⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL2998943 | 0.98 | — | — | |
| SCHEMBL24760385 | 0.97 | — | — | |
| SCHEMBL22022489 | 0.80 | — | — | |
| SCHEMBL30168245 | 0.78 | — | — | |
| SCHEMBL28540349 | 0.77 | — | — | |
| SCHEMBL19630444 | 0.76 | — | — | |
| SCHEMBL19630163 | 0.76 | — | — | |
| SCHEMBL22023615 | 0.76 | — | — | |
| SCHEMBL21894493 | 0.76 | FDPS (0.31) | — | |
| SCHEMBL28831876 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024135498-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2024-06-27 | — | — | WO | disclosed |
| WO-2024127977-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024122425-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024043121-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND AND INTERMEDIATE THEREFOR | 東京応化工業株式会社 | 2024-02-29 | — | — | WO | disclosed |
| WO-2023223897-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2023-11-23 | — | — | WO | disclosed |
| WO-2023223865-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2023-11-23 | — | — | WO | disclosed |
| WO-2023189961-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023176546-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND ACID GENERATOR | 東京応化工業株式会社 | 2023-09-21 | — | — | WO | disclosed |
| WO-2023171739-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND POLYMER COMPOUND | 東京応化工業株式会社 | 2023-09-14 | — | — | WO | disclosed |
| WO-2023171743-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER | 東京応化工業株式会社 | 2023-09-14 | — | — | WO | disclosed |
| WO-2022265034-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUNDS, INTERMEDIATE, AND COMPOUNDS | 東京応化工業株式会社 | 2022-12-22 | — | — | WO | disclosed |
| CN-110054197-B | Zeolite molecular sieve, preparation method thereof and radionuclide strontium adsorption composition | 北京航空航天大学 | 2021-01-15 | — | — | CN | disclosed |
| US-10562870-B2 | Prodrugs of riluzole and their method of use | BIOHAVEN PHARMACEUTICAL HOLDING COMPANY LTD. (US) | 2020-02-18 | — | — | US | disclosed |
| US-20170334870-A1 | PRODRUGS OF RILUZOLE AND THEIR METHOD OF USE | BEETLEJUICE SA LLC, AS PURCHASER AGENT | 2017-11-23 | — | — | US | disclosed |
| EP-1454958-B1 | LACTIC ACID POLYMER COMPOSITION AND MOLDED OBJECT THEREOF | NEW JAPAN CHEM CO LTD (JP) | 2006-10-04 | — | — | EP | disclosed |
| US-20050001349-A1 | Lactic acid polymer composition and molded object thereof | NEW JAPAN CHEMICAL CO., LTD. (JP) | 2005-01-06 | — | — | US | disclosed |
| EP-1454958-A1 | LACTIC ACID POLYMER COMPOSITION AND MOLDED OBJECT THEREOF | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 2004-09-08 | — | — | EP | disclosed |
| US-5973076-A | MOLDING; CONTROLLING TEMPERATURE IN PRESENCE OF AN AMIDE COMPOUND | NEW JAPAN CHEMICAL CO., LTD. (JP) | 1999-10-26 | — | — | US | disclosed |
| EP-0776933-B1 | Polybutene-1 resin composition and a method of accelerating the crystal transformation | NEW JAPAN CHEM CO LTD (JP) | 1999-08-04 | — | — | EP | disclosed |
| EP-0776933-A1 | Polybutene-1 resin composition and a method of accelerating the crystal transformation | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1997-06-04 | — | — | EP | disclosed |