⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15106525 | 0.88 | — | — | |
| SCHEMBL4438329 | 0.81 | SIGMAR1 (0.31) | — | |
| SCHEMBL6906954 | 0.81 | CYP1A2 (0.33) | — | |
| SCHEMBL8022497 | 0.80 | — | — | |
| SCHEMBL812409 | 0.79 | — | — | |
| SCHEMBL5409238 | 0.79 | SIRT2 (0.33) | — | |
| SCHEMBL4644664 | 0.78 | SIRT2 (0.36) | — | |
| SCHEMBL1529261 | 0.76 | — | — | |
| SCHEMBL9488078 | 0.76 | — | — | |
| SCHEMBL10935435 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9196484-B2 | Silicon-containing composition for formation of resist underlayer film, which contains organic group containing protected aliphatic alcohol | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-24 | — | — | US | disclosed |
| US-20130183830-A1 | SILICON-CONTAINING COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM, WHICH CONTAINS ORGANIC GROUP CONTAINING PROTECTED ALIPHATIC ALCOHOL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-18 | — | — | US | disclosed |
| EP-1651734-A1 | COATING COMPOSITIONS COMPRISING EPOXY RESINS AND AMINOFUNCTIONAL SILICONE RESINS | Dow Corning Corporation (US) | 2006-05-03 | — | — | EP | disclosed |
| WO-2005010115-A1 | COATING COMPOSITIONS COMPRISING EPOXY RESINS AND AMINOFUNCTIONAL SILICONE RESINS | DOW CORNING CORPORATION (US) | 2005-02-03 | — | — | WO | disclosed |