SCHEMBL608052

SCHEMBL608052

CCCN1CCCCCC1=O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.49
PIK3CD O00329 1/20 0.47
KMT2A Q03164 3/20 0.45
HRH3 Q9Y5N1 1/20 0.45
CYP1A2 P05177 1/20 0.43
CHRM2 P08172 1/20 0.43
CHRM4 P08173 1/20 0.43
CHRM5 P08912 1/20 0.43
CYP2D6 P10635 1/20 0.43
CHRM1 P11229 1/20 0.43
CYP2C9 P11712 1/20 0.43
CHRM3 P20309 1/20 0.43
CYP2C19 P33261 1/20 0.43
MEN1 O00255 1/20 0.42
PKM P14618 1/20 0.42
POLB P06746 1/20 0.41
BRD4 O60885 1/20 0.41
BRD2 P25440 1/20 0.41
TSHR P16473 1/20 0.41
RAB9A P51151 3/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1117522 0.98 PIK3CD (0.48) L3MBTL1PIK3CDKMT2AHRH3CYP1A2
Hydrochloric Acid SCHEMBL3058227 0.96 PIK3CD (0.47) L3MBTL1PIK3CDKMT2AHRH3CYP1A2
SCHEMBL6652346 0.93 L3MBTL1 (0.44) L3MBTL1PIK3CDKMT2AHRH3CYP1A2
SCHEMBL10043 0.91
Ammonia Solution, Strong SCHEMBL1903154 0.89 PIK3CD (0.53) PIK3CDKMT2ACYP1A2CHRM2CHRM4
SCHEMBL10481709 0.88 L3MBTL1 (0.46) L3MBTL1PIK3CDKMT2AHRH3CYP1A2
SCHEMBL11994179 0.88 L3MBTL1 (0.46) L3MBTL1PIK3CDKMT2AHRH3CYP1A2
SCHEMBL4611720 0.88 L3MBTL1 (0.46) L3MBTL1PIK3CDKMT2AHRH3CYP1A2
SCHEMBL664516 0.88 L3MBTL1 (0.46) L3MBTL1PIK3CDKMT2AHRH3CYP1A2
SCHEMBL10427076 0.88 L3MBTL1 (0.46) L3MBTL1PIK3CDKMT2AHRH3CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 391 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250354025-A1 INK COMPOSITIONS SUBSTANTIALLY FREE OF LOW-BOILING ORGANIC SOLVENTS AND METHODS FOR PRODUCING THE SAME XEROX CORPORATION (US) 2025-11-20 US claimed
CN-119774640-A Method and device for purifying lithium chloride containing organic matters 大连恒坤新材料有限公司 2025-04-08 CN claimed
CN-109337097-B Solvent and method for preparing cellulose solution by using same 绍兴美标纺织品检验有限公司 2021-10-01 CN claimed
US-8084160-B2 Method for purifying lithium sulfide IDEMITSU KOSAN CO., LTD. (JP) 2011-12-27 US claimed
US-7393913-B2 Polyamides BASF AKTIENGESELLSCHAFT (DE) 2008-07-01 US claimed
US-7317072-B2 Process for the production of polyarylene sulfide resins IDEMITSU KOSAN CO., LTD. (JP) 2008-01-08 US claimed
EP-1631615-B1 POLYAMIDES BASF AG (DE) 2007-11-21 EP claimed
US-20070027295-A1 main chain contains a chemically bound N-alkyllactam, and processes for preparing such a polyamide and fibers, films and moldings BASF AKTIENGESELLSCHAFT (DE) 2007-02-01 US claimed
US-6897005-B2 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same SAMSUNG ELECTRONICS, CO., LTD. (KR) 2005-05-24 US claimed
US-20040137363-A1 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same CHOI SANG-JUN (KR) 2004-07-15 US claimed
US-6673513-B2 COPOLYMER OF MALEIC ANHYDRIDE AND ALKYL VINYL ETHER OR UNSATURATED OXYGEN CONTAINING RINGS SUCH AS 3,4-DIHYDRO-2H-PYRAN, AND TERPOLYMERS WITH ACRYLATE HAVING ACID LABILE HYDROCARBON GROUP; ETCH RESISTANCE, GOOD ADHESION SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-01-06 US claimed
US-6627382-B2 Includes perfluoro-2,2-dimethy-1,3-dioxole derivatives and vinyl derivatives; for F2 excimer laser SAMSUNG ELECTRONICS, CO., LTD. (KR) 2003-09-30 US claimed
US-20020177067-A1 Fluoro-containing photosensitive polymer and photoresist composition containing the same SAMSUNG ELECTRONICS CO., LTD. 2002-11-28 US claimed
US-20010024763-A1 Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2001-09-27 US claimed
US-4900808-A FROM ALKALI SULFIDES AND AROMATIC DIHALOGEN COMPOUNDS BAYER AKTIENGESELLSCHAFT (DE) 1990-02-13 US claimed
EP-4722292-A1 YELLOW-AZO-PIGMENT-CONTAINING COLORING COMPOSITION AND METHOD FOR PRODUCING SAME Otsuka Chemical Co., Ltd. (JP) 2026-04-08 EP disclosed
US-20260002033-A1 COMPOSITION COMPRISING A CYCLIC AMIDE BYK CHEMIE GMBH (DE) 2026-01-01 US disclosed
US-4145264-A AROMATIC O-DICARBOXYLIC ACID NITRILES ELECTROLYZED IN AN ORGANIC LIQUID WITH AN ALKALINE ACTIVATOR BASF AKTIENGESELLSCHAFT (DE) 1979-03-20 US disclosed
US-4105763-A 1-Methyl-2-(phenyl-oxymethyl)-5-nitro-imidazoles HOECHST AKTIENGESELLSCHAFT (DE) 1978-08-08 US disclosed
US-4078086-A Anthraquinone-bis-amidines and process for preparing them HOECHST AKTIENGESELLSCHAFT (DT) 1978-03-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260002033-A1 COMPOSITION COMPRISING A CYCLIC AMIDE ASH2L, SAAL1, SHH L3MBTL1 3894/4885PIK3CD 3567/4885KMT2A 1217/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.