SCHEMBL608446

SCHEMBL608446

CCOC(C)OC(N)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29291462 0.89 LMNA (0.44)
Urea SCHEMBL1377094 0.82 LMNA (0.67)
SCHEMBL11806002 0.82 LMNA (0.41)
Carbamic Acid SCHEMBL5387548 0.80 LMNA (0.63)
Acetamide SCHEMBL6279784 0.80 LMNA (0.63)
SCHEMBL1470143 0.80 LMNA (0.55)
SCHEMBL3388540 0.80 LMNA (0.55)
Acetone SCHEMBL590699 0.79 LMNA (0.71)
Urethane SCHEMBL1557598 0.79 ALOX15 (0.68)
SCHEMBL11806922 0.79 TSHR (0.42)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 69 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118466118-B Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-10-29 CN claimed
CN-118466118-A Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-08-09 CN claimed
CN-112898844-A Colored water-based acrylic paint and preparation method thereof 山东华诚高科胶粘剂有限公司 2021-06-04 CN claimed
US-5434296-A Reacting carbamate with metallic base to form salt; reacting with unsaturated acid halide to acylate NIPPON PAINT CO., LTD. (JP) 1995-07-18 US claimed
US-20250320432-A1 COMPOSITIONS AND METHOD FOR FLOOR CLEANING OR RESTORATION ECOLAB USA INC (US) 2025-10-16 US disclosed
EP-4211216-B1 CLEANING COMPOSITIONS RHODIA BRASIL S A (BR) 2025-07-23 EP disclosed
US-12275922-B2 Compositions and method for floor cleaning or restoration ECOLAB USA INC. (US) 2025-04-15 US disclosed
CN-118466118-B Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-10-29 CN disclosed
CN-118696652-A Method for seed coating 盈可泰控股有限责任公司 2024-09-27 CN disclosed
CN-118466118-A Photosensitive dry film resist, photosensitive dry film and application 湖南初源新材料股份有限公司 2024-08-09 CN disclosed
US-20230272306-A1 CLEANING COMPOSITIONS RHODIA BRASIL S.A. (BR) 2023-08-31 US disclosed
EP-4211216-A2 CLEANING COMPOSITIONS Rhodia Brasil S.A. (BR) 2023-07-19 EP disclosed
EP-0465162-B1 Process for producing unsaturated carbamic acid esters NIPPON PAINT CO LTD (JP) 1994-12-07 EP disclosed
US-5187306-A Reacting unsaturated amides with metallic bases to form metal salts, which are reacted with halogenated formic acid esters NIPPON PAINT CO., LTD. (JP) 1993-02-16 US disclosed
EP-0465162-A1 Process for producing unsaturated carbamic acid esters NIPPON PAINT CO., LTD. (JP) 1992-01-08 EP disclosed
US-4555489-A Method for determining flow patterns in subterranean petroleum and mineral containing formations using organosulfur tracers MOBIL OIL CORPORATION (US) 1985-11-26 US disclosed
US-4555488-A A FORMAMIDE, ACETAMIDE, UREA OR THIOUREA MOBIL OIL CORPORATION (US) 1985-11-26 US disclosed
US-4420565-A INJECTION OF TRACERS MOBIL OIL CORPORATION (US) 1983-12-13 US disclosed
US-4156784-A FROM UREA AND ALCOHOLS IN PRESENCE OF CATIONIC EXCHANGE RESINS CONTAINING NICKEL BASF AKTIENGESELLSCHAFT (DE) 1979-05-29 US disclosed
US-3990847-A Creaseproofing composition UNITED MERCHANTS AND MANUFACTURERS, INC. (US) 1976-11-09 US disclosed