Hydrochloric Acid

Hydrochloric Acid

SCHEMBL6090204

Cl[Si](Cl)(Cl)Cl.[Cl-].[Cl-].[Cl-].[Cl-].[Ti+4]

nearest known ligand 0.33

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28249959 0.83 ALDH1A1 (0.33) ALDH1A1
Hydrochloric Acid SCHEMBL9102962 0.83
Hydrochloric Acid SCHEMBL28761118 0.83
Hydrochloric Acid SCHEMBL28171167 0.83
Hydrochloric Acid SCHEMBL8849152 0.82
SCHEMBL5442827 0.82 ALDH1A1 (0.43) ALDH1A1
SCHEMBL20461 0.82
Hydrochloric Acid SCHEMBL4272388 0.77 ALDH1A1 (0.30) ALDH1A1
SCHEMBL17393533 0.73
SCHEMBL11353006 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4252774-A ALUMINUM CHLORIDE FROM CLAYS CONTAINING IRON AND ALUMINUM COMPOUNDS; REACTION WITH CARBON AND CHLORINE; GASIFICATION; REACTION WITH ALUMINUM SULFIDE THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) 1981-02-24 US claimed
CN-106629833-A Hydrogen sulfide vanadium removal technology 仙桃市中星电子材料有限公司 2017-05-10 CN disclosed
US-20060116279-A1 Composite particles and method for production thereof and use thereof SHOWA DENKO K.K. (JP) 2006-06-01 US disclosed
CN-1723086-A Composite particles, method for producing same, and use thereof SHOWA DENKO KK (JP) 2006-01-18 CN disclosed
US-4363789-A Alumina production via aluminum chloride oxidation REYNOLDS METALS COMPANY (US) 1982-12-14 US disclosed
US-4277446-A PRODUCTION OF IRON-FREE ALUMINA REYNOLDS METALS COMPANY (US) 1981-07-07 US disclosed