SCHEMBL6061285

SCHEMBL6061285

O=C1CCC(=O)C2CC=CC=C12

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28138488 0.82
SCHEMBL27372776 0.75 TLR4 (0.33)
SCHEMBL27526976 0.69 MAPT (0.30)
SCHEMBL9173461 0.68
SCHEMBL7368994 0.68 CRBN (0.34)
SCHEMBL28676333 0.68 ACHE (0.31)
SCHEMBL28680128 0.67
SCHEMBL3293899 0.67 MAPT (0.42)
SCHEMBL5197085 0.67
SCHEMBL7220266 0.65 ALDH1A1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104330956-B The method of photoresist composition, the base material of coating and formation electronic device 罗门哈斯电子材料有限公司 2018-04-10 CN disclosed
CN-104725555-A Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device ROHM & HAAS ELECT MAT 2015-06-24 CN disclosed
CN-104725558-A Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device ROHM & HAAS ELECT MAT 2015-06-24 CN disclosed
CN-104725557-A Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device ROHM & HAAS ELECT MAT 2015-06-24 CN disclosed
CN-104330956-A PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING ELECTRONIC DEVICE ROHM & HAAS ELECT MAT 2015-02-04 CN disclosed
EP-1073607-B1 METHOD FOR PRODUCING HYDROGEN PEROXIDE AND REACTION CARRIERS FOR CARRYING OUT THE METHOD DEGUSSA (DE) 2006-05-17 EP disclosed
US-20050119305-A1 Il-6 production inhibitors ONO PHARMACEUTICAL CO., LTD. (JP) 2005-06-02 US disclosed
EP-1215203-B1 HYDROXAMIC ACID DERIVATIVES, PROCESS FOR THE PRODUCTION THEREOF AND DRUGS CONTAINING THE SAME AS THE ACTIVE INGREDIENT ONO PHARMACEUTICAL CO (JP) 2005-02-16 EP disclosed
US-20040214896-A1 Hydroxamic acid derivatives, the methods for preparation thereof and pharmaceutical compositions comprising thereof, as an active ingredient ONO PHARMACEUTICAL CO., LTD. 2004-10-28 US disclosed
US-6770644-B1 Hydroxamic acid derivatives, process for the production thereof and drug containing the same as the active ingredient ONO PHARMACEUTICALS CO., LTD. (JP) 2004-08-03 US disclosed
CN-1021939-C METHOD FOR MAKING OPTICALLY READABLE MEDIA CONTAINING EMBOSSED INFORMATION DU PONT (US) 1993-08-25 CN disclosed
CN-1050105-A Making contains the method for the optically-readable media of embossed information DU PONT (US) 1991-03-20 CN disclosed
EP-0176356-B1 PHOTOSENSITIVE POLYMER COMPOSITIONS, ELECTROPHORETIC DEPOSITION PROCESSES USING SAME, AND THE USE OF SAME IN FORMING FILMS ON SUBSTRATES ROHM AND HAAS COMPANY (US) 1988-11-02 EP disclosed
US-4308211-A OCTAHYDROANTHRAQUINONE, MELT, CATALYST OF GROUP 8 METAL OR OXIDE, DEHYDROGENATION THE GOODYEAR TIRE & RUBBER COMPANY (US) 1981-12-29 US disclosed
US-4303662-A HYPOTENSIVE AGENTS E. R. SQUIBB & SONS, INC. (US) 1981-12-01 US disclosed
US-4154745-A Isobenzofuran route to anthracycloquinones RESEARCH CORPORATION (US) 1979-05-15 US disclosed
US-4154745-A Isobenzofuran route to anthracycloquinones RESEARCH CORPORATION (US) 1979-05-15 US disclosed
US-4116981-A 5,12-EPOXY-NAPHTHACENE-6,11-DIONE DERIVATIVES Tsay, Yuh-Geng (TW) 1978-09-26 US disclosed
US-4116981-A 5,12-EPOXY-NAPHTHACENE-6,11-DIONE DERIVATIVES Tsay, Yuh-Geng (TW) 1978-09-26 US disclosed
US-4110353-A Process for the production of tetrahydroanthraquinones E. I. DU PONT DE NEMOURS AND COMPANY (US) 1978-08-29 US disclosed