Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SPHK2 | Q9NRA0 | 1/20 | 0.55 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.55 |
| ▸ | CES2 | O00748 | 4/20 | 0.52 |
| ▸ | CES1 | P23141 | 4/20 | 0.52 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.50 |
| ▸ | PPARG | P37231 | 7/20 | 0.50 |
| ▸ | PPARD | Q03181 | 7/20 | 0.50 |
| ▸ | PPARA | Q07869 | 7/20 | 0.50 |
| ▸ | TSHR | P16473 | 5/20 | 0.50 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.50 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | TLR2 | O60603 | 2/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | FABP4 | P15090 | 2/20 | 0.50 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.50 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.50 |
| ▸ | ESR1 | P03372 | 1/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4329016 | 1.00 | SPHK2 (0.55) | SPHK2SPHK1CES2CES1GPR84 | |
| SCHEMBL7611635 | 1.00 | SPHK2 (0.55) | SPHK2SPHK1CES2CES1GPR84 | |
| SCHEMBL7513495 | 1.00 | SPHK2 (0.55) | SPHK2SPHK1CES2CES1GPR84 | |
| SCHEMBL7519082 | 1.00 | SPHK2 (0.55) | SPHK2SPHK1CES2CES1GPR84 | |
| SCHEMBL942765 | 1.00 | SPHK2 (0.55) | SPHK2SPHK1CES2CES1GPR84 | |
| SCHEMBL3180398 | 1.00 | SPHK2 (0.55) | SPHK2SPHK1CES2CES1GPR84 | |
| SCHEMBL7519178 | 1.00 | SPHK2 (0.55) | SPHK2SPHK1CES2CES1GPR84 | |
| SCHEMBL608443 | 1.00 | SPHK2 (0.55) | SPHK2SPHK1CES2CES1GPR84 | |
| SCHEMBL7516420 | 1.00 | SPHK2 (0.55) | SPHK2SPHK1CES2CES1GPR84 | |
| SCHEMBL28880442 | 1.00 | SPHK2 (0.55) | SPHK2SPHK1CES2CES1GPR84 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11150555-B2 | Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same | LG CHEM, LTD. (KR) | 2021-10-19 | — | — | US | claimed |
| US-20200033724-A1 | PHOTOACID GENERATOR AND CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2020-01-30 | — | — | US | claimed |
| CN-117693500-A | Carboxamide derivative and agricultural/horticultural plant disease control agent | 组合化学工业株式会社 | 2024-03-12 | — | — | CN | disclosed |
| CN-112236421-B | Pyrazole derivatives and pest control agents | 组合化学工业株式会社 | 2023-12-26 | — | — | CN | disclosed |
| CN-117098759-A | Heterocyclic compounds and their use | 组合化学工业株式会社 | 2023-11-21 | — | — | CN | disclosed |
| CN-110612295-B | Pyrazole-3-carboxylic acid amide derivative and pest control agent | 组合化学工业株式会社 | 2023-07-14 | — | — | CN | disclosed |
| CN-114072474-B | Composition, cured product, optical filter, and method for producing cured product | 株式会社艾迪科 | 2023-04-28 | — | — | CN | disclosed |
| US-11150555-B2 | Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same | LG CHEM, LTD. (KR) | 2021-10-19 | — | — | US | disclosed |
| US-20200033724-A1 | PHOTOACID GENERATOR AND CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2020-01-30 | — | — | US | disclosed |
| CN-105932305-B | Oxygen reduction catalyst, method for producing same, and solid polymer fuel cell | 昭和电工株式会社 | 2019-12-27 | — | — | CN | disclosed |
| EP-2703466-B1 | WATER-REPELLENT AND OIL-REPELLENT AGENT COMPOUND, MANUFACTURING METHOD THEREFOR, AND ARTICLE | ASAHI GLASS CO LTD (JP) | 2018-07-11 | — | — | EP | disclosed |
| EP-2295479-A1 | COPOLYMER, METHOD FOR PRODUCING THE SAME, OIL REPELLENT COMPOSITION AND ARTICLE PROCESSED WITH THE OIL REPELLENT COMPOSITION | Asahi Glass Company, Limited (JP) | 2011-03-16 | — | — | EP | disclosed |
| US-20100331479-A1 | COPOLYMER AND METHOD FOR PRODUCING THE SAME | ASAHI GLASS COMPANY, LIMITED (JP) | 2010-12-30 | — | — | US | disclosed |
| EP-2264079-A1 | COPOLYMER AND METHOD FOR PRODUCING THE SAME | Asahi Glass Company, Limited (JP) | 2010-12-22 | — | — | EP | disclosed |
| US-20100087597-A1 | WATER/OIL REPELLENT COMPOSITION, METHOD FOR PRODUCTION THEREOF, AND ARTICLE | ASAHI GLASS COMPANY., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| EP-1553151-B1 | WATER-AND-OIL REPELLANT COMPOSITION | ASAHI GLASS CO LTD (JP) | 2010-01-20 | — | — | EP | disclosed |
| EP-2141213-A1 | WATER-REPELLANT/OIL-REPELLANT COMPOSITION, METHOD FOR PRODUCTION THEREOF, AND ARTICLE | Asahi Glass Company, Limited (JP) | 2010-01-06 | — | — | EP | disclosed |
| US-20080076862-A1 | WATER AND OIL REPELLENT COMPOSITION | ASAHI GLASS COMPANY LIMITED (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20050267241-A1 | Water and oil repellent composition | ASAHI GLASS COMPANY LIMITED (JP) | 2005-12-01 | — | — | US | disclosed |
| EP-1553151-A1 | WATER-AND-OIL REPELLANT COMPOSITION | Asahi Glass Company, Limited (JP) | 2005-07-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200033724-A1 | PHOTOACID GENERATOR AND CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTORESIST COMPOSITION FOR THICK FILM COMPRISING THE SAME | ASIC1, PPA1, ATP6AP1 | SPHK2 4798/4885SPHK1 4720/4885CES2 4274/4885 |
| US-11150555-B2 | Photoacid generator and chemically amplified positive-type photoresist composition for thick film comprising the same | ASIC1, PPA1, ATP6AP1 | SPHK2 4798/4885SPHK1 4720/4885CES2 4274/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.