SCHEMBL608118

SCHEMBL608118

CCCCCCCCCCCCCCCCCC[N+](C)(C)CC.CCOS(=O)(=O)[O-]

nearest known ligand 0.59

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 8/20 0.59
HTT P42858 2/20 0.59
KMT2A Q03164 1/20 0.59
HSP90AA1 P07900 2/20 0.57
RAD52 P43351 2/20 0.57
RECQL P46063 2/20 0.50
BBOX1 O75936 2/20 0.50
GLA P06280 1/20 0.50
HPGD P15428 1/20 0.50
TSHR P16473 1/20 0.50
MAPK1 P28482 1/20 0.50
EPHX2 P34913 1/20 0.50
BLM P54132 1/20 0.50
PLA2G1B P04054 1/20 0.40
ATG4B Q9Y4P1 1/20 0.40
LSS P48449 1/20 0.39
LMNA P02545 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6243130 1.00 DNM1 (0.59) DNM1HTTKMT2AHSP90AA1RAD52
Mecetronium SCHEMBL125030 1.00 DNM1 (0.59) DNM1HTTKMT2AHSP90AA1RAD52
SCHEMBL6900640 1.00 DNM1 (0.59) DNM1HTTKMT2AHSP90AA1RAD52
SCHEMBL1123347 1.00 DNM1 (0.59) DNM1HTTKMT2AHSP90AA1RAD52
SCHEMBL2904189 1.00 DNM1 (0.59) DNM1HTTKMT2AHSP90AA1RAD52
SCHEMBL12760650 1.00 DNM1 (0.59) DNM1HTTKMT2AHSP90AA1RAD52
Hydrochloric Acid SCHEMBL20496970 0.98 DNM1 (0.57) DNM1HTTKMT2AHSP90AA1RAD52
Mecetronium SCHEMBL11855665 0.97 DNM1 (0.55) DNM1HTTKMT2AHSP90AA1RAD52
SCHEMBL14742775 0.95 BBOX1 (0.55) DNM1HTTKMT2AHSP90AA1RAD52
SCHEMBL14743251 0.95 BBOX1 (0.55) DNM1HTTKMT2AHSP90AA1RAD52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 176 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180087006-A1 CLEANING SOLUTION AND CLEANING METHOD FOR MATERIAL COMPRISING CARBON-INCORPORATED SILICON OXIDE FOR USE IN RECYCLING WAFER MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-03-29 US claimed
EP-3285285-A1 CLEANING LIQUID FOR MATERIAL COMPRISING CARBON-CONTAINING SILICON OXIDE FOR WAFER RECYCLING, AND CLEANING METHOD Mitsubishi Gas Chemical Company, Inc. (JP) 2018-02-21 EP claimed
US-4267077-A CATIONIC SURFACTANT, ANIONIC SURFACTANT AND A SOLVENT; SOFTENING AND ANTISTATIC KAO SOAP CO., LTD. (JP) 1981-05-12 US claimed
EP-4624548-A1 WATER REPELLENT COMPOSITION, METHOD FOR PRODUCING NON-FLUORINE POLYMER, PROCESSING METHOD AND ARTICLE AGC INC. (JP) 2025-10-01 EP disclosed
EP-4624547-A1 WATER REPELLENT COMPOSITION, PRODUCTION METHOD FOR FLUORINE-FREE POLYMER, TREATMENT METHOD AND ARTICLE AGC INC. (JP) 2025-10-01 EP disclosed
EP-4624549-A1 WATER-REPELLING AGENT COMPOSITION, METHOD FOR PRODUCING NON-FLUORINATED POLYMER, TREATMENT METHOD, AND ARTICLE AGC INC. (JP) 2025-10-01 EP disclosed
US-12421416-B2 Liquid repellent composition, method for producing same, and article AGC Inc. (JP) 2025-09-23 US disclosed
US-20250277070-A1 WATER REPELLENT COMPOSITION, PRODUCTION METHOD FOR FLUORINE-FREE POLYMER, TREATMENT METHOD AND ARTICLE AGC Inc. (JP) 2025-09-04 US disclosed
US-20250277071-A1 WATER REPELLENT COMPOSITION, METHOD FOR PRODUCING NON-FLUORINE POLYMER, PROCESSING METHOD AND ARTICLE AGC Inc. (JP) 2025-09-04 US disclosed
US-20250277336-A1 WATER-REPELLING AGENT COMPOSITION, METHOD FOR PRODUCING NON-FLUORINATED POLYMER, TREATMENT METHOD, AND ARTICLE AGC Inc. (JP) 2025-09-04 US disclosed
US-12331466-B2 Water- and oil-proofing composition, method for its production, article and water- and oil-proof paper AGC Inc. (JP) 2025-06-17 US disclosed
US-6306944-B1 OIL AND WATER PROOFING ASAHI GLASS COMPANY LTD. (JP) 2001-10-23 US disclosed
EP-1146103-A1 AQUEOUS DISPERSION FOR WATER-AND-OIL REPELLANT AND PROCESS FOR PRODUCING THE SAME ASAHI GLASS COMPANY LTD. (JP) 2001-10-17 EP disclosed
EP-1134268-A1 Antistatic composition KAO CORPORATION (JP) 2001-09-19 EP disclosed
EP-1004701-B1 Composition for treating paper and paper treated therewith ASAHI GLASS CO LTD (JP) 2001-06-27 EP disclosed
EP-1004701-A1 Composition for treating paper and paper treated therewith ASAHI GLASS COMPANY LTD. (JP) 2000-05-31 EP disclosed
US-5219493-A Aromatic polycarboxylic acid, anhydride, or salt thereof, and a quaternary ammonium salt or ethoxylated tertiary fatty amine HENKEL CORPORATION (US) 1993-06-15 US disclosed
WO-1992022912-A1 COMPOSITION AND METHOD FOR ENHANCING THE SURFACE CONDUCTIVITY OF THERMOPLASTIC SURFACES HENKEL CORPORATION (US) 1992-12-23 WO disclosed
WO-1990001084-A1 COMPOSITION AND METHOD OF USE THEREOF FOR TREATING PLASTIC ARTICLES WILSON ROBERT B (US) 1990-02-08 WO disclosed
US-4267077-A CATIONIC SURFACTANT, ANIONIC SURFACTANT AND A SOLVENT; SOFTENING AND ANTISTATIC KAO SOAP CO., LTD. (JP) 1981-05-12 US disclosed