⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL661674 | 0.77 | — | — | |
| SCHEMBL634269 | 0.76 | — | — | |
| SCHEMBL3818139 | 0.76 | MAPK1 (0.38) | — | |
| SCHEMBL11668757 | 0.73 | — | — | |
| SCHEMBL3748950 | 0.73 | ALDH1A1 (0.31) | — | |
| SCHEMBL15008472 | 0.72 | — | — | |
| SCHEMBL11895970 | 0.72 | SLC6A3 (0.35) | — | |
| SCHEMBL9958749 | 0.69 | ALDH1A1 (0.42) | — | |
| SCHEMBL11579620 | 0.69 | SLC6A3 (0.31) | — | |
| SCHEMBL7940034 | 0.69 | TSHR (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120196225-A1 | Photo Patternable Coating Compositions of Silicones and Organic-Inorganic Hybrids | NAMITEK SPECIALTY MATERIALS CORP. (US) | 2012-08-02 | — | — | US | claimed |
| JP-7160003-A | — | — | None | — | — | JP | disclosed |
| JP-8110630-A | — | — | None | — | — | JP | disclosed |
| JP-5333559-A | — | — | None | — | — | JP | disclosed |
| JP-8220765-A | — | — | None | — | — | JP | disclosed |
| JP-8012760-A | — | — | None | — | — | JP | disclosed |
| CN-117878118-A | Semiconductor device with a semiconductor device having a plurality of semiconductor chips | 三星电子株式会社 | 2024-04-12 | — | — | CN | disclosed |
| CN-117352512-A | Semiconductor device and method for manufacturing the same | 三星电子株式会社 | 2024-01-05 | — | — | CN | disclosed |
| CN-116995076-A | Semiconductor device with a semiconductor layer having a plurality of semiconductor layers | 三星电子株式会社 | 2023-11-03 | — | — | CN | disclosed |
| CN-116469922-A | Semiconductor device with a semiconductor layer having a plurality of semiconductor layers | 三星电子株式会社 | 2023-07-21 | — | — | CN | disclosed |
| US-6391471-B1 | HIGH SPEED RESPONSE, DURABILITY; SEMICONDUCTORS, LIGHT EMITTING DIODES, SOLAR BATTERIES, FIELD EFFECT TRANSISTORS | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-05-21 | — | — | US | disclosed |
| US-5907382-A | Transparent conductive substrate and display apparatus | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-05-25 | — | — | US | disclosed |
| JP-H08220765-A | RADIATION SENSITIVE RESIN COMPOSITION, ITS FILM AND PATTERN FORMING METHOD | OKI ELECTRIC IND CO LTD | 1996-08-30 | — | — | JP | disclosed |
| JP-H08110630-A | PRODUCTION OF GRATING MASK | OKI ELECTRIC IND CO LTD | 1996-04-30 | — | — | JP | disclosed |
| JP-H0812760-A | ADJUSTMENT OF SENSITIVITY OF PHOTOPOLYMER COMPOSITION | OKI ELECTRIC IND CO LTD | 1996-01-16 | — | — | JP | disclosed |
| JP-H07160003-A | PATTERN FORMING METHOD BY THREE-LAYER RESIST METHOD | OKI ELECTRIC IND CO LTD | 1995-06-23 | — | — | JP | disclosed |
| US-5393641-A | Radiation-sensitive resin composition | OKI ELECTRIC INDUSTRY CO., LTD. (JP) | 1995-02-28 | — | — | US | disclosed |
| US-5393641-A | Radiation-sensitive resin composition | OKI ELECTRIC INDUSTRY CO., LTD. (JP) | 1995-02-28 | — | — | US | disclosed |
| JP-H05333559-A | METHOD FOR FORMING PATTERN BY THREE-LAYER RESIST PROCESS | OKI ELECTRIC IND CO LTD | 1993-12-17 | — | — | JP | disclosed |
| JP-H00812760-A | — | — | 0001-01-01 | — | — | JP | disclosed |