method and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2020-03-10 US disclosed
US-10570298-B2 Photocurable ink, ink container, and image forming method CANON KABUSHIKI KAISHA (JP) 2020-02-25 US disclosed
US-10294380-B2 Three-dimensional shaped article manufacturing method, three-dimensional shaped article manufacturing apparatus, ink set, and three-dimensional shaped article SEIKO EPSON CORPORATION (JP) 2019-05-21 US disclosed
US-10286578-B2 Three-dimensional shaped article manufacturing apparatus SEIKO EPSON CORPORATION (JP) 2019-05-14 US disclosed
US-20180127608-A1 PHOTOCURABLE INK, INK CONTAINER, AND IMAGE FORMING METHOD CANON KABUSHIKI KAISHA (JP) 2018-05-10 US disclosed
US-20180072047-A1 INK JET RECORDING METHOD AND INK JET RECORDING APPARATUS SEIKO EPSON CORPORATION (JP) 2018-03-15 US disclosed
WO-2007111341-A1 METHOD OF PRODUCING INDENTED SHEET FUJIFILM CORPORATION (JP) 2007-10-04 WO disclosed
US-20070232713-A1 Radiation Curable Liquid Resin Composition for Optical Three-Dimensional Molding and Optical Molded Article Obtained by Photocuring Same JSR CORPORATION (JP) 2007-10-04 US disclosed
US-20020136898-A1 Electrochromic device NIPPON MITSUBISHI OIL CORPORATION 2002-09-26 US disclosed
EP-0793144-B1 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 2001-01-17 EP disclosed
US-5962180-A COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT JSR CORPORATION (JP) 1999-10-05 US disclosed
EP-0793144-A2 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-09-03 EP disclosed
US-5232628-A Nonionic and anionic surfactante as textile additives, wetting or padding agents CIBA-GEIGY CORPORATION (US) 1993-08-03 US disclosed
US-5126474-A POLYADDUCTS OF ALKYLENE OXIDE AND STYRENE OXIDE WITH ARYL ALKANOLS CIBA-GEIGY CORPORATION (US) 1992-06-30 US disclosed
EP-0420807-A1 Addition products of alkylene and styrene oxide on arylalkanols CIBA-GEIGY AG (CH) 1991-04-03 EP disclosed