Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.42 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.42 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.42 |
| ▸ | GALR3 | O60755 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | BLM | P54132 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL429531 | 1.00 | TSHR (0.42) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL60590 | 0.92 | TSHR (0.48) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| Methyl Alcohol SCHEMBL3842813 | 0.90 | TSHR (0.47) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| Isopropyl Alcohol SCHEMBL28434694 | 0.88 | TSHR (0.45) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| Ether SCHEMBL15333808 | 0.87 | TSHR (0.39) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL27646156 | 0.86 | TSHR (0.44) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL896812 | 0.85 | TDP1 (0.59) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL487418 | 0.85 | TDP1 (0.59) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL1822921 | 0.85 | TSHR (0.42) | TSHRCHRM2CHRM4CHRM1TBXA2R | |
| SCHEMBL7160598 | 0.85 | TSHR (0.42) | TSHRCHRM2CHRM4CHRM1TBXA2R |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 229 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102453149-B | Olefin polymerization catalyst component, olefin polymerization catalyst and olefin polymerization method | CHINA PETROLEUM & CHEMICAL | 2013-06-05 | — | — | CN | claimed |
| US-12588446-B2 | Surface treatment composition and method for producing wafer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2026-03-24 | — | — | US | disclosed |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4597547-A1 | CHEMICAL SOLUTION, METHOD FOR PRODUCING MODIFIED SUBSTRATE, AND METHOD FOR PRODUCING LAYERED BODY | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| US-20250215024-A1 | CHEMICAL LIQUID, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, AND MANUFACTURING METHOD OF LAMINATE | FUJIFILM CORPORATION (JP) | 2025-07-03 | — | — | US | disclosed |
| US-20250215318-A1 | ETCHING COMPOSITION, ETCHING METHOD USING SAME, AND METHOD FOR MANUFACTURING ELECTRONIC COMPONENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-07-03 | — | — | US | disclosed |
| WO-2025105151-A1 | METHOD OF MANUFACTURING TREATED SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR | FUJIFILM CORPORATION (JP) | 2025-05-22 | — | — | WO | disclosed |
| CN-119948406-A | Photosensitive colored resin composition, cured product, partition wall, organic electroluminescent element, color filter, and image display device | 三菱化学株式会社 | 2025-05-06 | — | — | CN | disclosed |
| EP-4535405-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| CN-101989494-A | Solvent-containing composition for manufacturing laminated ceramic component | DAICEL CHEM | 2011-03-23 | — | — | CN | disclosed |
| CN-101370847-B | Thermosetting resin composition | DAINIPPON INK & CHEMICALS | 2011-03-16 | — | — | CN | disclosed |
| US-20090192273-A1 | THERMOSETTING RESIN COMPOSITION | DIC CORPORATION (JP) | 2009-07-30 | — | — | US | disclosed |
| CN-101370847-A | Thermosetting resin composition | DAINIPPON INK & CHEMICALS (JP) | 2009-02-18 | — | — | CN | disclosed |
| US-20090026425-A1 | COMPOSITION COMPRISING POLYESTER AMIDE ACID AND THE LIKE AND INK-JET INK COMPOSITION USING THE SAME | CHISSO CORPORATION (JP) | 2009-01-29 | — | — | US | disclosed |
| CN-101295051-A | Optical filter, manufacture method and display apparatus thereof | FUJI PHOTO FILM CO LTD (JP) | 2008-10-29 | — | — | CN | disclosed |
| EP-1964869-A1 | THERMOSETTING RESIN COMPOSITION | DIC Corporation (JP) | 2008-09-03 | — | — | EP | disclosed |
| CN-1264924-C | Thermosetting polyimide resin composition and method for producing polyimide resin | DAINIPPON INK & CHEMICALS (JP) | 2006-07-19 | — | — | CN | disclosed |
| CN-1435448-A | Thermosetting polyimide resin composition and method for producing polyimide resin | DAINIPPON INK & CHEMICALS (JP) | 2003-08-13 | — | — | CN | disclosed |
| EP-0500951-A1 | HALOGEN-FREE DETERGENT COMPOSITION | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1992-09-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12588446-B2 | Surface treatment composition and method for producing wafer | SGMS1, SGMS2, SMURF1 | TSHR 2614/4885CHRM2 44/4885CHRM4 217/4885 |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | ESPL1, SMS, SGMS1 | TSHR 2961/4885CHRM2 1173/4885CHRM4 2333/4885 |
| US-20250215024-A1 | CHEMICAL LIQUID, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, AND MANUFACTURING METHOD OF LAMINATE | EPM2A, AKR7A2, ALDOA | TSHR 4812/4885CHRM2 2486/4885CHRM4 3427/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.