Methacrylic Acid

Methacrylic Acid

SCHEMBL6061132

C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.C=CC(=O)O.C=CC(=O)O.C=CC(=O)O.C=CC(=O)O.C=CC(=O)O.OCC(CO)(CO)CO.OCC(CO)(CO)COCC(CO)(CO)CO

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.42
TP53 P04637 1/20 0.42
CYP3A4 P08684 1/20 0.42
MAPK1 P28482 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
HIF1A Q16665 1/20 0.42
ALOX15 P16050 1/20 0.36
HSD17B10 Q99714 1/20 0.36
THRB P10828 1/20 0.36
LMNA P02545 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL2022969 1.00 ALDH1A1 (0.42) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL22129844 0.98 ALDH1A1 (0.43) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL11907309 0.98 ALDH1A1 (0.43) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL14843424 0.98 ALDH1A1 (0.43) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL28080311 0.94 THRB (0.42) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL28075860 0.94 THRB (0.42) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL28072394 0.94 THRB (0.42) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL15789440 0.92 THRB (0.43) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL4882982 0.91 ALDH1A1 (0.35) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2
Methacrylic Acid SCHEMBL6152495 0.91 ALDH1A1 (0.35) ALDH1A1TP53CYP3A4MAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7071243-B2 Photo-cured film, and photosensitive element, printed wiring board and semiconductor package using such film HITACHI CHEMICAL COMPANY, LTD. (JP) 2006-07-04 US disclosed
US-20040214924-A1 Photo-cured film, and photosensitive element, printed wiring board and semiconductor package using such film SATO KUNIAKI (JP) 2004-10-28 US disclosed
US-6692793-B2 CURED FILM OF ACID- MODIFIED, VINYL GROUP-CONTAINING EPOXY RESIN, AND AN ELASTOMER; HEAT RESISTANCE, HUMIDITY RESISTANCE ADHESIBILITY, MECHANICAL CHARACTERISTICS, GIVEN ELASTIC MODULUS HITACHI CHEMICAL COMPANY, LTD. (JP) 2004-02-17 US disclosed
EP-0919873-B1 Photo curable resin composition and photosensitive element HITACHI CHEMICAL CO LTD (JP) 2004-01-21 EP disclosed
US-6583198-B2 A photocurable resin consists of an acid modified vinyl group containing epoxy resin, an elastomer, a photopolymerization initiator, a diluent and a curing agent, can give high performance cured film HITACHI CHEMICAL COMPANY, LTD. (JP) 2003-06-24 US disclosed
US-20020169226-A1 Photo-cured film, and photosensitive element, printed wiring board and semiconductor package using such film SATO KUNIAKI (JP) 2002-11-14 US disclosed
US-20010053437-A1 Photo-cured film, and photosensitive element, printed wiring board and semiconductor package using such film SATO KUNIAKI (JP) 2001-12-20 US disclosed
US-20010003759-A1 PHOTO CURABLE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT HITACHI CHEMICAL COMPANY, LTD. (JP) 2001-06-14 US disclosed
EP-0919873-A1 Photo curable resin composition and photosensitive element HITACHI CHEMICAL CO., LTD. (JP) 1999-06-02 EP disclosed