SCHEMBL6046941

SCHEMBL6046941

Cc1cn(CC(=O)N(CCNC(=O)OC(C)(C)C)CC(=O)OCc2ccccc2)c(=O)[nH]c1=O

nearest known ligand 0.41

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.41
TK1 P04183 6/20 0.40
SYK P43405 1/20 0.38
IDO1 P14902 1/20 0.38
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
TK2 O00142 6/20 0.37
CTSL P07711 1/20 0.36
CTSB P07858 1/20 0.36
CTSS P25774 1/20 0.36
AKT1 P31749 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5175003 0.90 KMT2A (0.40) TK1KMT2ATK2
SCHEMBL8642052 0.88 TK1 (0.39) TK1KMT2ATK2
SCHEMBL5158820 0.86 TK1 (0.37) HPGDTK1TK2
SCHEMBL6513527 0.84 L3MBTL1 (0.42) HPGDTK1SYKIDO1MEN1
SCHEMBL5354195 0.82 TK1 (0.35) TK1KMT2ATK2
SCHEMBL6468189 0.82 TK1 (0.37) TK1TK2
SCHEMBL16490057 0.77 SYK (0.49) SYKIDO1MEN1KMT2ACTSL
SCHEMBL2153725 0.77 TK2 (0.39) TK1TK2
SCHEMBL5202116 0.77 SYK (0.40) SYKIDO1MEN1KMT2AAKT1
SCHEMBL14196595 0.77 SYK (0.49) SYKIDO1MEN1KMT2ACTSL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1105525-B1 A PROCESS FOR PREPARING PEPTIDE NUCLEIC ACID PROBE USING POLYMERIC PHOTOACID GENERATOR SAMSUNG ELECTRONICS CO LTD (KR) 2006-11-02 EP disclosed
US-6660479-B2 Derivatizing surface of a solid matrix and attaching linker with acid- labile protecting group on solid matrix; coating solid matrix with polymeric photoacid generator(PAG); exposing solid matrix thus coated to light to generate acid; reacting SAMSUNG ELECTRONICS CO., LTD. (KR) 2003-12-09 US disclosed
US-6359125-B1 DERIVATIZING SURFACE OF SOLID MATRIX WITH AMINOALKYLOXYSILANE AND ATTACHING LINKER WITH ACID-LABILE PROTECTING GROUP TO AMINE GROUP ON MATRIX, COATING MATRIX WITH POLYMERIC PHOTOACID GENERATOR, EXPOSING TO LIGHT, ATTACHING PEPTIDE NUCLEIC ACID SAMSUNG ELECTRONICS CO., LTD. (KR) 2002-03-19 US disclosed