SCHEMBL606046

SCHEMBL606046

Oc1ccc(I)c(O)c1I

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PIM1 P11309 1/20 0.38
TTR P02766 1/20 0.35
ADAMTS4 O75173 1/20 0.32
ALDH1A1 P00352 1/20 0.32
EGFR P00533 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
LMNA P02545 1/20 0.32
FYN P06241 1/20 0.32
MMP2 P08253 1/20 0.32
MMP9 P14780 1/20 0.32
HPGD P15428 1/20 0.32
ALOX15 P16050 1/20 0.32
MMP8 P22894 1/20 0.32
CA6 P23280 1/20 0.32
CDK2 P24941 1/20 0.32
MMP12 P39900 1/20 0.32
RECQL P46063 1/20 0.32
HSD17B10 Q99714 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4958950 0.81 TTR (0.38) TTR
SCHEMBL8634190 0.79 PIM1 (0.33) PIM1TTRALDH1A1EGFRCA2
SCHEMBL561949 0.79 PIM1 (0.33) PIM1TTRALDH1A1EGFRCA2
SCHEMBL6349747 0.79 PIM1 (0.40) PIM1TTRADAMTS4ALDH1A1EGFR
SCHEMBL12302293 0.77 TTR (0.44) PIM1TTRADAMTS4ALDH1A1EGFR
SCHEMBL361051 0.77 PIM1 (0.41) PIM1ADAMTS4ALDH1A1EGFRCA1
SCHEMBL7526395 0.77 PIM1 (0.32) PIM1IDO1ERN1
SCHEMBL30057251 0.77 ALDH1A1 (0.38) PIM1TTRADAMTS4ALDH1A1EGFR
SCHEMBL12676675 0.72 ERN1 (0.44) ERN1
SCHEMBL25346822 0.72 CA3 (0.39) PIM1ALDH1A1LMNAHPGDALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1268656-C Preparing method and application for poly p-phenyl vinylene (PPV) CHINESE ACAD INST CHEMISTRY (CN) 2006-08-09 CN claimed
WO-2002003938-A1 IODO-CONTAINING ORGANIC COUPLERS FOR USE IN OXIDATIVE HAIR DYEING CLAIROL INCORPORATED (US) 2002-01-17 WO claimed
CN-104749887-A COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY NISSAN CHEMICAL IND LTD 2015-07-01 CN disclosed
US-9005873-B2 Composition for forming resist underlayer film for EUV lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-04-14 US disclosed
US-20140099791-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-04-10 US disclosed
CN-102414619-A Resist underlayer film forming composition for EUV lithography NISSAN CHEMICAL IND LTD 2012-04-11 CN disclosed
US-20120040291-A1 COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-02-16 US disclosed
CN-1298752-C Poly(p-phenylene ethylene) and its prepn process and use CHINESE ACAD INST CHEMISTRY (CN) 2007-02-07 CN disclosed
CN-1268656-C Preparing method and application for poly p-phenyl vinylene (PPV) CHINESE ACAD INST CHEMISTRY (CN) 2006-08-09 CN disclosed
CN-1673241-A Poly(p-phenylene ethylene) and its prepn process and use CHINESE ACAD INST CHEMISTRY (CN) 2005-09-28 CN disclosed
CN-1500816-A Preparing method and application for poly p-phenyl vinylene (PPV) 中国科学院化学研究所 2004-06-02 CN disclosed
WO-2002003938-A1 IODO-CONTAINING ORGANIC COUPLERS FOR USE IN OXIDATIVE HAIR DYEING CLAIROL INCORPORATED (US) 2002-01-17 WO disclosed